High-frequency continuous electromagnetic forming device for plate formation

US11433448B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11433448-B2
Application numberUS-201916966955-A
CountryUS
Kind codeB2
Filing dateJan 3, 2019
Priority dateMar 8, 2018
Publication dateSep 6, 2022
Grant dateSep 6, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A high-frequency continuous electromagnetic forming device for plate formation comprises a charger, a control terminal, a continuous charge-discharge device, a forming coil and a plate access terminal. The charger is used for charging the continuous charge-discharge device. Capacitor banks are arranged in the continuous charge-discharge device, and capacitors in the capacitor banks are sequentially discharged through an electromagnetic coil to apply a pulsed electromagnetic force to a workpiece to complete one forming process, and after discharging, the capacitors are charged to prepare for further discharging, so that continuous formation is realized. The control terminal is connected to the continuous charge-discharge device and the plate access terminal, and the forming coil is connected to the continuous charge-discharge device through a wire.

First claim

Opening claim text (preview).

What is claimed is: 1. A high-frequency continuous electromagnetic forming device for plate formation, comprising a charger, a control terminal, a continuous charge-discharge device, a forming coil and a plate access terminal, wherein: the charger is configured to charge the continuous charge-discharge device; capacitor banks are arranged in the continuous charge-discharge device, capacitors in the capacitor banks are configured to be sequentially discharged through an electromagnetic coil to apply a pulsed electromagnetic force to a workpiece to complete one forming process, and after discharging, the capacitors are configured to be charged to prepare for further discharging, so that continuous formation is realized; the control terminal is connected to the continuous charge-discharge device and the plate access terminal; and the forming coil is connected to the continuous charge-discharge device through a wire. 2. The high-frequency continuous electromagnetic forming device for plate formation according to claim 1 , wherein the charger comprises a voltage source and a charge electrode, an output voltage meets one-shot formation requirements, a tail end of the charge electrode is connected to an arc duct, and the arc duct has an arc center aligned to rotating axes of the capacitor banks and is matched with capacitor bank charge terminals, an arc of the art duct follows a rotational path of the capacitor bank charge terminals. 3. The high-frequency continuous electromagnetic forming device for plate formation according to claim 2 , wherein the wire is fixed by a fixing device and has an end connected to a discharge coil in the forming coil and an end connected to the arc duct at the tail end of the charge electrode. 4. The high-frequency continuous electromagnetic forming device for plate formation according to claim 2 , wherein the arc duct has the center aligned to the rotating axes of the capacitor banks and is matched with capacitor bank discharge terminals, and only one said capacitor bank is allowed to discharge through the arc duct at every moment. 5. The high-frequency continuous electromagnetic forming device for plate formation according to claim 1 , wherein the continuous charge-discharge device is of a cylindrical structure, has a constant axis and is able to rotate around the axis, and identical cylindrical chambers are formed at equal intervals in a circumferential direction of the continuous charge-discharge device. 6. The high-frequency continuous electromagnetic forming device for plate formation according to claim 5 , wherein the capacitor banks are of a cylindrical structure, are fixed in the chambers of the continuous charge-discharge device, and rotate along with the continuous charge-discharge device, and positive poles and negative poles stretch out of front sides and back sides of the capacitor banks. 7. The high-frequency continuous electromagnetic forming device for plate formation according to claim 1 , wherein the forming coil is located over a plate, has a plane parallel to the plate, and exactly faces a plate forming area, and a fixing and protecting device is arranged above the forming coil to protect the forming coil from being damaged by a reactive force in the forming process. 8. The high-frequency continuous electromagnetic forming device for plate formation according to claim 1 , wherein the plate access terminal comprises plate transport wheels and a mold installation frame, each said plate transport wheel consists of two cylindrical rollers disposed at two ends of the plate and configured for clamping the plate, and the place is configured to be transported forwards with the rotation of the rollers; and the mold installation frame comprises a plurality of mold racks capable of rotating around a spindle, and the mold racks are switched in the forming process to ensured that there is always one said mold rack below the plate, and forming molds are fixed to the mold installation frame, are able to move along with the mold installation frame, and configured to move downwards along with the mold racks, every time formation is completed, to strip the plate. 9. The high-frequency continuous electromagnetic forming device for plate formation according to claim 8 , wherein the mold racks are configured to rotate upwards horizontally or vertically along the spindle. 10. The high-frequency continuous electromagnetic forming device for plate formation according to claim 8 , wherein the control terminal controls the rotation of the continuous charge-discharge device, the rotation of the plate transport wheels and the movement of the mold installation frame to ensure that the continuous charge-discharge device, the plate transport wheels and the mold installation frame effectively cooperate with one another in the forming process. 11. The high-frequency continuous electromagnetic forming device for plate formation according to claim 1 , wherein continuous charging and discharging of the capacitor banks are realized through a rotation of the continuous charge-discharge device, when one capacitor bank discharges to the forming coil through the wire, other capacitor banks are charged by the charger. 12. A high-frequency continuous electromagnetic forming device for plate formation, comprising a charger, a control terminal, a continuous charge-discharge device, a forming coil and a plate access terminal, wherein: the charger is configured to charge the continuous charge-discharge device; capacitor banks are arranged in the continuous charge-discharge device, capacitors in the capacitor banks are configured to be sequentially discharged through an electromagnetic coil to apply a pulsed electromagnetic force to a workpiece to complete one forming process, and after discharging, the capacitors are configured to be charged to prepare for further discharging, so that continuous formation is realized; the control terminal is connected to the continuous charge-discharge device and the plate access terminal; the forming coil is connected to the continuous charge-discharge device through a wire; the charger incudes a voltage source and a charge electrode, an output voltage meets one-shot formation requirements, a tail end of the charge electrode is connected to an arc duct, and the arc duct has an arc center aligned to rotating axes of the capacitor banks and is matched with capacitor bank charge terminals; an arc of the art duct follows a rotational path of the capacitor bank charge terminals; the continuous charge-discharge device is of a cylindrical structure, has a constant axis and is able to rotate around the axis, and identical cylindrical chambers are formed at equal intervals in a circumferential direction of the continuous charge-discharge device, each of the capacitor banks is spaced away from each other at equal intervals and is disposed in each of the corresponding cylindrical chambers along the circumferential direction of the cylindrical structure, each of the capacitor banks has at least one charge terminal and at least one discharge terminal, when one capacitor bank of the capacitor banks discharges to the forming coil through the wire, the at least one discharge terminal of the one capacitor bank connects to the wire through an arc-shaped discharge terminal guide rail, and the at least one charge terminal of another capacitor bank of the capacitor banks connects to the charge electrode through the arc duct and is charged by the charger. 13. The high-frequency continuous electromagnetic forming device for plate formation according to claim 12 , wherein the capacitor banks are of a cylindrical structure, are fixed in the chambers

Assignees

Inventors

Classifications

  • B21D26/14Primary

    applying magnetic forces · CPC title

  • by rollers {(B21D43/145 takes precedence)} · CPC title

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What does patent US11433448B2 cover?
A high-frequency continuous electromagnetic forming device for plate formation comprises a charger, a control terminal, a continuous charge-discharge device, a forming coil and a plate access terminal. The charger is used for charging the continuous charge-discharge device. Capacitor banks are arranged in the continuous charge-discharge device, and capacitors in the capacitor banks are sequenti…
Who is the assignee on this patent?
Univ Shanghai Jiaotong
What technology area does this patent fall under?
Primary CPC classification B21D26/14. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Sep 06 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).