Notch treatment methods for flaw simulation

US11428614B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11428614-B2
Application numberUS-202016912934-A
CountryUS
Kind codeB2
Filing dateJun 26, 2020
Priority dateMar 24, 2015
Publication dateAug 30, 2022
Grant dateAug 30, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A notch treatment method for flaw simulation including providing the specimen with the notch, the notch having a re-melt material layer; isolating the notch; and selectively etching the notch to provide an etched surface of the notch; wherein at least a portion of the re-melt material layer has been removed from the notch. In one aspect, there is provided a notch treatment method for flaw simulation including providing the specimen with the notch, the notch having a re-melt material layer, the specimen includes steel or an alloy thereof; isolating the notch; and selectively etching the notch with a first etching solution and a second etching solution to provide an etched surface on the notch; wherein at least a portion of the re-melt material layer has been removed from the notch.

First claim

Opening claim text (preview).

The invention claimed is: 1. A notch treatment method for flaw simulation, comprising: providing a specimen with a notch, the notch having a re-melt material layer, the specimen comprises titanium or an alloy thereof; isolating the notch comprises placing an isolation layer with a slot onto the specimen such that the slot exposes the notch and placing a dam on the isolation layer to form a notch area and a peripheral area on the specimen, wherein the step of placing the dam on the isolation layer comprises forming a moldable cylinder; and selectively etching the notch by filling the dam with an etching solution comprising Kroll's etchant solution to provide an etched surface of the notch; wherein at least a portion of the re-melt material layer has been removed from the notch; and wherein at least a portion of the etched surface on the notch includes microcracks. 2. The treatment method according to claim 1 , wherein the step of providing the specimen with the notch comprises: generating the notch on the specimen by electrical discharge machining. 3. The treatment method according to claim 1 , wherein the re-melt material layer is disposed on at least one of a root notch and a lateral side wall of the notch.

Assignees

Inventors

Classifications

  • Manufacturability analysis or optimisation for manufacturability · CPC title

  • Crack or flaws · CPC title

  • by applying repeated or pulsating forces · CPC title

  • G01N3/62Primary

    Manufacturing, calibrating, or repairing devices used in investigations covered by the preceding subgroups · CPC title

  • Vehicle, aircraft or watercraft design · CPC title

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What does patent US11428614B2 cover?
A notch treatment method for flaw simulation including providing the specimen with the notch, the notch having a re-melt material layer; isolating the notch; and selectively etching the notch to provide an etched surface of the notch; wherein at least a portion of the re-melt material layer has been removed from the notch. In one aspect, there is provided a notch treatment method for flaw simul…
Who is the assignee on this patent?
Bell Textron Inc, Textron Innovations Inc
What technology area does this patent fall under?
Primary CPC classification G01N3/62. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Aug 30 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).