Dielectric layer and a semiconductor memory device including the dielectric layer as a capacitor dielectric layer

Patent metadata

Field	Value
Publication number	US-11417516-B2
Application number	US-201816225432-A
Country	US
Kind code	B2
Filing date	Dec 19, 2018
Priority date	Apr 25, 2018
Publication date	Aug 16, 2022
Grant date	Aug 16, 2022

Abstract

Provided is a dielectric layer that has a rock salt structure in a room temperature stable phase. The dielectric layer is made of a compound having a chemical formula of BexM1-xO, where M includes one of alkaline earth metals and x has a value greater than 0 and not greater than 0.19. A semiconductor memory device also is provided that includes a capacitor composed of a lower electrode; a dielectric layer disposed on the lower electrode; and an upper electrode disposed on the dielectric layer, wherein the dielectric layer has a rocksalt structure in a room temperature stable phase and is made of a compound having a chemical formula shown below,BexM1-xO,where M comprises an alkaline earth metal and x has a value greater than 0 and not greater than 0.19.

First claim

What is claimed is:

1. A dielectric layer having a rocksalt structure in a room temperature stable phase and made of a compound having a chemical formula as shown below:
Be x M 1-x O,
where M comprises an alkaline earth metal and x has a value greater than 0 and not greater than 0.19 wherein the dielectric layer is without a wurtzite structure.

2. The dielectric layer of claim 1 , wherein M comprises a material selected from the group consisting of magnesium (Mg), calcium (Ca), strontium (Sr), and barium (Ba).

3. The dielectric layer of claim 1 , wherein M comprises an alkaline earth metal, an oxide of which has a rocksalt structure in a room temperature stable phase.

4. The dielectric layer of claim 1 , wherein the dielectric layer comprises a compound of beryllium oxide (BeO) and an alkaline earth metal oxide that form a rocksalt solid solution without phase separation therebetween.

5. The dielectric layer of claim 1 , wherein the dielectric layer is a capacitor dielectric layer of a semiconductor memory device.

6. The dielectric layer of claim 1 , wherein the compound provides a dielectric constant of at least 17.9.

7. A semiconductor memory device, comprising:
a capacitor that comprises:
a lower electrode;
a dielectric layer disposed on the lower electrode; and
an upper electrode disposed on the dielectric layer,

wherein the dielectric layer has a rocksalt structure in a room temperature stable phase and is made of a compound having a chemical formula shown below,
Be x M 1-x O,

where M comprises an alkaline earth metal and x has a value greater than 0 and not greater than 0.19 and wherein the dielectric layer is without a wurtzite structure.

8. The semiconductor memory device of claim 7 , wherein M is selected from the group consisting of magnesium (Mg), calcium (Ca), strontium (Sr), and barium (Ba).

9. The semiconductor memory device of claim 7 , wherein M comprises an alkaline earth metal, an oxide of which has a rocksalt structure in a room temperature stable phase.

10. The semiconductor memory device of claim 7 , wherein the dielectric layer comprises a compound of beryllium oxide (BeO) and an alkaline earth metal oxide that form a rocksalt solid solution without phase separation therebetween.

11. The semiconductor memory device of claim 7 , wherein the lower electrode comprises a material selected from the group consisting of titanium nitride (TiN), tantalum nitride (TaN), ruthenium (Ru), platinum (Pt), gold (Au), silver (Ag), aluminum (Al), rhodium (Rh), molybdenum (Mo), palladium (Pd), cobalt (Co), copper (Cu), iridium (Ir), tin oxide (SnO 2 ), ruthenium oxide (RuO 2 ), iridium oxide (IrO 2 ), molybdenum oxide (MoO 2 ), and strontium ruthenate (SrRuO 3 ).

12. The semiconductor memory device of claim 7 , wherein the compound provides a dielectric constant of at least 17.9.

Assignees

• Korea Inst Sci & Tech
• Inst Basic Science
• Ulsan National Institute Of Science And Tech

Inventors

• Kim Seong Keun
• Lee Woo Chui
• Kim Sang Tae
• Song Hyun Cheol
• Baek Seung Hyub
• Choi Ji Won
• Kim Jin Sang
• Kang Chong Yun
• Bielawski Christopher W
• Yum Jung Hwan
• Larsen Eric S

Classifications

• H10P14/69397 Primary

  the material containing two or more metal elements · CPC title

• H10P14/6339

  deposition by cyclic CVD, e.g. ALD, ALE or pulsed CVD · CPC title

• H10D1/716

  having vertical extensions · CPC title

• H10D1/68 Primary

  Capacitors having no potential barriers · CPC title

• C01F3/02

  Oxides; Hydroxides · CPC title