Methods and systems for fabricating high quality superconducting tapes

US11410797B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11410797-B2
Application numberUS-201916727326-A
CountryUS
Kind codeB2
Filing dateDec 26, 2019
Priority dateMar 15, 2013
Publication dateAug 9, 2022
Grant dateAug 9, 2022

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

An MOCVD system fabricates high quality superconductor tapes with variable thicknesses. The MOCVD system can include a gas flow chamber between two parallel channels in a housing. A substrate tape is heated and then passed through the MOCVD housing such that the gas flow is perpendicular to the tape's surface. Precursors are injected into the gas flow for deposition on the substrate tape. In this way, superconductor tapes can be fabricated with variable thicknesses, uniform precursor deposition, and high critical current densities.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of fabricating a superconductor tape by metal organic chemical vapor deposition using a precursor to film conversion efficiency greater than approximately 20% of theoretical value, wherein the precursor to film conversion efficiency is a result of a conversion of precursor to film performed within a gap in a range from less than 1 mm to approximately ¼ inch, and wherein the gap is defined by an upper surface and a lower surface parallel to the upper surface. 2. The method of claim 1 , wherein the superconductor tape is a REBCO film. 3. The method of claim 2 , wherein the REBCO film comprises the formula REBa 2 Cu 3 O 7 . 4. The method of claim 1 , wherein the superconductor tape is substantially uniform. 5. The method of claim 1 , wherein the superconductor tape comprises no observable misoriented grain growth. 6. The method of claim 1 , wherein the superconductor tape comprises a film thickness greater than approximately 2 μm and a critical current density greater than approximately 4 MA/cm 2 at 77 K in a zero applied magnetic field. 7. The method of claim 6 , wherein the superconductor tape further comprises non c-axis grain orientation less than approximately 10%.

Assignees

Inventors

Classifications

  • for manufacturing extensible conductors or cables · CPC title

  • by heating · CPC title

  • characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials · CPC title

  • for coating elongated substrates · CPC title

  • H01B12/06Primary

    Films or wires on bases or cores · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11410797B2 cover?
An MOCVD system fabricates high quality superconductor tapes with variable thicknesses. The MOCVD system can include a gas flow chamber between two parallel channels in a housing. A substrate tape is heated and then passed through the MOCVD housing such that the gas flow is perpendicular to the tape's surface. Precursors are injected into the gas flow for deposition on the substrate tape. In th…
Who is the assignee on this patent?
Univ Houston System
What technology area does this patent fall under?
Primary CPC classification H01B12/06. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Aug 09 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).