Method of preparing graphdiyne-based material and a substrate for use in such material preparation process

US11407641B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11407641-B2
Application numberUS-202016895170-A
CountryUS
Kind codeB2
Filing dateJun 8, 2020
Priority dateJun 8, 2020
Publication dateAug 9, 2022
Grant dateAug 9, 2022

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A method of preparing graphdiyne-based material and a substrate for use in such material preparation process. The method includes the steps of: disposing an alkynye-based monomer on a substrate; maintaining a planar structure of each of a plurality of molecules of the monomer on a surface of the substrate; and initiating polymerization of the monomer on the substrate to synthesize a two-dimensional crystalline layer of the graphdiyne-based material on the substrate.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method of preparing a graphdiyne-based material comprising the steps of: disposing an alkynye-based monomer on a substrate; maintaining a planar structure of each of a plurality of molecules of the monomer on a surface of the substrate; and initiating polymerization of the monomer on the substrate to synthesize a two-dimensional crystalline layer of the graphdiyne-based material on the substrate. 2. The method of preparing a graphdiyne-based material according to claim 1 , wherein the substrate is arranged to reduce chemisorption between each of the plurality of molecules of the monomer and the surface of the substrate. 3. The method of preparing a graphdiyne-based material according to claim 2 , wherein the reduction of chemisorption causes an increase in monomer-substrate distance, thereby preventing configuration distortion of each of the plurality of molecules of the monomer. 4. The method of preparing a graphdiyne-based material according to claim 1 , wherein the alkynye-based monomer comprising a structure of Formula (I): wherein R 1 -R 6 are independently selected from hydrogen, a trimethylsilyl group, or a halogen. 5. The method of preparing a graphdiyne-based material according to claim 1 , wherein the alkynye-based monomer including the structure of Formula (I), and wherein R 1 -R 3 are identical and being H, SiMe 3 , Cl, Br, or I; and wherein R 4 -R 6 are identical and being H, C≡CSiMe 3 , Cl, Br, or I. 6. The method of preparing a graphdiyne-based material according to claim 1 , wherein the alkynye-based monomer including the structure of Formula (I), and wherein R 1 -R 6 are identical and being H. 7. The method of preparing a graphdiyne-based material according to claim 1 , further comprising the step of disposing a polymerization catalyst on the substrate, prior to the step of disposing the alkynye-based monomer on the substrate. 8. The method of preparing a graphdiyne-based material according to claim 7 , wherein the step of disposing a polymerization catalyst including the step of dissolving the polymerization catalyst in a solvent mixture. 9. The method of preparing a graphdiyne-based material according to claim 7 , wherein the polymerization catalyst includes PdCl 2 (PPh 3 ) 2 and CuI. 10. The method of preparing a graphdiyne-based material according to claim 8 , wherein the solvent mixture includes tetrahydrofuran and trimethylamine at a volume ratio of 1:1. 11. The method of preparing a graphdiyne-based material according to claim 1 , wherein the substrate is a zinc-based material. 12. The method of preparing a graphdiyne-based material according to claim 11 , wherein the zinc-based material includes zinc plate and zinc powder.

Assignees

Inventors

Classifications

  • C01B32/05Primary

    Preparation or purification of carbon not covered by groups C01B32/15, C01B32/20, C01B32/25, C01B32/30 · CPC title

  • Two-dimensional structures · CPC title

  • with zinc, cadmium or mercury · CPC title

  • Carbon · CPC title

  • with platinum group metals · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11407641B2 cover?
A method of preparing graphdiyne-based material and a substrate for use in such material preparation process. The method includes the steps of: disposing an alkynye-based monomer on a substrate; maintaining a planar structure of each of a plurality of molecules of the monomer on a surface of the substrate; and initiating polymerization of the monomer on the substrate to synthesize a two-dimensi…
Who is the assignee on this patent?
Univ City Hong Kong
What technology area does this patent fall under?
Primary CPC classification C01B32/05. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 09 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).