Composition, production method for composition, and production method for unsaturated compound

US11401237B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11401237-B2
Application numberUS-201917269386-A
CountryUS
Kind codeB2
Filing dateAug 16, 2019
Priority dateAug 20, 2018
Publication dateAug 2, 2022
Grant dateAug 2, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The invention relates to a composition excellent in stability during storage and stability during utilization, and relates to a method of producing the composition. The composition includes a compound (A) represented by general formula (1) and a compound (B) represented by general formula (2), and includes 0.00002 to 0.2 parts by mass of the compound (B) with respect to 100 parts by mass of the compound (A),(R1—COO)n—R2—(NCO)m  (1)(R1—COO)n—R2—(R3—R1)m  (2)wherein in general formulae (1) and (2), R1 is an ethylenically unsaturated group having 2 to 7 carbon atoms; R2 is a (m+n)-valent hydrocarbon group having 1 to 7 carbon atoms and optionally contains an ether group; R1 and R2 in the general formula (1) are the same as R1 and R2 in the general formula (2); in general formula (2), R3 is —NHC(═O)—; and n and m each represent an integer of one or two.

First claim

Opening claim text (preview).

The invention claimed is: 1. A composition comprising: a compound (A) represented by general formula (1) and a compound (B) represented by general formula (2), wherein the composition comprises 0.00002 to 0.2 parts by mass of the compound (B) with respect to 100 parts by mass of the compound (A), (R 1 —COO) n —R 2 —(NCO) m   (1) (R 1 —COO) n —R 2 —(R 3 —R 1 ) m   (2) wherein in the general formulae (1) and (2), R 1 is an ethylenically unsaturated group having 2 to 7 carbon atoms; R 2 is a (m+n)-valent hydrocarbon group having 1 to 7 carbon atoms and optionally contain an ether group; R 1 and R 2 in the general formula (1) are the same as R 1 and R 2 in the general formula (2); in the general formula (2), R 3 is —NHC(═O)—; and n and m each represent an integer of 1 or 2. 2. The composition according to claim 1 , wherein the compound (A) is at least one compound selected from the group consisting of 2-methacryloyloxyethyl isocyanate, 2-(isocyanatoethyloxy) ethyl methacrylate, 2-acryloyloxyethyl isocyanate, 2-(isocyanatoethyloxy) ethyl acrylate, and 1,1-bis(acryloyloxymethyl)ethyl isocyanate. 3. The composition of claim 1 , wherein a content of the compound (A) in the composition is 95.0% by mass or more. 4. A method of producing a composition, comprising steps of: producing a mixture which comprises a compound (A) represented by general formula (1) and a compound (B) represented by general formula (2) and which comprises more than 0.2 parts by mass of the compound (B) with respect to 100 parts by mass of the compound (A); and purifying the mixture by distillation process at a reflux ratio of 2.0 to 4.0, a pressure of 1.0 to 10.0 kPa and a distillation temperature of 90 to 140° C., (R 1 —COO) n —R 2 —(NCO) m   (1) (R 1 —COO) n —R 2 —(R 3 —R 1 ) m   (2) wherein in general formulae (1) and (2), R 1 is an ethylenically unsaturated group having 2 to 7 carbon atoms; R 2 is a (m+n)-valent hydrocarbon group having 1 to 7 carbon atoms and optionally contain an ether group; R 1 and R 2 in the general formula (1) are the same as R 1 and R 2 in the general formula (2), in general formula (2), R 3 is —NHC(═O)—; and n and m each represent an integer of 1 or 2. 5. The method of producing a composition according to claim 4 , wherein in the composition obtained by the purifying step, a content of the compound (B) with respect to 100 parts by mass of the compound (A) is 0.00002 to 0.2 parts by mass. 6. A method of producing an unsaturated compound, comprising steps of: mixing the composition according to claim 1 , with a compound having active hydrogen; and reacting the compound (A) contained in the composition with the compound having active hydrogen to obtain a reaction product. 7. The method of producing an unsaturated compound according to claim 6 , wherein the compound having the active hydrogen is an alcohol, a thiol, an amine or a carboxylic acid. 8. The method of producing an unsaturated compound according to claim 6 , wherein the reaction product is an unsaturated urethane compound, an unsaturated thiourethane compound, an unsaturated urea compound, or an unsaturated amide compound. 9. The method of producing an unsaturated compound according to claim 6 , wherein the reaction product is any one selected from the group consisting of 2-butanone oxime-O-(carbamoylethyl-2-methacrylate), 2-butanone oxime-O-(carbamoylethyl-2 acrylate), 2-[(3,5-dimethylpyrazolyl)carbonylamino]ethyl methacrylate, and 2-[(3,5-dimethylpyrazolyl)carbonylamino]ethyl acrylate.

Assignees

Inventors

Classifications

  • from isocyanates with formation of carbamate groups · CPC title

  • with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms · CPC title

  • from compounds not provided for in groups C07C231/02 - C07C231/08 · CPC title

  • by reaction of amines with carbonyl halides, e.g. with phosgene · CPC title

  • C07C275/10Primary

    being further substituted by singly-bound oxygen atoms · CPC title

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What does patent US11401237B2 cover?
The invention relates to a composition excellent in stability during storage and stability during utilization, and relates to a method of producing the composition. The composition includes a compound (A) represented by general formula (1) and a compound (B) represented by general formula (2), and includes 0.00002 to 0.2 parts by mass of the compound (B) with respect to 100 parts by mass of the…
Who is the assignee on this patent?
Showa Denko Kk
What technology area does this patent fall under?
Primary CPC classification C07C275/10. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 02 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).