Electrode film and method for manufacturing same

US11397498B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11397498-B2
Application numberUS-201816640014-A
CountryUS
Kind codeB2
Filing dateJul 31, 2018
Priority dateAug 30, 2017
Publication dateJul 26, 2022
Grant dateJul 26, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method for manufacturing an electrode film includes the steps of laminating a metal layer and a black photoresist layer sequentially on a first main surface of a transparent base material, subjecting the black photoresist layer to patterning in a mesh shape by partially exposing the black photoresist layer and performing development, processing the metal layer into a metal mesh electrode by subjecting the metal layer to etching by using the black photoresist layer subjected to the patterning as an etching mask until the metal layer has a width smaller than a width of a thin wire line constituting a mesh of the black photoresist layer, and covering an upper surface and both side surfaces of a thin wire line constituting a mesh of the metal mesh electrode with the black photoresist layer by heating and softening the black photoresist layer to cause the black photoresist layer softened to flow.

First claim

Opening claim text (preview).

The invention claimed is: 1. An electrode film, comprising: a transparent base material; a metal mesh electrode provided on a first main surface of the transparent base material; and a black photoresist layer provided on an upper surface and both side surfaces of a thin wire line constituting a mesh of the metal mesh electrode, the black photoresist layer including a multi-layered configuration that includes a heat flowable photoresist layer and a heat non-flowable photoresist layer provided on the heat flowable photoresist layer, at least one of the heat flowable photoresist layer or the heat non-flowable photoresist layer, or both, being colored. 2. The electrode film according to claim 1 , wherein the heat non-flowable photoresist layer has a softening point higher than a softening point of the heat flowable photoresist layer by 20° C. or more. 3. The electrode film according to claim 1 , wherein the black photoresist layer includes only two layers including the heat flowable photoresist layer and the heat non-flowable photoresist layer, and a thickness ratio of the heat flowable photoresist layer and the heat non-flowable photoresist layer is from 1:2 to 1:4. 4. The electrode film according to claim 1 , wherein a rustproof resist layer is provided between the heat flowable photoresist layer and the heat non-flowable photoresist layer. 5. The electrode film according to claim 1 , wherein the heat flowable photoresist layer contains a rustproof agent. 6. The electrode film according to claim 1 , wherein only the heat non-flowable photoresist layer is colored. 7. The electrode film according to claim 1 , wherein only the heat flowable photoresist layer is colored. 8. A method for manufacturing an electrode film, the method comprising the steps of: laminating a metal layer on a first main surface of a transparent base material, and further laminating, on the metal layer, a black photoresist layer including a multi-layered configuration that includes a heat flowable photoresist layer and a heat non-flowable photoresist layer provided on the heat flowable photoresist layer, at least one of the heat flowable photoresist layer or the heat non-flowable photoresist layer, or both, being colored; subjecting the black photoresist layer to patterning in a mesh shape by partially exposing the black photoresist layer and performing development; processing the metal layer into a metal mesh electrode by subjecting the metal layer to etching by using the black photoresist layer subjected to the patterning as an etching mask until the metal layer has a width smaller than a width of a thin wire line constituting a mesh of the black photoresist layer; and covering an upper surface and both side surfaces of a thin wire line constituting a mesh of the metal mesh electrode with the black photoresist layer by heating and softening the black photoresist layer to cause the black photoresist layer softened to flow. 9. The method for manufacturing an electrode film according to claim 8 , wherein the heat non-flowable photoresist layer has a softening point higher than a softening point of the heat flowable photoresist layer by 20° C. or more. 10. The method for manufacturing an electrode film according to claim 8 , wherein the black photoresist layer includes only two layers including the heat flowable photoresist layer and the heat non-flowable photoresist layer, and a thickness ratio of the heat flowable photoresist layer and the heat non-flowable photoresist layer is from 1:2 to 1:4. 11. The method for manufacturing an electrode film according to claim 8 , wherein a rustproof resist layer is provided between the heat flowable photoresist layer and the heat non-flowable photoresist layer. 12. The method for manufacturing an electrode film according to claim 8 , wherein the heat flowable photoresist layer contains a rustproof agent. 13. The method for manufacturing an electrode film according to claim 8 , wherein only the heat non-flowable photoresist layer is colored. 14. The method for manufacturing an electrode film according to claim 8 , wherein only the heat flowable photoresist layer is colored.

Assignees

Inventors

Classifications

  • G06F3/0446Primary

    using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes · CPC title

  • comprising polyesters · CPC title

  • G06F3/0445Primary

    using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer · CPC title

  • Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material · CPC title

  • comprising polysulphones; polysulfides · CPC title

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What does patent US11397498B2 cover?
A method for manufacturing an electrode film includes the steps of laminating a metal layer and a black photoresist layer sequentially on a first main surface of a transparent base material, subjecting the black photoresist layer to patterning in a mesh shape by partially exposing the black photoresist layer and performing development, processing the metal layer into a metal mesh electrode by s…
Who is the assignee on this patent?
Nissha Co Ltd
What technology area does this patent fall under?
Primary CPC classification G06F3/0446. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jul 26 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).