Method for producing a microfluidic device

Patent metadata

Field	Value
Publication number	US-11389793-B2
Application number	US-201716640763-A
Country	US
Kind code	B2
Filing date	Sep 8, 2017
Priority date	Sep 8, 2017
Publication date	Jul 19, 2022
Grant date	Jul 19, 2022

Abstract

The present invention relates to a method for producing a microfluidic device, in particular, a sol-gel method for producing a microfluidic device in hybrid silica glass. The invention also relates to a microfluidic device obtainable by the method as described above and to microfluidic device in hybrid silica glass comprising at least one microchannel having a depth of at least 1 μm, preferably between 1 μm and 1 mm, and more preferably between 10 and 100 μm.

First claim

The invention claimed is:

1. A sol-gel method for producing a microfluidic device with a given pattern comprising the following steps:
a) implementing or preparing a sol A having a condensation ratio greater than or equal to 75%, preferably between 75 and 90%,
i. the preparation of said sol A comprising:
hydrolysis of at least one alkoxysilane of formula (I)
R n Si(OR′) 4−n   (I)

wherein n is 1, 2 or 3, preferably 1 or 2;
R is a hydrocarbyl radical having 1-12 carbon atoms;
R′ is a C 1 -C 6 alkyl group;
using at least one aqueous solution of at least one water soluble organic add catalyst,
condensation of the so-obtained hydrolysate;

ii. at least partially removing one or more side product of the hydrolysis reaction;
iii. using an organic solvent to collect the condensate obtained in i.;

b) optionally, evaporating an excess of solvent of said sol A;
c) patterning a volume of said sol A, preferably with flexible stamps;
d) curing the pattern of sol A issued from step c) to get at least one microfluidic gel pattern;
e) sealing at least one face of the microfluidic gel pattern with at least an element.

2. The method according to claim 1 , wherein the alkoxysilane of formula (I) is selected from the group consisting of TMOS (tetramethyl orthosilicate), TEOS (tetraethyl orthosilicate), MTEOS (methyltriethoxysilane), MTMOS (methyltrimethoxysilane), ETEOS (ethyltriethoxysilane), ETMOS (ethyltrimethoxysilane), VTEOS (vinyltriethoxysilane), VTMOS (vinyltrimethoxysilane) and mixtures thereof.

3. The method according to claim 1 , wherein the organic add catalyst is chosen among carboxylic adds, preferably carboxylic adds having 1 to 12 carbon atoms and 1 to 3 carboxylic add functions, and more preferably citric acid.

4. The method according to claim 1 , wherein, in step i., the molar ratio of the water to alkoxysilanes is ≥6, preferably ≥10.

5. The method according to claim 1 , wherein step iii) is performed by:
adding an organic solvent OS1 to the reaction mixture in order to produce a biphasic medium, and
separating the aqueous phase from the organic phase containing the condensate and the organic solvent OS1.

6. The method according to claim 5 , wherein after separation of the aqueous phase from the organic phase containing the condensate and the organic solvent OS1, the organic solvent OS1 is at least partially replaced by another solvent organic solvent OS2.

7. The method according to claim 1 , wherein sol A has a viscosity from 0.5 mPa·s −1 to 10 Pa·s −1 .

8. The method according to claim 1 , wherein the sol A in step c) has a viscosity ≥1 Pa·s −1 , preferably between 1 and 10 Pa·s −1 .

9. The method according to claim 1 , wherein step e) is done using sol A, preferably an element coated with sol A.

10. The method according to claim 9 , wherein said sol A has a viscosity from 0.5 to 100 mPa·s −1 .

11. The method according to claim 1 , wherein curing step d) is performed at a temperature ranging from 15° C. to 150° C., preferably from 20° C. to 120° C.

12. The method according to claim 1 , wherein the depth of the patterns on the microfluidic device range from 100 nm to 1 mm, from 10 to 500 μm, or from 10 to 100 μm.

13. The method according to claim 1 , wherein said method further comprises an additional step f) of surface treatment.

Assignees

• Total Sa
• Ecole Normale Superieure Lyon
• Centre National De La Rech Scientifique—Cnrs
• Univ Claude Bernard Lyon
• Centre Nat Rech Scient

Inventors

• Levant Michael
• Bartolo Denis
• Parola Stéphane
• Chateau Denis

Classifications

• B01L3/502707 Primary

  characterised by the manufacture of the container or its components · CPC title

• C03B19/12

  by liquid-phase reaction processes · CPC title

• B29C39/003

  characterised by the choice of material · CPC title

• C23C18/1295

  with after-treatment of the deposited inorganic material · CPC title

• B81C99/0085

  using moulds and master templates, e.g. for hot-embossing · CPC title