Optical scanning device and image forming apparatus including the same
US-9223131-B2 · Dec 29, 2015 · US
US11385454B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11385454-B2 |
| Application number | US-201916657984-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 18, 2019 |
| Priority date | Oct 18, 2019 |
| Publication date | Jul 12, 2022 |
| Grant date | Jul 12, 2022 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
Embodiments of the disclosure provide a micromachined mirror assembly. The micromachined mirror assembly includes a micro mirror, a first suspended beam, a second suspended beam, a first actuator, and a second actuator. The micro mirror is configured to tilt around an axis. The first suspended beam and second suspended beam each is mechanically coupled to the micro mirror along the axis. The first actuator is mechanically coupled to the first suspended beam and configured to apply a first torsional stress around the axis to the first suspended beam. The second actuator is mechanically coupled to the second suspended beam and configured to apply a second torsional stress around the axis to the second suspended beam. the first torsional stress and second torsional stress have a magnitude difference.
Opening claim text (preview).
What is claimed is: 1. A micromachined mirror assembly, comprising: a micro mirror configured to tilt around an axis; a first suspended beam and a second suspended beam each mechanically coupled to the micro mirror along the axis; a first actuator mechanically coupled to the first suspended beam and configured to apply a first torsional stress around the axis to the first suspended beam; and a second actuator mechanically coupled to the second suspended beam and configured to apply a second torsional stress around the axis to the second suspended beam, wherein the first torsional stress and second torsional stress are unbalanced by a magnitude difference. 2. The micromachine mirror assembly of claim 1 , wherein the first actuator is a first electrostatic actuator, and the second actuator is a second electrostatic actuator. 3. The micromachine mirror assembly of claim 2 , wherein the first electrostatic actuator comprises a first set of comb drives, and the second electrostatic actuator comprises a second set of comb drives. 4. The micromachine mirror assembly of claim 2 , wherein a first AC voltage applied to the first electrostatic actuator is different from a second AC voltage applied to the second electrostatic actuator. 5. The micromachine mirror assembly of claim 4 , wherein the first and second AC voltages have a DC offset. 6. The micromachine mirror assembly of claim 4 , wherein the first and second AC voltages have a phase offset. 7. The micromachine mirror assembly of claim 1 , wherein the magnitude difference between the first torsional stress and the second torsional stress is translated into a tensional stress along the axis. 8. The micromachine mirror assembly of claim 7 , wherein a resonant frequency of the micro mirror is increased by the tensional stress along the axis. 9. The micromachine mirror assembly of claim 8 , further comprising at least one heating element thermally coupled to at least one of the first and second suspended beams and configured to apply heat to the at least one of the first and second suspended beams, such that the resonant frequency of the micro mirror is decreased. 10. A micromachined mirror assembly, comprising: a micro mirror configured to tilt around an axis; a first suspended beam and a second suspended beam each mechanically coupled to the micro mirror along the axis; and at least one tensional actuator mechanically coupled to an end of at least one of the first and second suspended beams and configured to directly apply a tensional stress along the axis in a longitudinal direction away from the micro mirror to the at least one of the first and second suspended beams. 11. The micromachined mirror assembly of claim 10 , further comprising: a first torsional actuator mechanically coupled to the first suspended beam and configured to apply a first torsional stress around the axis to the first suspended beam; and a second torsional actuator mechanically coupled to the second suspended beam and configured to apply a second torsional stress around the axis to the second suspended beam. 12. The micromachine mirror assembly of claim 10 , wherein the tensional actuator is an electrostatic actuator. 13. The micromachine mirror assembly of claim 12 , wherein the electrostatic actuator comprises a set of comb drives. 14. The micromachine mirror assembly of claim 10 , wherein the at least one tensional actuator comprises: a first tensional actuator mechanically coupled to an end of the first suspended beam and configured to apply a first tensional stress along the axis to the first suspended beam; and a second tensional actuator mechanically coupled to an end of the second suspended beam and configured to apply a second tensional stress along the axis to the second suspended beam. 15. The micromachine mirror assembly of claim 10 , wherein the tensional stress pulls the at least one of the first and second suspended beams away from the micro mirror. 16. The micromachine mirror assembly of claim 10 , wherein a resonant frequency of the micro mirror is increased by the tensional stress along the axis. 17. The micromachine mirror assembly of claim 16 , further comprising at least one heating element thermally coupled o at least one of the first and second suspended beams and configured to apply heat to the at least one of the first and second suspended beams, such that the resonant frequency of the micro mirror is decreased. 18. The micromachine mirror assembly of claim 10 , wherein each of the first and second suspended beams is made of silicon. 19. A method for driving a micromachined mirror assembly, comprising: setting a resonant frequency of the micromachined mirror assembly at an initial value; and directly applying a tensional stress along an axis of the micromachined mirror assembly in a longitudinal direction away from the micromachined mirror assembly to increase the resonant frequency to a first operational value greater than the initial value during operation of the micromachined mirror assembly. 20. The method of claim 19 , further comprising applying heat to the micromachined mirror assembly to decrease the resonant frequency to a second operational value smaller than the initial value during operation of the micromachined mirror assembly.
using transmission of interrupted, pulse-modulated waves (determination of distance by phase measurements G01S17/32) · CPC title
with one or more pivoting mirrors or galvano-mirrors (G02B26/101 takes precedence) · CPC title
for mapping or imaging · CPC title
the reflecting element being moved or deformed by electrostatic means · CPC title
Simultaneous measurement of distance and other co-ordinates (indirect measurement G01S17/46) · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.