Material for photoelectric conversion element for use in imaging element, and photoelectric conversion element including same
US-2017040550-A1 · Feb 9, 2017 · US
US11374044B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11374044-B2 |
| Application number | US-201716318240-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 18, 2017 |
| Priority date | Jul 19, 2016 |
| Publication date | Jun 28, 2022 |
| Grant date | Jun 28, 2022 |
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The present invention pertains to a material for a photoelectric conversion element for use in an imaging element, the material containing a compound represented by formula (1) (in formula (1), R 1 and R 2 independently represent a substituted or unsubstituted fused heterocyclic aromatic group). The material can provide a photoelectric conversion element having excellent hole and electron leakage preventing properties, hole and electron transport properties, heat tolerance to processing temperatures, and visible light transparency.
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The invention claimed is: 1. A material for a photoelectric conversion element for use in an imaging element, comprising a compound represented by the following formula (1): wherein R 1 and R 2 independently represent a substituted or unsubstituted benzothienyl group, a substituted or unsubstituted benzofuranyl group, or a substituted or unsubstituted benzothiazole group. 2. The material for a photoelectric conversion element for use in an imaging element according to claim 1 , wherein the compound of the formula (1) is a compound represented by the following formula (2): wherein R 1 and R 2 are the same as R 1 and R 2 defined in the formula (1) according to claim 1 . 3. The material for a photoelectric conversion element for use in an imaging element according to claim 2 , wherein the compound of the formula (2) is a compound represented by the following formula (3): wherein R 1 and R 2 are the same as R 1 and R 2 defined in the formula (1) according to claim 1 . 4. The material for a photoelectric conversion element for use in an imaging element according to claim 1 , wherein R 1 and R 2 each represent a substituted or unsubstituted benzo[b]furan group, a substituted or unsubstituted benzo[b]thiophene group, or a substituted or unsubstituted 2-benzo[d]thiazole group. 5. A photoelectric conversion element for use in an imaging element, comprising the material for a photoelectric conversion element for use in an imaging element according to claim 1 . 6. A photoelectric conversion element for use in an imaging element, comprising: a p-type organic semiconductor material; and an n-type organic semiconductor material, wherein the p-type organic semiconductor material comprises the material for a photoelectric conversion element for use in an imaging element according to claim 1 . 7. A photoelectric conversion element for use in an imaging element, comprising: a first electrode film (A); a second electrode film (B); and a photoelectric conversion portion (C) disposed between the first electrode film and the second electrode film, wherein the photoelectric conversion portion (C) comprises at least: a photoelectric conversion layer (c- 1 ); and an organic thin-film layer (c- 2 ) other than the photoelectric conversion layer, and wherein the organic thin-film layer (c- 2 ) other than the photoelectric conversion layer comprises the material for a photoelectric conversion element for use in an imaging element according to claim 1 . 8. The photoelectric conversion element for use in an imaging element according to claim 7 , wherein the organic thin-film layer (c- 2 ) other than the photoelectric conversion layer is an electron blocking layer. 9. The photoelectric conversion element for use in an imaging element according to claim 7 , wherein the organic thin-film layer (c- 2 ) other than the photoelectric conversion layer is a hole blocking layer. 10. The photoelectric conversion element for use in an imaging element according to claim 7 , wherein the organic thin-film layer (c- 2 ) other than the photoelectric conversion layer is an electron transport layer. 11. The photoelectric conversion element for use in an imaging element according to claim 7 , wherein the organic thin-film layer (c- 2 ) other than the photoelectric conversion layer is a hole transport layer. 12. The photoelectric conversion element for use in an imaging element according to claim 5 , further comprising: a thin-film transistor (D) comprising a hole accumulation portion; and a signal readout portion (E) that reads a signal responding to charge accumulated in the thin-film transistor. 13. The photoelectric conversion element for use in an imaging element according to claim 12 , wherein the thin-film transistor (D) comprising a hole accumulation portion further comprises a connection portion (d) electrically connecting the hole accumulation portion to any one of the first electrode film and the second electrode film. 14. An imaging element comprising a plurality of photoelectric conversion elements for use in an imaging element according to claim 7 arranged in an array. 15. A photosensor comprising the photoelectric conversion element for use in an imaging element according to claim 7 . 16. A photosensor comprising the imaging element according to claim 14 .
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