Base material processing apparatus and base material processing method

Patent metadata

Field	Value
Publication number	US-11370233-B2
Application number	US-201816956661-A
Country	US
Kind code	B2
Filing date	Dec 11, 2018
Priority date	Dec 27, 2017
Publication date	Jun 28, 2022
Grant date	Jun 28, 2022

Abstract

A base material processing apparatus includes a transport mechanism, a mark detector, and a calculating unit. The transport mechanism transports an elongated strip-shaped base material in a longitudinal direction thereof along a predetermined transport path. The mark detector acquires a detection result by detecting a mark continuously at a detecting position on the transport path. The mark is applied previously to an end of the base material in a width direction thereof. The calculating unit calculates a transport speed of the base material, the amount of positional deviation of the base material in a transport direction, and tension on the base material applied in the transport direction on the basis of the detection result and information about the mark applied previously to the base material.

First claim

The invention claimed is:

1. A base material processing apparatus comprising:
a transport mechanism that transports an elongated strip-shaped base material in a longitudinal direction thereof along a predetermined transport path;
a mark detector that acquires a detection result by detecting a mark continuously or intermittently at a detecting position on said transport path, the mark being applied previously to an end of said base material in a width direction thereof; and
a calculating unit that calculates at least any of a transport speed of said base material, an amount of positional deviation of said base material in a transport direction, and tension on said base material applied in said transport direction on the basis of said detection result and information about said mark applied previously to said base material,
wherein said mark detector is an edge sensor that acquires a position of an edge of said base material in said width direction continuously or intermittently as a signal,
wherein the base material processing apparatus further comprising a filtering processing unit that removes a signal in a lower frequency region than a signal resulting from said mark from said signal detected by said edge sensor.

2. The base material processing apparatus according to claim 1 , wherein said base material is a transparent film.

3. The base material processing apparatus according to claim 2 , wherein
said mark detector includes:
a light-projecting part that projects light toward a front side of said base material; and
a light-receiving part that receives the light from said light-projecting part on a rear side of said base material.

4. The base material processing apparatus according to claim 1 , further comprising:
a mark applicator that applies said mark at an applying position upstream of said transport path from said detecting position to the end of said base material in said width direction.

5. The base material processing apparatus according to claim 4 , further comprising:
a second mark detector that acquires a second detection result by detecting said mark continuously or intermittently at a second detecting position downstream of said transport path from said detecting position, wherein
said calculating unit calculates at least any of a transport speed of said base material, the amount of positional deviation of said base material in said transport direction, and tension on said base material applied in said transport direction by comparing said detection result and said second detection result.

6. The base material processing apparatus according to claim 4 , wherein said mark is a periodic pattern.

7. The base material processing apparatus according to claim 4 , wherein said mark is a continuous pattern.

8. The base material processing apparatus according to claim 7 , wherein said mark is a pattern with waves.

9. The base material processing apparatus according to claim 4 , wherein said mark applicator is a processing unit that performs a process on a surface of said base material.

10. The base material processing apparatus according to claim 9 , wherein
said processing unit is an image recording unit that records an image by ejecting ink to the surface of said base material.

11. The base material processing apparatus according to claim 10 , further comprising:
an image recording time correcting unit that corrects timing of ejection of the ink from said image recording unit on the basis of a calculation result obtained by said calculating unit.

12. The base material processing apparatus according to claim 10 , further comprising:
a transport motion correcting unit that corrects a motion of said transport mechanism on the basis of a calculation result obtained by said calculating unit.

13. The base material processing apparatus according to claim 4 , wherein
said mark applicator is a plurality of image recording units arranged at intervals along said transport path, the image recording units recording images by ejecting different inks to a surface of said base material,
said image recording units record images each functioning as said mark at respective positions differing from each other in said width direction, and
said calculating unit calculates at least any of a transport speed of said base material, the amount of positional deviation of said base material in said transport direction, and tension on said base material applied in said transport direction on the basis of each of said marks applied to said positions differing in said width direction.

14. The base material processing apparatus according to claim 13 , further comprising:
an image recording time correcting unit that corrects timing of ejection of the ink from each of said image recording units on the basis of a calculation result obtained by said calculating unit.

15. A base material processing method comprising:
a) applying a mark at an applying position on a transport path along which an elongated strip-shaped base material is transported by a transport mechanism in a longitudinal direction thereof, the mark being applied to an end of said base material in a width direction thereof;
b) acquiring a detection result by detecting the position of an edge of said base material in said width direction continuously or intermittently at a detecting position downstream of said transport path from said applying position; and
c) implementing a filtering processing that removes a signal in a lower frequency region than a signal resulting from said mark from said detection result; and
d) calculating at least any of a transport speed of said base material, an amount of positional deviation of said base material in a transport direction, and tension on said base material applied in said transport direction on the basis of said detection result and information about said mark.

16. The base material processing method according to claim 15 , comprising:
e) correcting at least either timing of performing a process on a surface of said base material or the motion of said transport mechanism in consideration of a calculation result that is at least any of a transport speed of said base material, the amount of positional deviation of said base material in said transport direction, and tension on said base material applied in said transport direction, the step e) being performed after said step d).

Assignees

• Screen Holdings Co Ltd

Inventors

• Yoshida Mitsuhiro
• Usumoto Hiroaki
• Yamamoto Takaharu

Classifications

• B41J11/0095 Primary

  Detecting means for copy material, e.g. for detecting or sensing presence of copy material or its leading or trailing end · CPC title

• B41J15/04

  Supporting, feeding, or guiding devices; Mountings for web rolls or spindles · CPC title

• B41J2/2146

  for line print heads · CPC title

• B65H23/1882

  and controlling longitudinal register of web · CPC title

• B41J15/16

  Means for tensioning or winding the web · CPC title