Composition, film, glass article, compound, high purity composition, method for producing compound, and method for producing film

US11364710B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11364710-B2
Application numberUS-201816027257-A
CountryUS
Kind codeB2
Filing dateJul 3, 2018
Priority dateJan 12, 2016
Publication dateJun 21, 2022
Grant dateJun 21, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided are a composition which includes a compound having a benzodithiol structure and a compound having an —O—Si—O— structure and is capable of forming a film that has long-wavelength ultraviolet range shielding properties, high pencil hardness and good light fastness; a film; a glass article; a compound; a high purity composition; a method for producing a compound; and a method for producing a film.

First claim

Opening claim text (preview).

What is claimed is: 1. A composition, comprising: a compound having a benzodithiol structure and a silane coupling group; and a compound having an —O—Si—O— structure, wherein the compound having the benzodithiol structure and the silane coupling group is a compound represented by General Formula (I) or General Formula (II): in General Formula (I) or General Formula (II), R 1 and R 2 each independently represent a hydrogen atom, an alkyl group, an aryl group, an acyl group, or a carbamoyl group, R 3 and R 4 each independently represent a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkoxy group, or an aryloxy group, and W, X, Y, and Z each independently represent an electron withdrawing group; and W and X may be bonded to each other to form a ring, and Y and Z may be bonded to each other to form a ring; provided that R 1 , R 2 , R 3 , R 4 , W, X, Y, and Z may further have a substituent and at least one of R 1 , R 2 , R 3 , R 4 , W, X, Y, or Z contains the silane coupling group as a substituent, wherein the silane coupling group is a trialkoxysilyl group, a dialkoxyalkylsilyl group, or an alkoxydialkylsilyl group, wherein the compound having an —O—Si—O— structure as a hydrolyzable alkoxysilane is selected from the group consisting of tetramethoxysilane, tetraethoxysilane, tetra-n-propoxysilane, tetra-i-propoxysilane, tetra-n-butoxysilane, methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, n-propyltrimethoxysilane, n-propyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, γ-glycidyloxypropyltrimethoxysilane, γ-glycidyloxypropyltriethoxyslane, γ-glycidyloxypropylmethyldimethoxysilane, γ-glycidyloxypropylmethyldiethoxysilane, γ-methacryloyloxypropyltrimethoxysilane, γ-methacryloyloxypropyltriethoxysilane, γ-methacryloyloxypropylmethyldimethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, 3,4-epoxycyclohexylethyltrimethoxysilane, 3,4-epoxycyclohexylethyltriethoxysilane, tris-(trimethoxysilylpropyl)isocyanurate, 4-trimethoxysilylstyrene, 3,3,3-trifluoropropyltrimethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, diethyldimethoxysilane, diethyldiethoxysilane, di-n-propyldimethoxysilane, di-n-propyldiethoxysilane, diphenyldimethoxysilane, divinyldiethoxysilane, bis(triethoxysilylpropyl)tetrasulfide, 3-(trimethoxysilyl)propylisocyanate, and 3-(triethoxysilyl)propylisocyanate. 2. The composition according to claim 1 , wherein, in General Formula (I) or General Formula (II), at least one of R 1 or R 2 is a hydrogen atom. 3. The composition according to claim 1 , wherein, in General Formula (I) or General Formula (II), at least one of R 1 or R 2 is a carbamoyl group or an alkyl group, and R 3 and R 4 are hydrogen atoms. 4. The composition according to claim 1 , wherein the silane coupling group is the trialkoxysilyl group. 5. A film having a polysiloxane structure and formed from the composition according to claim 1 . 6. A glass article, comprising: a glass substrate; and the composition according to claim 1 positioned on at least a part of the glass substrate.

Assignees

Inventors

Classifications

  • C07F7/04Primary

    Esters of silicic acids · CPC title

  • containing silicone · CPC title

  • comprising glass as the main or only constituent of a layer, next to another layer of a specific {material} · CPC title

  • Polysiloxanes · CPC title

  • Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages · CPC title

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What does patent US11364710B2 cover?
Provided are a composition which includes a compound having a benzodithiol structure and a compound having an —O—Si—O— structure and is capable of forming a film that has long-wavelength ultraviolet range shielding properties, high pencil hardness and good light fastness; a film; a glass article; a compound; a high purity composition; a method for producing a compound; and a method for producin…
Who is the assignee on this patent?
Fujifilm Corp
What technology area does this patent fall under?
Primary CPC classification C07F7/04. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jun 21 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).