Semiconductor manufacturing method and semiconductor manufacturing device
US-2021272810-A1 · Sep 2, 2021 · US
US11362255B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11362255-B2 |
| Application number | US-202016830847-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 26, 2020 |
| Priority date | Feb 6, 2020 |
| Publication date | Jun 14, 2022 |
| Grant date | Jun 14, 2022 |
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Provided is a heat flow switching element which has a larger change in a thermal conductivity and has excellent thermal responsiveness. The heat flow switching element includes an N-type semiconductor layer, an insulator layer laminated on the N-type semiconductor layer, a P-type semiconductor layer laminated on the insulator layer, an N-side electrode connected to the N-type semiconductor layer, and a P-side electrode connected to the P-type semiconductor layer. In particular, the insulator layer is formed of a dielectric. Also, a plurality of N-type semiconductor layers and P-type semiconductor layers are laminated alternately with the insulator layer interposed therebetween.
Opening claim text (preview).
What is claimed is: 1. A heat flow switching element comprising: an N-type semiconductor layer; an insulator layer which is laminated on the N-type semiconductor layer; a P-type semiconductor layer which is laminated on the insulator layer; an N-side electrode which is connected to the N-type semiconductor layer; and a P-side electrode which is connected to the P-type semiconductor layer, wherein the N-type semiconductor layer and the P-type semiconductor layer are electrically insulated by the insulator layer disposed therebetween, and a thermal conductivity of the heat flow switching element is changed by applying an external voltage to the N-side electrode and the P-side electrode. 2. The heat flow switching element according to claim 1 , wherein the insulator layer is formed of a dielectric. 3. The heat flow switching element according to claim 1 , wherein a plurality of N-type semiconductor layers and P-type semiconductor layers are alternately laminated with the insulator layer interposed therebetween. 4. The heat flow switching element according to claim 1 , further comprising: an upper high thermal conductive portion which is provided on an uppermost surface, a lower high thermal conductive portion which is provided on a lowermost surface, and an outer peripheral thermal insulation portion which is provided to cover outer peripheral edges of the N-type semiconductor layer, the insulator layer, and the P-type semiconductor layer, wherein the upper high thermal conductive portion and the lower high thermal conductive portion are formed of a material having a higher heat conductivity than that of the outer peripheral thermal insulation portion. 5. The heat flow switching element according to claim 1 , further comprising: an upper thermal insulation portion which is provided on an uppermost surface, a lower thermal insulation portion which is provided on a lowermost surface, and a pair of outer peripheral high thermal conductive portions which are partially provided at two locations separated from each other on outer peripheral edges of the N-type semiconductor layer, the insulator layer, and the P-type semiconductor layer, wherein the outer peripheral high thermal conductive portion is formed of a material having a higher thermal conductivity than that of each of the upper thermal insulation portion and the lower thermal insulation portion. 6. The heat flow switching element according to claim 1 , wherein the N-type semiconductor layer and the P-type semiconductor layer are formed of a thin film having a thickness of less than 1 μm.
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