Support frame for pellicles, pellicle, and method for manufacturing same

US11360381B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11360381-B2
Application numberUS-201716334627-A
CountryUS
Kind codeB2
Filing dateAug 29, 2017
Priority dateSep 20, 2016
Publication dateJun 14, 2022
Grant dateJun 14, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

Provided are: a support frame for pellicle that has both low dust generation property and high light resistance, and further has an ion elution amount which is reduced to the utmost limit to an extent that haze is not generated even when a short wavelength laser is used for exposure light source, a pellicle using the support frame for pellicle, and a method for efficiently manufacturing the support frame for pellicle, support frame for pellicle which comprises a frame member comprising aluminum or aluminum alloy and an inorganic coating layer formed on the surface of the frame member, wherein the main chain of the inorganic coating layer is constituted by a —Si—O—Si—O— bond. An anodized film is preferably formed between the frame member and the inorganic coating layer.

First claim

Opening claim text (preview).

The invention claimed is: 1. A support frame for pellicle which comprises: a frame member comprising aluminum or aluminum alloy, and an inorganic coating layer formed on the surface of the frame member, wherein the main chain of the inorganic coating layer is constituted by a —Si—O—Si—O— bond, wherein, in ion elution test for measuring concentration of ion eluted by immersing the frame in pure water at80° C. for 4 hours, elution concentration of acetate ion to 100 ml of pure water per 100 cm 2 of the surface area is 0.2 ppm or less, elution concentration of formate ion is 0.2 ppm or less, elution concentration of oxalate ion is 0.2 ppm or less, elution concentration of sulfate ion is 0.1 ppm or less, elution concentration of nitrate ion is 0.2 ppm or less, elution concentration of nitrite ion is 0.2 ppm or less, elution concentration of chlorine ion is 0.2 ppm or less, and elution concentration of phosphate ion is 0.1 ppm or less, and wherein a thickness of the inorganic coating layer is 15 μm or more and 30 μm or less. 2. The support frame for pellicle according to claim 1 , which comprises: the frame member, an anodized film formed on the surface of the frame member, and the inorganic coating layer formed on the surface of the anodized film. 3. The support frame for pellicle according to claim 1 , wherein a lightness index *L value is 50 or less by blackening. 4. The support frame for pellicle according to claim 1 , wherein the frame is colored by at least one of dyeing pigmentation, natural coloring and electrolytic coloring. 5. A method for manufacturing the support frame for pellicle according to claim 1 , which comprises a step for applying an inorganic coating on the surface of the frame member comprising aluminum or aluminum alloy, and an inorganic coating agent having the molecular structure of: wherein R is a hydrocarbon group is used for the inorganic coating. 6. The method for manufacturing the support frame for pellicle according to claim 5 , which comprises: a first step for subjecting the frame member comprising aluminum or aluminum alloy to an anodizing treatment, and a second step for applying the inorganic coating to the surface of an anodized film formed by the anodizing treatment, wherein the inorganic coating agent is used for the inorganic coating. 7. The method for manufacturing the support frame for pellicle according to claim 5 , which further comprises: a coloring step for adjusting a lightness index *L value by at least one of dyeing pigmentation, natural coloring and electrolytic coloring. 8. The method for manufacturing the support frame for pellicle according to claim 5 , wherein the lightness index *L value is adjusted to 50 or less by blackening. 9. A pellicle comprising the support frame for pellicle according to claim 1 , and a pellicle film supported by the support frame for pellicle.

Assignees

Inventors

Classifications

  • only coatings of inorganic non-metallic material · CPC title

  • C25D11/18Primary

    After-treatment, e.g. pore-sealing · CPC title

  • containing inorganic acids · CPC title

  • Polysiloxanes · CPC title

  • comprising aluminium or copper {(B32B15/016 and B32B15/017 take precedence)} · CPC title

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What does patent US11360381B2 cover?
Provided are: a support frame for pellicle that has both low dust generation property and high light resistance, and further has an ion elution amount which is reduced to the utmost limit to an extent that haze is not generated even when a short wavelength laser is used for exposure light source, a pellicle using the support frame for pellicle, and a method for efficiently manufacturing the sup…
Who is the assignee on this patent?
Nippon Light Metal Co
What technology area does this patent fall under?
Primary CPC classification C25D11/18. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jun 14 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 7 related publications on this page (citations in our corpus or others sharing the same primary CPC).