Microjoule amplifier system for three photon microscopy utilizing existing femtosecond lasers used for two photon microscopy as a seed source

US11353773B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11353773-B2
Application numberUS-201916593839-A
CountryUS
Kind codeB2
Filing dateOct 4, 2019
Priority dateOct 5, 2018
Publication dateJun 7, 2022
Grant dateJun 7, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Disclosed are ideas to produce an add-on device which turns widely used high repetition rate lasers used for 2-photon microscopy into a light source which can be used for 3-photon microscopy. The add-on encompasses a device to reduce the pulse repetition rate of the high repetition rate (>50 MHz) laser source (laser or OPO) to less than 10 MHz which allows for higher pulse energies while maintaining reasonable average powers. If the high repetition sources operate below 1250 nm the add-on shifts or broadens the seed light to cover 1.3 μm to 1.8 μm before amplification. If the high repetition rate source operates at or around 1.3 μm the add-on only needs to amplify the pulse after downshifting the repetition rate. In another implementation the add-on shifts or broadens the 1.3 μm light to cover the spectral range out to 1.8 μm before amplification.

First claim

Opening claim text (preview).

What is claimed is: 1. An amplifier system, comprising: an optical parametric oscillator (OPO) producing femtosecond duration light pulses with a first repetition rate greater than 50 MHz and tuning range between 650 nm to 1400 nm and an average power of >1 W at the peak of the tuning range; a pulse picking device configured to reduce the pulses from the first repetition rate to a second repetition rate less than 10 MHz; a pulse stretching module configured to increase the pulse duration of the pulses from the pulse picking device to picosecond duration pulses; an amplifier configured to provide gains to the longer duration pulses; and a pulse compressing module configured to reduce the pulse duration of the amplified pulses to femtosecond duration pulses; wherein the system generates pulse energies on the order of micro Joule, capable of amplifying several 10 nm of bandwidth and operating between 1250 nm and 1800 nm. 2. The amplifier system of claim 1 , wherein the pulse picking device is a Pockels cell or an acousto-optic modulator (AOM). 3. The amplifier system of claim 1 , wherein the amplifier comprises one or more amplifier stages. 4. The amplifier system of claim 1 , wherein the pulse compressing module is configured to compress the pulses to output a pulse that is negatively chirped. 5. The amplifier system of claim 1 , wherein the light pulses from the OPO is either spectrally broadened in a highly non-linear fiber or frequency shifted to cover the 1700 nm to 1800 nm spectral region.

Assignees

Inventors

Classifications

  • G02F1/39Primary

    for parametric generation or amplification of light, infrared or ultraviolet waves · CPC title

  • Optical pulse train (comb) synthesizer · CPC title

  • Parametric amplification · CPC title

  • Nonlinear frequency conversion, e.g. second harmonic generation [SHG] or sum- or difference-frequency generation outside the laser cavity (nonlinear frequency conversion per se G02F1/35) · CPC title

  • Temporal shaping, e.g. pulse compression, frequency chirping (soliton generation and propagation G02F1/3513, H01S3/063 and H01S3/108) · CPC title

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What does patent US11353773B2 cover?
Disclosed are ideas to produce an add-on device which turns widely used high repetition rate lasers used for 2-photon microscopy into a light source which can be used for 3-photon microscopy. The add-on encompasses a device to reduce the pulse repetition rate of the high repetition rate (>50 MHz) laser source (laser or OPO) to less than 10 MHz which allows for higher pulse energies while mainta…
Who is the assignee on this patent?
Thorlabs Inc
What technology area does this patent fall under?
Primary CPC classification G02F1/39. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jun 07 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).