Systems and methods for ICPMS matrix offset calibration

Patent metadata

Field	Value
Publication number	US-11348773-B2
Application number	US-202117229107-A
Country	US
Kind code	B2
Filing date	Apr 13, 2021
Priority date	Dec 29, 2017
Publication date	May 31, 2022
Grant date	May 31, 2022

Abstract

Systems and methods are described for calibrating an analytical instrument analyzing a plurality of sample matrices in series. A system embodiment can include, but is not limited to, a sample analysis device configured to receive a plurality of samples from a plurality of remote sampling systems and to determine an intensity of one or more species of interest contained in each of the plurality of samples; and a controller configured to generate a primary calibration curve based on analysis of a first standard solution having a first sample matrix by the sample analysis device and generate at least one secondary calibration curve based on analysis of a second standard solution having a second sample matrix by the sample analysis device, the controller configured to associate the at least one secondary calibration curve with the primary calibration curve according to a matrix correction factor.

First claim

What is claimed is:

1. A system for calibrating an inductively-coupled plasma (ICP) analytical instrument comprising:
an ICP spectrometry instrument configured to receive a sample from a remote sampling system and to determine a concentration of a chemical species of interest in a first sample matrix in the received sample; and
a controller operably coupled to the ICP spectrometry instrument and configured to:
generate a primary calibration curve based on an analysis of different concentrations of the chemical species of interest in the first sample matrix by the ICP spectrometry instrument,
generate a secondary calibration curve based on an analysis of different concentrations of the chemical species of interest in a second sample matrix by the ICP spectrometry instrument,
determine a matrix correction factor associating the secondary calibration curve with the primary calibration curve, wherein the primary calibration curve has a primary curve slope and the secondary calibration curve has a second curve slope, and
update the primary calibration curve based on periodic analysis of different concentrations of the chemical species of interest in the second sample matrix by the ICP spectrometry instrument.

2. The system of claim 1 , wherein the ICP spectrometry instrument is disposed at a first location and the remote sampling system is disposed at a second location, the first location being remote from the second location.

3. The system of claim 1 , wherein the second sample matrix is relatively more responsive to at least one of attenuation and drift at the ICP spectrometry instrument than the first sample matrix.

4. A method of calibrating an inductively-coupled plasma (ICP) analytical instrument comprising:
generating a primary calibration curve based on an analysis of a first standard solution of a chemical species of interest having a first sample matrix by an ICP spectrometry instrument;
generating a secondary calibration curve based on an analysis of a second standard solution of the chemical species of interest having a second sample matrix by the ICP spectrometry instrument;
determining a matrix correction factor for the secondary calibration curve to associate the secondary calibration curve with the primary calibration curve; and
updating the primary calibration curve based on periodic analysis of different concentrations of the chemical species of interest in the first sample matrix by the ICP spectrometry instrument.

5. The method of claim 4 , wherein generating the primary calibration curve comprises generating the primary calibration curve based on an analysis of different concentrations of the chemical species of interest in a first sample matrix by the ICP spectrometry instrument.

6. The method of claim 4 , wherein generating the secondary calibration curve comprises generating the secondary curve based on an analysis of different concentrations of the chemical species of interest in the second sample matrix by the ICP spectrometry instrument.

7. The method of claim 4 , wherein the first sample matrix is relatively more responsive to at least one of attenuation and drift at the ICP spectrometry instrument than the second sample matrix.

8. A system for calibrating an inductively-coupled plasma (ICP) analytical instrument comprising:
a processor configured to be communicatively coupled to an ICP spectrometry instrument configured to receive a sample and to determine a concentration of a chemical species of interest in a first sample matrix in the received sample; and
at least one memory comprising computer program code, the at least one memory and the computer program code configured to, with the processor, cause at least one of the processor or the ICP spectrometry instrument to:
generate a primary calibration curve based on an analysis of different concentrations of the chemical species of interest in the first sample matrix by the ICP spectrometry instrument,
generate a secondary calibration curve based on an analysis of different concentrations of the chemical species of interest in a second sample matrix by the ICP spectrometry instrument, and
determine a matrix correction factor associating the secondary calibration curve with the primary calibration curve.

9. The system of claim 8 , wherein the processor further causes the ICP spectrometry instrument to generate the primary calibration curve based on an analysis of different concentrations of the chemical species of interest in a first sample matrix by the ICP spectrometry instrument.

10. The system of claim 8 , wherein the at least one processor further causes the ICP spectrometry instrument to generate the secondary curve based on an analysis of different concentrations of the chemical species of interest in the second sample matrix by the ICP spectrometry instrument.

11. The system of claim 8 , wherein the first sample matrix is relatively more responsive to at least one of attenuation and drift at the ICP spectrometry instrument than the second sample matrix.

12. The system of claim 8 , wherein the processor further causes the ICP spectrometry instrument to update the primary calibration curve based on periodic analysis of different concentrations of the chemical species of interest in the first sample matrix by the ICP spectrometry instrument.

13. The system of claim 8 , wherein the at least one processor further causes the ICP spectrometry instrument to determine the matrix correction factor by dividing a slope of the secondary calibration curve by a slope of the primary calibration curve.

Assignees

• Elemental Scientific Inc

Inventors

• Wiederin Daniel R
• Uhlmeyer Kyle W
• Field Michael P
• Lee Jae Seok

Classifications

• G01N21/73 Primary

  using plasma burners or torches · CPC title

• H01J49/105

  using high-frequency excitation, e.g. microwave excitation, Inductively Coupled Plasma [ICP] · CPC title

• H01J49/0009 Primary

  Calibration of the apparatus · CPC title

• G01N33/18

  Water · CPC title

• G01J2003/2866

  Markers; Calibrating of scan · CPC title