Plating apparatus

Patent metadata

Field	Value
Publication number	US-11339496-B2
Application number	US-202016890780-A
Country	US
Kind code	B2
Filing date	Jun 2, 2020
Priority date	Jun 13, 2019
Publication date	May 24, 2022
Grant date	May 24, 2022

Abstract

There is provided a shielding plate that adjusts an electric potential distribution on a substrate near the substrate. According to one embodiment, there is provided a plating apparatus for performing a plating process on the substrate. The plating apparatus includes a substrate holder, the shielding plate, and a moving mechanism. The substrate holder holds the substrate. The shielding plate is disposed adjacent to the substrate holder. The moving mechanism moves the shielding plate in a direction of approaching the substrate holder and a direction away from the substrate holder. The shielding plate is moved to the substrate holder by the moving mechanism to be contactable with the substrate holder.

First claim

What is claimed is:

1. A plating apparatus for performing a plating process on a substrate, the plating apparatus comprising:
a substrate holder for holding the substrate;
a shielding plate disposed adjacent to the substrate holder;
a plating tank configured to receive the substrate holder and the shielding plate; and
a moving mechanism for moving the shielding plate in a direction of approaching the substrate holder and a direction away from the substrate holder, wherein
the shielding plate is moved to the substrate holder by the moving mechanism to be contactable with the substrate holder,
the substrate holder defines an opening from which a part of the held substrate is exposed, and
the shielding plate defines an opening, and the opening of the shielding plate has a dimension smaller than a dimension of the opening of the substrate holder,
the moving mechanism includes a fluid spring,
the plating tank includes a supporting member for supporting the shielding plate,
the supporting member is a plate-shaped member extending from an open upper end to a lower end of the plating tank,
the fluid spring is coupled to the supporting member and the shielding plate.

2. The plating apparatus according to claim 1 , wherein
the shielding plate includes a sealing member contactable with the substrate holder.

3. The plating apparatus according to claim 1 , wherein
the substrate holder includes a sealing member contactable with the shielding plate.

4. The plating apparatus according to claim 1 , wherein
the moving mechanism is configured to change a distance between the substrate holder and the shielding plate during the plating process.

5. The plating apparatus according to claim 4 , further comprising
a controller configured to control an operation of the moving mechanism.

6. The plating apparatus according to claim 1 , wherein
the fluid spring extends across the overall height of the supporting member.

Assignees

• Ebara Corp

Inventors

• Hirao Tomonori

Classifications

• C25D17/02 Primary

  Tanks; Installations therefor · CPC title

• C25D21/12

  Process control or regulation (controlling or regulating in general G05) · CPC title

• C25D17/06 Primary

  Suspending or supporting devices for articles to be coated · CPC title

• C25D17/008 Primary

  Current shielding devices · CPC title

• C25D17/004

  Sealing devices · CPC title