Quantum dot solid-state film and method for preparing same, and quantum dot light-emitting diode

US11335873B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11335873-B2
Application numberUS-201816493606-A
CountryUS
Kind codeB2
Filing dateMar 13, 2018
Priority dateMar 15, 2017
Publication dateMay 17, 2022
Grant dateMay 17, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

Disclosed are quantum dot solid-state film, method for preparing same, and quantum dot light-emitting diode. Method comprises: providing quantum dot solution, preparing quantum dot material solid-state film on substrate; before being immersed in surface modifier solution to obtain quantum dot material solid-state film modified by a surface modifier; providing a metal nanoparticle seed solution, using solution method to deposit nanoparticle on quantum dot material solid-state film modified by surface modifier to obtain a quantum dot material solid-state film with the surface having adsorbed a layer of metal nanoparticle seed; before being immersed in a metal nano wire precursor solution, nanoparticle to perform a metal nano wire growth, finally obtaining a quantum dot solid-state film. The quantum dot solid-state film obtained using method of invention can effectively and rapidly transmit electrical charges, improving overall performance of device.

First claim

Opening claim text (preview).

What is claimed is: 1. A quantum dot solid-state film, wherein the quantum dot solid-state film comprises a quantum dot material solid-state film, the quantum dot material solid-state film has a layer of metal nanowires grown on a surface, the layer of metal nanowires being grown in a direction perpendicular to the surface, wherein the quantum dot material solid-state film comprises a quantum dot and a surface modifier, and the surface modifier is at least one of a (3-aminoethyl) triethoxysilane, a (3-aminobutyl) triethoxysilane, a (3-aminoethyl) tripropoxysilane, a (3-aminopropyl) tripropoxysilane, a (3-aminobutyl) tripropoxysilane, a (3-aminoethyl) tributoxysilane, a (3-aminopropyl tributyloxysilane, and a (3-aminobutyl) tributoxysilane. 2. The quantum dot solid-state film according to claim 1 , wherein the metal nanowire is one of an Au nanowire, an Ag nanowire, and a Cu nanowire. 3. A quantum dot light emitting diode, wherein the quantum dot light emitting diode comprises a cathode and an anode, and between the cathode and the anode, a quantum dot solid-state film is arranged, the quantum dot material solid-state film has a layer of metal nanowires grown on a surface, the layer of metal nanowires being grown in a direction perpendicular to the surface, wherein the quantum dot material solid-state film comprises a quantum dot and a surface modifier, and the surface modifier is at least one of a (3-aminoethyl) triethoxysilane, a (3-aminobutyl) triethoxysilane, a (3-aminoethyl) tripropoxysilane, a (3-aminopropyl) tripropoxysilane, a (3-aminobutyl) tripropoxysilane, a (3-aminoethyl) tributoxysilane, a (3-aminopropyl tributyloxysilane, and a (3-aminobutyl) tributoxysilane. 4. The quantum dot light emitting diode according to claim 3 , further comprising an anode, a hole injection layer, a hole transport layer, a quantum dot solid-state film, an electron transport layer and a cathode combined in a laminated sequence. 5. The quantum dot light emitting diode according to claim 3 , wherein the metal nanowire is one of an Au nanowire, an Ag nanowire, and a Cu nanowire. 6. The quantum dot solid-state film according to claim 1 , wherein the quantum dot is a binary phase quantum dot. 7. The quantum dot solid-state film according to claim 1 , wherein the quantum dot is a ternary phase quantum dot. 8. The quantum dot solid-state film according to claim 1 , wherein the quantum dot is a quaternary phase quantum dot.

Assignees

Inventors

Classifications

  • Manufacture or treatment of nanostructures · CPC title

  • Nanooptics, e.g. quantum optics or photonic crystals · CPC title

  • B82Y30/00Primary

    Nanotechnology for materials or surface science, e.g. nanocomposites · CPC title

  • Electricity · mapped topic

  • Electricity · mapped topic

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Frequently asked questions

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What does patent US11335873B2 cover?
Disclosed are quantum dot solid-state film, method for preparing same, and quantum dot light-emitting diode. Method comprises: providing quantum dot solution, preparing quantum dot material solid-state film on substrate; before being immersed in surface modifier solution to obtain quantum dot material solid-state film modified by a surface modifier; providing a metal nanoparticle seed solution,…
Who is the assignee on this patent?
Tcl Tech Group Corp
What technology area does this patent fall under?
Primary CPC classification B82Y30/00. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue May 17 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).