Multi-block sputtering target and associated methods and articles

US11328912B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11328912-B2
Application numberUS-202016902830-A
CountryUS
Kind codeB2
Filing dateJun 16, 2020
Priority dateMay 10, 2011
Publication dateMay 10, 2022
Grant dateMay 10, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A sputtering target that includes at least two consolidated blocks, each block including an alloy including molybdenum in an amount greater than about 30 percent by weight and at least one additional alloying ingredient; and a joint between the at least two consolidated blocks, the joint being free of any microstructure due to an added bonding agent (e.g., powder, foil or otherwise), and being essentially free of any visible joint line the target that is greater than about 200 μm width (e.g., less than about 50 μm width). A process for making the target includes hot isostatically pressing, below a temperature of 1080° C., consolidated perform blocks that may be surface prepared (e.g., roughened to a predetermined roughness value) prior to pressing.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for making a sputtering target, the method comprising: providing first and second at least partially consolidated powder metal blocks each comprising an alloy including molybdenum in an amount greater than about 30 percent by weight and at least one additional alloying element, wherein (i) within the first and second blocks there is (a) a molybdenum phase, (b) a phase of the at least one additional alloying element, and (c) a third phase comprising an alloy of molybdenum at the at least one additional alloying element, (ii) the third phase is present in an amount greater than 30 volume percent, and (iii) the molybdenum phase is present in an amount greater than 30 volume percent; directly contacting opposing surfaces of the first block and the second block in the absence of any bonding agent between the directly contacted surfaces to form a contacted joint structure; and isostatically pressing the contacted joint structure at a pressure and for a time sufficient to realize a consolidated joint between the first and second blocks, whereby a sputtering target is formed. 2. The method of claim 1 , wherein the contacted joint structure is isostatically pressed at a temperature that is less than about 1080° C. 3. The method of claim 1 , wherein the sputtering target at the joint exhibits a transverse rupture strength per ASTM B528-10, of at least 600 MPa. 4. The method of claim 1 , wherein the consolidated joint is essentially free of any joint line of greater than about 300 μm width. 5. The method of claim 1 , wherein the consolidated joint is essentially free of any joint line of greater than about 200 μm width. 6. The method of claim 1 , wherein the at least one additional alloying element is selected from titanium, chromium, niobium, tantalum, tungsten, zirconium, hafnium, vanadium, lithium, sodium, potassium, or any combination thereof. 7. The method of claim 1 , further comprising, before directly contacting the opposing surfaces of the first block and the second block, milling the opposing surfaces to an average surface roughness (Ra) of less than about 5.1 μm. 8. The method of claim 1 , further comprising, before directly contacting the opposing surfaces of the first block and the second block, milling the opposing surfaces to an average surface roughness (Ra) of less than about 3.8 μm. 9. The method of claim 1 , wherein each of the first and second blocks comprises about 30 to about 70 at % molybdenum and the balance titanium, exclusive of impurities. 10. The method of claim 1 , wherein the sputtering target has a sputtering surface having an area of at least about 1.5 m 2 . 11. The method of claim 1 , wherein the sputtering target at the joint exhibits a transverse rupture strength per ASTM B528-10, of at least 800 MPa. 12. The method of claim 1 , wherein the sputtering target at the joint exhibits a transverse rupture strength per ASTM B528-10, of at least 900 MPa. 13. A method for making a sputtering target, the method comprising: providing first and second at least partially consolidated powder metal blocks each comprising an alloy including molybdenum in an amount greater than about 30 percent by weight and at least one additional alloying element; directly contacting opposing surfaces of the first block and the second block in the absence of any bonding agent between the directly contacted surfaces to form a contacted joint structure; and isostatically pressing the contacted joint structure at a pressure and for a time sufficient to realize a consolidated joint between the first and second blocks, whereby a sputtering target is formed, wherein the sputtering target at the joint exhibits a transverse rupture strength per ASTM B528-10, of at least 800 MPa. 14. The method of claim 13 , wherein the sputtering target at the joint exhibits a transverse rupture strength per ASTM B528-10, of at least 900 MPa. 15. The method of claim 13 , wherein the at least one additional alloying element is selected from titanium, chromium, niobium, tantalum, tungsten, zirconium, hafnium, vanadium, lithium, sodium, potassium, or any combination thereof. 16. A method for making a sputtering target, the method comprising: providing first and second at least partially consolidated powder metal blocks each comprising an alloy including molybdenum in an amount greater than about 30 percent by weight and at least one additional alloying element; directly contacting opposing surfaces of the first block and the second block in the absence of any bonding agent between the directly contacted surfaces to form a contacted joint structure; and isostatically pressing the contacted joint structure at a pressure and for a time sufficient to realize a consolidated joint between the first and second blocks, whereby a sputtering target is formed, wherein directly contacting opposing surfaces of the first block and the second block comprises overlapping at least portions of the opposing surfaces to form at least one of a scarf joint, a lap joint, or a dovetail joint. 17. The method of claim 16 , wherein the at least one additional alloying element is selected from titanium, chromium, niobium, tantalum, tungsten, zirconium, hafnium, vanadium, lithium, sodium, potassium, or any combination thereof. 18. A sputtering target, comprising: a) at least two consolidated blocks, each block including an alloy including molybdenum in an amount greater than about 30 percent by weight and at least one additional alloying element; and b) a joint between the at least two consolidated blocks, which joins the blocks together to define a target body, the joint being free of any microstructure due to an added bonding agent, wherein the joint comprises at least one of a scarf joint, a lap joint, or a dovetail joint. 19. The sputtering target of claim 18 , wherein, throughout the at least two consolidated blocks there is a continuous and uniform distribution of (a) a molybdenum phase, (b) a phase of the at least one additional alloying element, and (c) a third phase comprising an alloy of molybdenum at the at least one additional alloying element. 20. The sputtering target of claim 19 , wherein the third phase is present in an amount greater than 30 volume percent. 21. The sputtering target of claim 19 , wherein the molybdenum phase is present in an amount greater than 30 volume percent. 22. The sputtering target of claim 18 , wherein the sputtering target at the joint exhibits a transverse rupture strength per ASTM B528-10, of at least 800 MPa. 23. The sputtering target of claim 18 , wherein the at least one additional alloying element is selected from titanium, chromium, niobium, tantalum, tungsten, zirconium, hafnium, vanadium, lithium, sodium, potassium, or any combination thereof. 24. The sputtering target of claim 18 , wherein the joint comprises a scarf joint. 25. The sputtering target of claim 18 , wherein the joint comprises a lap joint. 26. The sputtering target of claim 18 , wherein the joint comprises a dovetail joint.

Assignees

Inventors

Classifications

  • Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties · CPC title

  • Impact or kinetic deposition of particles · CPC title

  • by powder metallurgy (C22C1/08 takes precedence) · CPC title

  • Hot isostatic pressing · CPC title

  • Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy · CPC title

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What does patent US11328912B2 cover?
A sputtering target that includes at least two consolidated blocks, each block including an alloy including molybdenum in an amount greater than about 30 percent by weight and at least one additional alloying ingredient; and a joint between the at least two consolidated blocks, the joint being free of any microstructure due to an added bonding agent (e.g., powder, foil or otherwise), and being …
Who is the assignee on this patent?
Starck H C Inc
What technology area does this patent fall under?
Primary CPC classification C23C14/3414. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 10 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).