Ion-doped two-dimensional nanomaterials

US11325343B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11325343-B2
Application numberUS-201716484024-A
CountryUS
Kind codeB2
Filing dateSep 11, 2017
Priority dateFeb 6, 2017
Publication dateMay 10, 2022
Grant dateMay 10, 2022

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Abstract

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Ion-doped two-dimensional nanomaterials are made by inducing electronic carriers (electrons and holes) in a two-dimensional material using a captured ion layer at the surface of the material. The captured ion layer is stabilized using a capping layer. The induction of electronic carriers works in atomically-thin two-dimensional materials, where it induces high carrier density of at least 1014 carriers/cm2. A variety of novel ion-doped nanomaterials and p-n junction-based nanoelectronic devices are made possible by the method.

First claim

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What is claimed is: 1. An ion-doped nanomaterial comprising: a layer of a two-dimensional material; a layer of captured ions disposed on a surface of the two-dimensional material, wherein the captured ions are positive ions selected from the group consisiting of N 2 30 , N + , O 2 + , and Ar + , and electrons are induced in the two-dimensional nanomaterial, rendering it n-doped, or wherein the captured ions are negative ions selected from the group consisiting of N 2 − , O 2 − , and CO 3 − , and holes are induced in the two-dimensional nanomaterial, rendering it p-doped; and a capping layer disposed above the captured ion layer; wherein the capping layer retains at least a portion of the captured ions adjacent to the surface of the two-dimensional material; and wherein the captured ions stabilize charge carriers in the two-dimensional material. 2. The ion-doped nanomaterial of claim 1 , wherein the two-dimensional material comprises graphene or carbon nanotubes. 3. The ion-doped nanomaterial of claim 1 , wherein the two-dimensional material comprises a material selected from the group consisting of GaS, GaSe, InS, InSe, HfS 2 , HfSe 2 , HfTe 2 , MoS 2 , MoSe 2 , MoTe 2 , NbS 2 , NbSe 2 , NbTe 2 , NiS 2 , NiSe 2 , NiTe 2 , PdS 2 , PdSe 2 , PdTe 2 , PtS 2 , PtSe 2 , PtTe 2 , ReS 2 , ReSe 2 , ReTe 2 , TaS 2 , TaSe 2 , TaTe 2 , TiS 2 , TiSe 2 , TiTe 2 , WS 2 , WSe 2 , WTe 2 , ZrS 2 , ZrSe 2 , and ZrTe 2. 4. The ion-doped nanomaterial of claim 1 , wherein the two-dimensional material has a thickness in the range from one atomic layer to about 10 atomic layers. 5. The ion-doped nanomaterial of claim 1 having a carrier density of at least 1×10 14 cm −2 . 6. The ion-doped nanomaterial of claim 1 , further comprising an insulating or semiconducting substrate upon which the two-dimensional material is deposited, wherein the two-dimensional material contacts the substrate at a surface opposite to the surface on which the captured ions are disposed. 7. The ion-doped nanomaterial of claim 6 , wherein the substrate comprises or consists of silicon, silicon dioxide, a layer of silicon dioxide disposed over a layer of silicon, or an organic polymer. 8. The ion-doped nanomaterial of claim 1 , wherein the capping layer comprises a material selected from the group consisting of polydimethylsiloxane (PDMS), poly(methyl methacrylate) (PMMA), or a photoresist. 9. The ion-doped nanomaterial of claim 1 , wherein the thickness of the capping layer is in the range from about 100 nm to about 100 μm. 10. A p-n junction comprising a p-doped nanomaterial of claim 1 , wherein positive ions are captured and electrons are induced in the two-dimensional nanomaterial, adjacent to an n-doped nanomaterial of claim 1 , wherein negative ions are captured and holes are induced in the two-dimensional nanomaterial, forming a p-n junction between the p-doped and n-doped nanomaterials. 11. An electronic device comprising the ion-doped nanomaterial of claim 1 . 12. The device of claim 11 which is a diode, transistor, field-effect transistor, tunneling field effect transistor, photovoltaic device, light-emitting diode, or solar cell.

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What does patent US11325343B2 cover?
Ion-doped two-dimensional nanomaterials are made by inducing electronic carriers (electrons and holes) in a two-dimensional material using a captured ion layer at the surface of the material. The captured ion layer is stabilized using a capping layer. The induction of electronic carriers works in atomically-thin two-dimensional materials, where it induces high carrier density of at least 1014 c…
Who is the assignee on this patent?
Univ Northeastern
What technology area does this patent fall under?
Primary CPC classification B82Y30/00. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue May 10 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).