Method for preparing monosilane using trialkoxysilane
US-2015251916-A1 · Sep 10, 2015 · US
Method for stabilizing chlorosilane polymer
US11319212B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11319212-B2 |
| Application number | US-201916282413-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 22, 2019 |
| Priority date | Nov 16, 2016 |
| Publication date | May 3, 2022 |
| Grant date | May 3, 2022 |
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Abstract
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This disclosure is to make it possible to easily stabilize a chlorosilane polymer while preventing a solid chlorosilane polymer from being generated. Disclosed is a method for stabilizing a chlorosilane polymer generated secondarily in a step of a chemical vapor deposition method using chlorosilane-based gas, the method including: a step of bringing alcohol into contact with the chlorosilane polymer, degrading the chlorosilane polymer to alkoxide, hydrogen chloride and hydrogen, and diluting the degraded alkoxide with the alcohol; and a step of performing hydrolysis for the alkoxide.
First claim
Opening claim text (preview).
What is claimed is: 1. A method for degrading a chlorosilane polymer generated secondarily in a step of a chemical vapor deposition method using chlorosilane-based gas, the method comprising: a step of bringing ethanol, allowing containing 10% or less of impurities including water, into contact with the chlorosilane polymer, degrading the chlorosilane polymer to alkoxide, hydrogen chloride and hydrogen, and diluting the degraded alkoxide, hydrogen chloride and hydrogen with the ethanol; and a step of performing hydrolysis for the alkoxide by pouring the ethanol containing the diluted alkoxide into water. 2. The method according to claim 1 , wherein the step of the chemical vapor deposition method deposits at least one of silicon carbide, silicon and a silicon compound. 3. The method according to claim 2 , wherein the alkoxide comprises tetraethoxysilane. 4. The method according to claim 2 , wherein the chlorosilane-based gas comprises at least one of methyltrichlorosilane and trichlorosilane. 5. The method according to claim 1 , wherein the chlorosilane-based gas comprises at least one of methyltrichlorosilane and trichlorosilane. 6. The method according to claim 1 , wherein the alkoxide comprises tetraethoxysilane.
Assignees
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Classifications
- C01B33/10794Primary
by forming addition compounds or complexes, the reactant being possibly contained in an adsorbent · CPC title
Halogenated silanes · CPC title
Cleaning of reactor or parts inside the reactor by using reactive gases · CPC title
Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps · CPC title
Silicon carbide · CPC title
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- What does patent US11319212B2 cover?
- This disclosure is to make it possible to easily stabilize a chlorosilane polymer while preventing a solid chlorosilane polymer from being generated. Disclosed is a method for stabilizing a chlorosilane polymer generated secondarily in a step of a chemical vapor deposition method using chlorosilane-based gas, the method including: a step of bringing alcohol into contact with the chlorosilane po…
- Who is the assignee on this patent?
- Ihi Corp
- What technology area does this patent fall under?
- Primary CPC classification C01B33/10794. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue May 03 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).