Thermal acid generator and resist composition using same

Patent metadata

Field	Value
Publication number	US-11307495-B2
Application number	US-201716071397-A
Country	US
Kind code	B2
Filing date	Jan 23, 2017
Priority date	Jan 26, 2016
Publication date	Apr 19, 2022
Grant date	Apr 19, 2022

Abstract

Provided are: a thermal acid generator having a high acid generation temperature; and a resist composition using the same. The thermal acid generator is a sulfonic acid derivative compound represented by the following Formula (I): (wherein, R1 represents an aliphatic hydrocarbon group having 1 to 18 carbon atoms or the like, or a group represented by the following Formula (II): (wherein, Y1 represents a single bond or an alkanediyl group having 1 to 4 carbon atoms; R11 and R12 each independently represent an alkanediyl group having 2 to 6 carbon atoms, or the like; R13 represents a linear or branched alkyl group having 1 to 18 carbon atoms, or the like; a and b each represent 0 or 1; and either a or b is 1); R2 to R7 each independently represent a linear or branched alkyl group having 1 to 14 carbon atoms; the aliphatic hydrocarbon group or the like of R1 has no substituent or is substituted with a halogen atom or the like; and a methylene structure in the aliphatic hydrocarbon group or the like of R1 is optionally substituted with —O— or the like).

First claim

The invention claimed is:

1. A thermal acid generator selected from the group consisting of:

2. A resist composition comprising the thermal acid generator according to claim 1 .

3. A method of making a resist, said method comprising:
heating an acid-reactive organic substance and the thermal acid generator of claim 1 , wherein said heating of the thermal acid generator releases a Lewis acid to induce a polymerization or cross-linking of said acid-reactive organic substance to make said resist;
wherein the polymerization or cross-linking is performed at a heating condition of 200 to 250° C. for 1 to 100 minutes.

4. A resist obtained by the method according to claim 3 .

5. A method of making a resist, said method comprising:
heating an acid-reactive organic substance and the thermal acid generator according to claim 1 , wherein said heating of the thermal acid generator releases a Lewis acid to induce a polymerization or cross-linking of said acid-reactive organic substance to make said resist;
wherein the polymerization or cross-linking is performed at a heating condition of 70 to 300° C. for 1 to 100 minutes; and
wherein an amount of the thermal acid generator is 0.05 to 100 parts by mass with respect to 100 parts by mass of the acid-reactive organic substance.

6. A resist obtained by the method according to claim 5 .

Assignees

• Adeka Corp

Inventors

• Miyake Junya
• Takeuchi Yoshitomo
• Sato Naomi
• Kimura Kentaro

Classifications

• G03F7/0392

  the macromolecular compound being present in a chemically amplified positive photoresist composition · CPC title

• G03F7/0382

  the macromolecular compound being present in a chemically amplified negative photoresist composition · CPC title

• G03F7/0007 Primary

  Filters, e.g. additive colour filters; Components for display devices · CPC title

• G03F7/0045 Primary

  with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title

• G03F7/004 Primary

  Photosensitive materials (G03F7/12, G03F7/14 take precedence) · CPC title