Mask repairing apparatus and mask repairing method

Patent metadata

Field	Value
Publication number	US-11306386-B2
Application number	US-201916545173-A
Country	US
Kind code	B2
Filing date	Aug 20, 2019
Priority date	Oct 24, 2018
Publication date	Apr 19, 2022
Grant date	Apr 19, 2022

Abstract

A mask repairing apparatus may include a stage, a stereoscopic imaging unit to measure a stereoscopic image of a mask on the stage, a control unit to compare the stereoscopic image with a normal image of the mask and to produce a defect image of the mask, and a laser unit to irradiate a laser beam onto a deficient part of the mask, under control of the control unit. The control unit may control the laser unit, based on the defect image, such that the laser beam is sequentially irradiated onto m multiple layers of the deficient part while repeatedly moving in a first direction and a second direction crossing each other.

First claim

What is claimed is:

1. A mask repairing method, comprising:
producing a stereoscopic image of a mask, in which a plurality of openings are defined;
comparing the stereoscopic image with a normal image of the mask to produce a defect image of the mask, the defect image of the mask comprising m multi-level defect images corresponding to m multiple layers of a deficient part; and
irradiating a laser beam onto the deficient part of the mask to remove the deficient part, based on the defect image,
wherein the laser beam is sequentially irradiated onto the m multiple layers of the deficient part while repeatedly moving in a first direction and a second direction crossing each other to sequentially remove the m multiple layers, where m is a natural number.

2. The method as claimed in claim 1 , wherein:
each normal opening of a plurality of openings has a width increasing in a direction from a first surface of the mask to a second surface of the mask, and
the second surface is opposite to and above the first surface.

3. The method as claimed in claim 2 , wherein producing the stereoscopic image of the mask includes:
measuring a stereoscopic image of an exposed surface of the mask exposed when viewed in a top plan view of the mask; and
setting a virtual side surface to be perpendicular from an edge of the deficient part to a bottom of the mask, when the edge of the deficient part in the measured stereoscopic image is between the first surface and the second surface.

4. The method as claimed in claim 1 , wherein producing the defect image includes:
dividing the stereoscopic image into n first multi-level images; and
comparing the n first multi-level images with n second multi-level images of the normal image to produce the m multi-level defect images,
wherein the m multiple layers correspond to the m multi-level defect images, respectively, where n is a natural number and m is a natural number equal to or smaller than the n.

5. The method as claimed in claim 4 , wherein producing the m multi-level defect images includes removing portions corresponding to the n second multi-level images from the n first multi-level images to produce the m multi-level defect images.

6. The method as claimed in claim 4 , wherein the m multiple layers are removed from a topmost layer of the m multiple layers in a sequential and downward manner.

7. The method as claimed in claim 1 , wherein a moving distance of the laser beam is larger in one of the first and second directions than in the other direction.

8. A mask repairing method, comprising:
disposing a mask having a plurality of openings on a stage;
producing a stereoscopic image of the mask and dividing the stereoscopic image into n first multi-level images;
comparing the n first multi-level images with n second multi-level images of a normal image of the mask to produce m multi-level defect images; and
sequentially removing m multiple layers of a deficient part of the mask, based on the m multi-level defect images,
wherein the m multiple layers correspond to the m multi-level defect images, respectively, and where n is a natural number and m is a natural number less than or equal to n.

9. The method as claimed in claim 8 , wherein the m multiple layers are removed in a sequential manner from a topmost layer of the m multiple layers.

10. The method as claimed in claim 8 , wherein removing the m multiple layers includes sequentially irradiating a laser beam onto the m multiple layers while repeatedly moving in a first direction and a second direction crossing each other to sequentially remove the m multiple layers.

Assignees

• Samsung Display Co Ltd

Inventors

• Moon Youngmin
• Im Sungsoon
• Ko Jungwoo
• Lee Sangmin
• Lee Youngchul
• Hwang Kyuhwan

Classifications

• B23K26/36

  Removing material (B23K26/55, B23K26/57 take precedence) · CPC title

• C23C14/042 Primary

  using masks · CPC title

• B23K26/03

  Observing, e.g. monitoring, the workpiece · CPC title

• C23C16/042

  using masks · CPC title

• B23K26/032

  using optical means · CPC title