System and methods for microfabrication

Patent metadata

Field	Value
Publication number	US-11305987-B2
Application number	US-202117360128-A
Country	US
Kind code	B2
Filing date	Jun 28, 2021
Priority date	Dec 28, 2018
Publication date	Apr 19, 2022
Grant date	Apr 19, 2022

Abstract

A method comprising: adhering a first surface of a mask to a carrier substrate via a first adhesive layer; forming a second adhesive layer on at least one of a second surface of the mask or a third surface of a wafer having a second alignment mark; bringing the carrier substrate and the wafer towards each other along a vertical axis such that the second surface of the mask and the third surface of the wafer is separated by an alignment gap based on a thickness of the second adhesive layer; performing an alignment operation based on imaging the first alignment mark and the second alignment mark; configuring the second surface of the mask to adhere to the third surface of the wafer via the second adhesive; and disconnecting the carrier substrate from the mask.

First claim

What is claimed is:

1. A method, comprising:
adhering a first surface of a mask to a carrier substrate via a first adhesive layer, at least one of the mask or the carrier substrate having a first alignment mark, the mask having a pattern of openings;
forming a second adhesive layer on at least one of a second surface of the mask or a third surface of a wafer having a second alignment mark, the second surface being on an opposite side of the mask relative to first surface, the second surface and the third surface being kept parallel with each other by a plurality of proximity flags, the proximity flags not in contact with the second adhesive layer;
removing the proximity flags;
bringing the carrier substrate and the wafer towards each other along a vertical axis such that the second surface of the mask and the third surface of the wafer is separated by an alignment gap based on a thickness of the second adhesive layer;
performing an alignment operation based on imaging the first alignment mark and the second alignment mark, the alignment operation comprising moving at least one of the carrier substrate or the wafer on a horizontal plane perpendicular to the vertical axis when the mask is separated from the third surface by a distance;
after the alignment operation completes:
bringing the carrier substrate and wafer towards each other along the vertical axis such that the second surface of the mask adheres to the third surface of the wafer via the second adhesive layer;
disconnecting the carrier substrate from the mask based on weakening the first adhesive layer when the mask remains adhered to the third surface via the second adhesive layer;
depositing material via the pattern of openings of the mask to form a pattern of material on the third surface of the wafer; and
after forming the pattern of material on the third surface, disconnecting the mask from the third surface based on weakening the second adhesive layer.

2. The method of claim 1 , wherein the carrier substrate comprises a material that transmits visible light.

3. The method of claim 2 , wherein the carrier substrate comprises glass.

4. The method of claim 1 , further comprising:
forming the first adhesive layer on the first surface of the mask; and
bringing the mask and the carrier substrate together such that the first adhesive layer adheres the first surface of the mask to the carrier substrate.

5. The method of claim 1 , further comprising:
forming the first adhesive layer on a surface of carrier substrate facing the first surface of the mask; and
bringing the mask and the carrier substrate together such that the first adhesive layer adheres the first surface of the mask to the carrier substrate.

6. The method of claim 1 , wherein the first adhesive layer and the second adhesive layer have different adhesion strength.

7. The method of claim 1 , wherein:
the first adhesive layer is weakened by a first agent but not by a second agent;
the second adhesive layer is weakened by the second agent but not by the first agent.

8. The method of claim 1 , wherein:
the first adhesive layer is weakened by a larger degree by a first agent than by a second agent; and
the second adhesive layer is weakened by a larger degree by the second agent than by the first agent.

9. The method of claim 1 , wherein the first adhesive layer is a thermal tape and the second adhesive layer is an ultra-violet (UV) tape; or
wherein the first adhesive layer is the UV tape and the second adhesive layer is the thermal tape.

10. The method of claim 1 , wherein weakening the first adhesive layer comprising breaking the first adhesive layer apart by applying a first force to at least one of the carrier substrate or the wafer; and
wherein weakening the second adhesive layer comprises breaking the second adhesive layer apart by applying a second force larger than a first force to at least one of the mask or the wafer.

11. The method of claim 1 , wherein bringing the carrier substrate and the wafer towards each other along a vertical axis comprises at least one of:
controlling a movement of a carrier substrate holder attached to the carrier substrate along the vertical axis; or
controlling a movement of a wafer holder attached to the wafer along the vertical axis.

12. The method of claim 1 , wherein the alignment operation comprises:
obtaining, from an imaging device, images of the first alignment mark and the second alignment mark;
determining, based on the images, an overlapping area between the first alignment mark and the second alignment mark;
moving at least one of the carrier substrate or the wafer on the horizontal plane based on the overlapping area; and
determining that the alignment operation completes based on the overlapping area exceeding a threshold.

13. The method of claim 1 , wherein weakening the first adhesive layer comprises at least one of: projecting a UV light to the first adhesive layer via the carrier substrate, projecting a laser light to the first adhesive layer via the carrier substrate, heating the carrier substrate, or by a first force that separates the mask from the carrier substrate.

14. The method of claim 1 , wherein weakening the second adhesive layer comprises at least one of: projecting a UV light to the second adhesive layer via the mask, projecting a laser light to the second adhesive layer via the mask, heating the mask, or by a second force that separates the mask from the wafer.

15. The method of claim 1 , wherein the material is deposited using at least one of: a physical deposition process, or a chemical vapor deposition process.

16. The method of claim 1 , wherein the material is a metal.

17. The method of claim 1 , wherein the mask is made of: stainless steel, glass, plastic, or a semiconductor material.

18. The method of claim 1 , wherein the mask is a shadow mask.

19. The method of claim 1 , wherein the carrier substrate is made of glass.

20. The method of claim 1 , wherein the proximity flags comprise wedge error compensation (WEC) balls.

Assignees

• Beijing Voyager Tech Co Ltd

Inventors

• Lee Sae Won
• Zhou Qin
• Wang Youmin

Classifications

• G01S7/4811 Primary

  common to transmitter and receiver · CPC title

• B81C1/00373 Primary

  Selective deposition, e.g. printing or microcontact printing · CPC title

• B81C3/004

  Active alignment, i.e. moving the elements in response to the detected position of the elements using internal or external actuators · CPC title

• G01S17/931

  of land vehicles · CPC title

• G02B26/0833

  the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD (G02B26/0825 takes precedence; micromechanical devices in general B81B) · CPC title