Broadband and omnidirectional polymer antireflection coatings

US11294102B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11294102-B2
Application numberUS-202016904041-A
CountryUS
Kind codeB2
Filing dateJun 17, 2020
Priority dateJan 17, 2017
Publication dateApr 5, 2022
Grant dateApr 5, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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A method for generating antireflective coatings for polymeric substrates using a deposition process and/or a dissolving process can provide a coating onto the outer surface of the substrate. Some embodiments can include a GLAD generated fluoropolymer coating or a co-evaporated fluoropolymer coating on a substrate that may achieve ultralow refractive index as well as improved adhesion and durability properties on polymeric substrates. In some embodiments, the deposition process is performed such that a fluoropolymer can be evaporated to form chain fragments of the fluoropolymer. The chain fragments diffused into the substrate can subsequently re-polymerize, interlocking with the polymer chains of the substrate. In some embodiments, the co-evaporation process can form a nanoporous polymer chain scaffold of the fluoropolymer, from which a sacrificial material can be dissolved out. The formed coating can be a multilayer or continuously-graded antireflective coating that has strong adhesion with the substrate.

First claim

Opening claim text (preview).

We claim: 1. A method of generating an antireflective coating, the method comprising: forming a layer of material on a surface of a polymeric substrate via a co-evaporation process, the layer of material comprising a first material and a second material, the first material comprising a coating, the second material comprising a material that is dissolvable by a solvent without dissolving the first material; the forming of the layer of material onto the surface of the substrate occurring such that the first material and the second material are vaporized and co-deposited onto the surface of the substrate, wherein the first material re-polymerizes to form a continuous, nanoscale polymer chain network; and exposing the second material deposited on the substrate to the solvent for dissolving at least a portion of the second material to remove the second material from the substrate and remove the second material from the first material. 2. The method of claim 1 , wherein the second material comprises 4,4-bis[N-(1-naphthyl-1)-N-phenyl-amino]-biphenyl (NPD). 3. The method of claim 1 , wherein the solvent comprises acetone. 4. The method of claim 1 , wherein the layer of material comprises a mixture including the first material at a first vol % and the second material at a second vol %, and the solvent comprises at least one of acetone, isopropanol, tetrahydrafuran, chlorobenzene, toluene, and cyclohexane. 5. The method of claim 1 , wherein the substrate is comprised of a polymeric material, a copolymeric material, an olefin polymer, a plastic, an acrylic, a polyethylene, or a polycarbonate. 6. The method of claim 1 , wherein the substrate is curved. 7. The method of claim 1 , wherein the substrate is a curved lens, a Fresnel lens, or a lenslet array. 8. An optical component, comprising: a substrate configured for use as an optical element, the substrate having the coating formed on at least a portion of a surface of the substrate, the coating comprising the layer of material being formed by the method of claim 1 . 9. The method of claim 1 , wherein: the substrate is a glass and/or inorganic-coated plastic; and the substrate is treated with an adhesion promotor. 10. The method of claim 9 , wherein the adhesion promotor is a fluorosilane or other silane-based coupling agent. 11. The method of claim 1 , comprising applying heat to the polymeric substrate before, during, and/or after forming the coating on the surface of the polymeric substrate. 12. The method of claim 1 , wherein the antireflective coating is formed after the exposing of the second material deposited on the substrate to the solvent. 13. The method of claim 12 , wherein the second material comprises 4,4-bis[N-(1-naphthyl-1)-N-phenyl-amino]-biphenyl (NPD), 4,4′-Cyclohexylidenebis[N,N-bis(4-methylphenyl)benzenamine] (TAPC), N,N′-Bis(3-methylphenyl)-N,N′-diphenylbenzidine (TPD), or bathophenanthroline (BPhen); and wherein the solvent comprises water, acetone, isopropanol, tetrahydrafuran, chlorobenzene, toluene, and/or cyclohexane. 14. The method of claim 13 , wherein the first material is a fluoropolymeric material. 15. The method of claim 1 , wherein the exposing of the second material deposited on the substrate to the solvent removes all the second material from the substrate and removes all the second material from the first material. 16. The method of claim 1 , wherein the exposing of the second material deposited on the substrate to the solvent removes at least 80% of the second material from the substrate and removes at least 80% of the second material from the first material. 17. The method of claim 1 , wherein the exposing of the second material deposited on the substrate to the solvent removes at least 50% of the second material from the substrate and removes at least 50% of the second material from the first material. 18. The method of claim 1 , comprising: applying a rinsing or cleaning process to remove any remnant solvent and/or second material after the exposing of the second material deposited on the substrate to the solvent occurs for a pre-determined period of time. 19. The method of claim 1 , comprising: rinsing or washing the substrate after the exposing of the second material deposited on the substrate to the solvent occurs. 20. The method of claim 1 , wherein the second material has a molecular size smaller than a molecular size of the first material.

Assignees

Inventors

Classifications

  • Polymeric substrate · CPC title

  • Multistage baking · CPC title

  • using vacuum · CPC title

  • G02B1/111Primary

    using layers comprising organic materials · CPC title

  • the last layer being a clear coat · CPC title

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What does patent US11294102B2 cover?
A method for generating antireflective coatings for polymeric substrates using a deposition process and/or a dissolving process can provide a coating onto the outer surface of the substrate. Some embodiments can include a GLAD generated fluoropolymer coating or a co-evaporated fluoropolymer coating on a substrate that may achieve ultralow refractive index as well as improved adhesion and durabi…
Who is the assignee on this patent?
Penn State Res Found
What technology area does this patent fall under?
Primary CPC classification G02B1/111. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Apr 05 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).