Chemical decontamination method using chelate free chemical decontamination reagent for removal of the dense radioactive oxide layer on the metal surface

US11289232B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11289232-B2
Application numberUS-201816102797-A
CountryUS
Kind codeB2
Filing dateAug 14, 2018
Priority dateJan 24, 2013
Publication dateMar 29, 2022
Grant dateMar 29, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A chemical decontamination reagent containing a reducing agent, a reductive metal ion, and an inorganic acid is provided to remove a radioactive oxide layer on a metal surface. The reagent can dissolve the radioactive oxide layer on the metal surface effectively at a relatively low temperature and enables a simple process of contacting the reagent to the radioactive oxide, thus economically effective in terms of cost and time required for the process. Since the decontamination does not use a conventional organic chelating agent such as oxalic acid, but the reducing agent as a main substance, the residuals of the reducing agent remained after decontamination can be decomposed and removed with an oxidizing agent. Due to the easy decomposition with the chemical decontamination reagent, secondary wastes can be minimized and the radionuclides remained in the decontamination reagent solution can be removed effectively.

First claim

Opening claim text (preview).

What is claimed is: 1. A chemical decontamination method, comprising a step of contacting a chemical decontamination reagent to a metal of a nuclear power plant covered with a radioactive oxide layer at a temperature range of 70° C. to 140° C. and a pH range of 1.0 to 3.7, Wherein the chemical decontamination reagent comprises a reducing agent, a reductive metal ion, and an acid, the acid consisting only of inorganic acid, for removal of the radioactive oxide layer on a surface of the metal, the chemical decontamination reagent being devoid of an organic chelating agent, and wherein the reducing agent is N 2 H 4 , the reductive metal ion is Cu + , and the inorganic acid is HNO 3 or H 2 SO 4 . 2. The chemical decontamination method according to claim 1 , wherein the metal is one or more selected from the group consisting of stainless steel, Inconel steel, and zirconium alloy. 3. The chemical decontamination method according to claim 1 , wherein a concentration of the reducing agent is in a range of 5×10 −4 -0.5 M. 4. The chemical decontamination method according to claim 1 , wherein a concentration of the reductive metal ion is in a range of 1×10 −5 -0.1 M. 5. The chemical decontamination method according to claim 1 , wherein a concentration of the inorganic acid is in a range of 1×10 −4 -0.5 M. 6. The chemical decontamination method according to claim 1 , wherein the reductive metal ion is added in a form of ion or ion pair with the addition of a metal salt. 7. The chemical decontamination method according to claim 1 , wherein the metal is immersed in the chemical decontamination reagent of claim 1 . 8. The chemical decontamination method according to claim 1 , wherein the chemical decontamination reagent of claim 1 is passed through an inside of systems or loop of the nuclear power plant. 9. The chemical decontamination method according to claim 1 , wherein the method is performed for 2-26 hours.

Assignees

Inventors

Classifications

  • solutions containing HNO3 · CPC title

  • refractory metals · CPC title

  • G21F9/06Primary

    Processing (separating different isotopes of the same chemical element B01D59/00) · CPC title

  • G21F9/004Primary

    of metallic surfaces · CPC title

  • with acid solutions · CPC title

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Frequently asked questions

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What does patent US11289232B2 cover?
A chemical decontamination reagent containing a reducing agent, a reductive metal ion, and an inorganic acid is provided to remove a radioactive oxide layer on a metal surface. The reagent can dissolve the radioactive oxide layer on the metal surface effectively at a relatively low temperature and enables a simple process of contacting the reagent to the radioactive oxide, thus economically eff…
Who is the assignee on this patent?
Korea Atomic Energy Res, Korea Hydro & Nuclear Power Co
What technology area does this patent fall under?
Primary CPC classification G21F9/06. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Mar 29 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).