Electromechanical pressure sensor

US11274983B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11274983-B2
Application numberUS-201816625521-A
CountryUS
Kind codeB2
Filing dateJun 15, 2018
Priority dateJul 24, 2017
Publication dateMar 15, 2022
Grant dateMar 15, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An electromechanical pressure sensor includes an electromechanical resonator having a driving electrode, a sensing electrode, and a beam resonator arranged between the driving and sensing electrodes. The beam resonator includes a resonator beam coupled on a first end to a first fixed anchor and coupled on a second end to a fixed second fixed anchor. The electromechanical resonator also includes a first voltage source coupled to the driving electrode and configured to provide an alternating current to the driving electrode and a second voltage source coupled to the first fixed anchor. The second voltage source provides a DC bias to the resonator beam. The electromechanical resonator further includes a third voltage source coupled to the resonator beam via the first and second fixed anchors. The third voltage source is configured to supply a voltage to the resonator beam that results in a temperature differential between the resonator beam and the first and second fixed anchors. The electromechanical resonator also includes a processor coupled to the sensing electrode and configured to correlate a voltage on the sensing electrode with a pressure value.

First claim

Opening claim text (preview).

What is claimed is: 1. An electromechanical pressure sensor, comprising: an electromechanical resonator, comprising a driving electrode, a sensing electrode, and a beam resonator arranged between the driving and sensing electrodes, wherein the beam resonator includes a resonator beam coupled on a first end to a first fixed anchor and coupled on a second end to a fixed second fixed anchor; a first voltage source coupled to the driving electrode and configured to provide an alternating current to the driving electrode; a second voltage source coupled to the first fixed anchor, wherein the second voltage source provides a DC bias to the resonator beam; a third voltage source coupled to the resonator beam via the first and second fixed anchors, wherein the third voltage source is configured to supply a voltage to the resonator beam that results in a temperature differential between the resonator beam and the first and second fixed anchors; and a processor coupled to the sensing electrode and configured to correlate a voltage on the sensing electrode indicative of a shift in a resonance frequency of the resonator beam with a pressure value based on the voltage supplied by the third voltage source. 2. The electromechanical pressure sensor of claim 1 , wherein the resonator beam is straight. 3. The electromechanical pressure sensor of claim 1 , wherein the resonator beam is curved. 4. The electromechanical pressure sensor of claim 1 , further comprising: a memory coupled to the processor and storing a correlation of voltages on the sensing electrode and pressure values. 5. The electromechanical pressure sensor of claim 1 , further comprising: an amplifier arranged between the sensing electrode and the processor. 6. The electromechanical pressure sensor of claim 1 , wherein the electromechanical resonator is a microelectromechanical resonator. 7. The electromechanical pressure sensor of claim 1 , wherein the electromechanical resonator is a nanoelectromechanical resonator. 8. The electromechanical pressure sensor of claim 1 , wherein the electromechanical resonator comprises silicon. 9. The electromechanical pressure sensor of claim 1 , further comprising: a heater coupled to the resonator beam. 10. A method of producing an electromechanical pressure sensor, the method comprising: providing an electromechanical resonator, comprising a driving electrode, a sensing electrode, and a beam resonator arranged between the driving and sensing electrodes, wherein the beam resonator includes a resonator beam coupled on a first end to a first fixed anchor and coupled on a second end to a fixed second fixed anchor; coupling a first voltage source to the driving electrode, wherein the first voltage source is configured to provide an alternating current to the driving electrode; coupling a second voltage source to the first fixed anchor, wherein the second voltage source provides a DC bias to the resonator beam; coupling a third voltage source to the resonator beam, wherein the third voltage source is configured to supply a voltage to the resonator beam that results in a temperature differential between the resonator beam and the first and second fixed anchors; and coupling a processor to the sensing electrode, wherein the processor is configured to correlate a voltage on the sensing electrode indicative of a shift in a resonance frequency of the resonator beam with a pressure value based on the voltage supplied by the third voltage source. 11. The method of claim 10 , wherein the resonator beam is straight. 12. The method of claim 10 , wherein the resonator beam is curved. 13. The method of claim 10 , further comprising: coupling a memory to the processor, wherein the memory stores a correlation of voltages on the sensing electrode and pressure values. 14. A method of determining pressure, the method comprising: applying an alternating current to a driving electrode of an electromechanical resonator, which comprises the driving electrode, a sensing electrode, and a beam resonator arranged between the driving and sensing electrodes, wherein the beam resonator includes a resonator beam coupled on a first end to a first fixed anchor and coupled on a second end to a fixed second fixed anchor; applying a DC bias voltage to the first fixed anchor; electrothermally heating the resonator beam with an additional voltage; and determining the pressure by correlating a voltage on the sensing electrode indicative of a shift in a resonance frequency of the resonator beam with a pressure value based on the additional voltage. 15. The method of claim 14 , wherein the correlation of the voltage on the sensing electrode with the pressure value comprises: selecting the pressure value from a table having a correlation between different voltages on the sensing electrode and different pressure values. 16. The method of claim 14 , wherein the electrothermal heating of the resonator beam with the additional voltage comprises: applying a DC voltage to a heater attached to the resonator beam, wherein the DC voltage is the additional voltage. 17. The method of claim 14 , wherein the electrothermal heating of the resonator beam with the additional voltage comprises: applying a DC voltage to the first and second fixed anchors, wherein the DC voltage is the additional voltage. 18. The method of claim 17 , wherein the DC voltage applied to the first and second fixed anchors is a DC voltage different from a voltage causing the middle the resonator beam to buckle at vacuum conditions.

Assignees

Inventors

Classifications

  • G01L9/0013Primary

    of a string · CPC title

  • G01L9/001Primary

    of an element not provided for in the following subgroups of G01L9/0008 · CPC title

  • from the sensor to its support · CPC title

  • of a semiconductive element · CPC title

  • using resonance effects of a vibrating body; Vacuum gauges of the Klumb type · CPC title

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What does patent US11274983B2 cover?
An electromechanical pressure sensor includes an electromechanical resonator having a driving electrode, a sensing electrode, and a beam resonator arranged between the driving and sensing electrodes. The beam resonator includes a resonator beam coupled on a first end to a first fixed anchor and coupled on a second end to a fixed second fixed anchor. The electromechanical resonator also includes…
Who is the assignee on this patent?
Univ King Abdullah Sci & Tech
What technology area does this patent fall under?
Primary CPC classification G01L9/0013. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Mar 15 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).