Increased particle loading by surface modification with polyethersilane

US11274043B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11274043-B2
Application numberUS-201916435638-A
CountryUS
Kind codeB2
Filing dateJun 10, 2019
Priority dateJun 12, 2018
Publication dateMar 15, 2022
Grant dateMar 15, 2022

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A modified colloidal silica is produced by mixing an effective amount of an alkyl silicate to form a colloidal silica, followed by treating the colloidal silica with an effective amount of a polyethersilane to form a modified colloidal silica.

First claim

Opening claim text (preview).

What is claimed is: 1. A modified colloidal silica produced by a process comprising: mixing an alkyl silicate to form a colloidal silica and treating a surface of the colloidal silica with an amount of a polyethersilane to form a modified colloidal silica with the surface modified, wherein the polyethersilane is 2-[methoxy(polyethyleneoxy)propyl]dimethylmethoxysilane. 2. The modified colloidal silica of claim 1 , wherein 0.1-10 wt % of the polyethersilane, based on the weight of a mother liquid of colloidal silane, is used to treat the mother liquid of the colloidal silica. 3. The modified colloidal silica of claim 1 , wherein the alkyl silicate is a tetraalkyl orthosilicate. 4. The modified colloidal silica of claim 3 , wherein the tetraalkyl orthosilicate is at least one selected from the group consisting of tetramethyl orthosilicate and tetraethyl orthosilicate. 5. A polishing material, comprising: the modified colloidal silica of claim 1 . 6. A method for producing a modified colloidal silica, comprising: 1) preparing a mother liquid comprising an alkali catalyst and water; 2) adding an amount of a hydrolyzed liquid obtained by hydrolyzing an alky] silicate to the mother liquid forming a colloidal silica; and 3) treating a surface of the colloidal silica with an amount of polyethersilane to form a modified colloidal silica with the surface modified, wherein the polyethersilane is 2-[methoxy(polyethyleneoxy)propyl]dimethylmethoxysilane. 7. The method of claim 6 , wherein 0.1-10 wt % of the polyethersilane, based on the weight of a mother liquid of colloidal silane, is used to treat the mother liquid of the colloidal silica. 8. The method of claim 6 , further comprising: preparing the hydrolyzed liquid by hydrolyzing the alkyl silicate in absence of the catalyst. 9. The method of claim 6 , wherein the mother liquid further comprises seed particles. 10. The method of claim 6 , wherein the alkyl silicate is tetraalkyl orthosilicate. 11. The method of claim 10 , wherein the alkyl silicate is tetramethyl orthosilicate or tetraethyl orthosilicate. 12. The modified colloidal silica of claim 1 , wherein during the treating a methoxysilane group of the polyethersilane reacts with the surface of the colloidal silica causing the polyethersilane to graft on the colloidal silica surface. 13. An aqueous solution of the modified colloidal silica of claim 1 , wherein the aqueous solution has a solid content of 25 wt % to 40 wt %. 14. The method of claim 6 , wherein during the treating a methoxysilane group of the polyethersilane reacts with the surface of the colloidal silica causing the polyethersilane to graft on the colloidal silica surface.

Assignees

Inventors

Classifications

  • C01B33/149Primary

    Coating · CPC title

  • Composite particles, e.g. coated particles · CPC title

  • Aqueous liquid suspensions · CPC title

  • Abrasive particles per se (preparation of diamond C01B32/25) · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11274043B2 cover?
A modified colloidal silica is produced by mixing an effective amount of an alkyl silicate to form a colloidal silica, followed by treating the colloidal silica with an effective amount of a polyethersilane to form a modified colloidal silica.
Who is the assignee on this patent?
Evonik Operations Gmbh, Evonik Corp
What technology area does this patent fall under?
Primary CPC classification C01B33/149. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 15 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).