Magnetic disk substrate, method for manufacturing same and magnetic disk

US11270730B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11270730-B2
Application numberUS-201816979023-A
CountryUS
Kind codeB2
Filing dateNov 28, 2018
Priority dateMar 9, 2018
Publication dateMar 8, 2022
Grant dateMar 8, 2022

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  1. Title

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  5. First independent claim

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Abstract

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A magnetic disk substrate is composed of an aluminum alloy substrate, a base plating layer on a surface of the aluminum alloy substrate, and a boundary region between the aluminum alloy substrate and the base plating layer. The boundary region includes a specific boundary region (D(1)I(50-84)) having Al emission intensities equal to 50% to 84% of an average Al emission intensity in an interior region of the aluminum alloy substrate in glow discharge optical emission spectroscopy in the depthwise direction from the surface of the magnetic disk substrate. The specific boundary region (D(1)I(50-84)) has a maximum Fe emission intensity (I(1)Fe(max)) higher than an average Fe emission intensity (I(1)Fe(ave)) in the interior region of the aluminum alloy substrate in the glow discharge optical emission spectroscopy.

First claim

Opening claim text (preview).

The invention claimed is: 1. A magnetic disk substrate comprising: an aluminum alloy substrate; a base plating layer on a surface of the aluminum alloy substrate; and a boundary region between the aluminum alloy substrate and the base plating layer, the boundary region comprising a specific boundary region (D(1) I(50-84) ) having Al emission intensities equal to 50% to 84% of an average Al emission intensity in an interior region of the aluminum alloy substrate in glow discharge optical emission spectroscopy in a depthwise direction from a surface of the magnetic disk substrate, wherein the specific boundary region (D(1) I(50-84) ) has a maximum Fe emission intensity (I(1) Fe(max) ) higher than an average Fe emission intensity (I(1) Fe(ave) ) in the interior region of the aluminum alloy substrate in the glow discharge optical emission spectroscopy, and the aluminum alloy substrate comprises 0.1 to 0.4 mass % of Si, 0.4 to 3.0 mass % of Fe, 0.1 to 3.0 mass % of Mn, 0.005 to 1.000 mass % of Cu, and 0.005 to 1.000 mass % of Zn, with a balance of Al and unavoidable impurities. 2. The magnetic disk substrate according to claim 1 , wherein the base plating layer is an electroless Ni—P plating layer. 3. The magnetic disk substrate according to claim 1 , wherein the magnetic disk substrate is fabricated using an unplated aluminum alloy substrate comprising a specific surface region (D(2) I(50-84) ) having Al emission intensities equal to 50% to 84% of an average Al emission intensity in an interior region of the unplated aluminum alloy substrate in glow discharge optical emission spectroscopy in a depthwise direction from a surface of the unplated aluminum alloy substrate, and the specific surface region (D(2) I(50-84)) ) has a maximum Fe emission intensity (I(2) Fe(max) ) equal to or higher than 1.1 times of an average Fe emission intensity (I(2) Fe(ave) ) in the interior region of the unplated aluminum alloy substrate in the glow discharge optical emission spectroscopy. 4. The magnetic disk substrate according to claim 1 , wherein the aluminum alloy substrate further comprises at least one element selected from a group consisting of 0.1 to 3.0 mass % of Ni, 0.1 to 6.0 mass % of Mg, 0.01 to 1.00 mass % of Cr, and 0.01 to 1.00 mass % of Zr. 5. The magnetic disk substrate according to claim 1 , wherein the aluminum alloy substrate further comprises at least one element selected from a group consisting of Ti, B, and V at a total amount of 0.005 to 0.500 mass %. 6. A magnetic disk comprising: the magnetic disk substrate according to claim 1 ; and a magnetic layer disposed on the base plating layer of the magnetic disk substrate directly or holding an interlayer therebetween. 7. A method of fabricating the magnetic disk substrate according to claim 1 , the method comprising: a process of fabricating an unplated aluminum alloy substrate to be applied to the magnetic disk substrate, the process comprising: a punching step of punching an aluminum alloy plate to produce a disk blank having an annular shape; a pressure annealing step of heating the disk blank in a pressurized state to flatten the disk blank; and a grinding step of grinding both surfaces of the flattened disk blank at an amount corresponding to a thickness of 1 μm or more per one surface. 8. The method of fabricating the magnetic disk substrate according to claim 7 , wherein the process of fabricating an unplated aluminum alloy substrate further comprises a cutting step of cutting both surfaces of the disk blank before the grinding step. 9. The method of fabricating the magnetic disk substrate according to claim 7 , wherein the process of fabricating an unplated aluminum alloy substrate further comprises a preliminarily grinding step of preliminary grinding both surfaces of the disk blank at an amount corresponding to a thickness of 1 μm or more per one surface before the grinding step.

Assignees

Inventors

Classifications

  • G11B5/8404Primary

    manufacturing base layers · CPC title

  • B32B15/015Primary

    the said other metal being copper or nickel or an alloy thereof · CPC title

  • Composites or coated substrates · CPC title

  • Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working (apparatus for mechanical working of metal B21, B23, B24) · CPC title

  • Aluminium or titanium elemental or alloy substrates · CPC title

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What does patent US11270730B2 cover?
A magnetic disk substrate is composed of an aluminum alloy substrate, a base plating layer on a surface of the aluminum alloy substrate, and a boundary region between the aluminum alloy substrate and the base plating layer. The boundary region includes a specific boundary region (D(1)I(50-84)) having Al emission intensities equal to 50% to 84% of an average Al emission intensity in an interior …
Who is the assignee on this patent?
Uacj Corp, Furukawa Electric Co Ltd
What technology area does this patent fall under?
Primary CPC classification G11B5/8404. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Mar 08 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).