Device for pretreatment of sample and analyzer equipped therewith, and method for pretreatment of sample

US11268962B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11268962-B2
Application numberUS-201515551064-A
CountryUS
Kind codeB2
Filing dateFeb 20, 2015
Priority dateFeb 20, 2015
Publication dateMar 8, 2022
Grant dateMar 8, 2022

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A sample is dissolved in a reagent 4 containing an organic solvent in a conversion vessel 11. A gas is supplied from a first gas supply part into the conversion vessel 11 via a reagent introduction tube 17, and thus the interior of the conversion vessel 11 is pressurized. A gas is supplied from a second gas supply part into the reagent 4 in the conversion vessel 11 via a reagent discharge tube 18, and thus gas bubbles 41 are formed in the reagent 4.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for pretreatment of a sample comprising: a dissolution step of introducing a reagent containing an organic solvent into a vessel, and dissolving the sample in the reagent to form a sample-containing-reagent; a sample supply step of subjecting a protein to an Edman degradation, obtaining an amino acid from the protein by the Edman degradation, and introducing the obtained amino acid as the sample into the vessel; a gas supply step of supplying a first gas into the vessel outside the sample-containing-reagent, and thus pressurizing an interior of the vessel, and supplying a second gas into the sample-containing-reagent in the vessel and thus forming a gas bubble in the sample-containing-reagent to volatilize the sample-containing-reagent while the first gas is supplied to put an inside of the vessel in a high pressure state; and an analyzing step of analyzing the sample after the gas supply step, wherein the first gas and the second gas supplied by the gas supply step are an inert gas, and wherein a pressure of the first gas supplied from the gas supply step and a pressure of the second gas supplied from the gas supply step are set to values different from each other. 2. The method for pretreatment of a sample according to claim 1 , wherein the inert gas is nitrogen gas, helium gas or argon gas. 3. The method for pretreatment of a sample according to claim 1 , further comprising a reagent discharging step using a reagent discharge part of discharging a sample-containing-reagent in which the sample is dissolved in the vessel to an outside of the vessel, wherein one end of the reagent discharge part is located at a bottom portion inside the vessel, and is configured to be in direct contact with the reagent. 4. The method for pretreatment of a sample according to claim 1 , further comprising: a setting reception processing step of receiving settings regarding a supply of the first gas and the second gas from the gas supply step; and a gas supply control step which controls the supply of the first gas and the second gas from the gas supply step according to a set time period received by the setting reception processing step such that the first gas and the second gas are supplied only for the set time period. 5. The method for pretreatment of a sample according to claim 1 , wherein a time period for supplying the first gas and a time period for supplying the second gas are different from each other.

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Inventors

Classifications

  • sequencing · CPC title

  • mixing by blowing a gas, bubbling · CPC title

  • Preparation or injection of sample to be analysed · CPC title

  • Characterised by arrangements for controlling the aspiration or dispense of liquids · CPC title

  • Diluting, dispersing or mixing samples · CPC title

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Frequently asked questions

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What does patent US11268962B2 cover?
A sample is dissolved in a reagent 4 containing an organic solvent in a conversion vessel 11. A gas is supplied from a first gas supply part into the conversion vessel 11 via a reagent introduction tube 17, and thus the interior of the conversion vessel 11 is pressurized. A gas is supplied from a second gas supply part into the reagent 4 in the conversion vessel 11 via a reagent discharge tube …
Who is the assignee on this patent?
Shimadzu Corp
What technology area does this patent fall under?
Primary CPC classification G01N33/6824. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Mar 08 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).