Aluminum physical vapor deposition for the cosmetic finishing of recycled aluminum alloys

US11268188B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11268188-B2
Application numberUS-201916519288-A
CountryUS
Kind codeB2
Filing dateJul 23, 2019
Priority dateMay 2, 2019
Publication dateMar 8, 2022
Grant dateMar 8, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of forming a surface coating on a component of an electronic device can include depositing an aluminum layer including at least about 0.05 weight percent (wt %) of a grain refiner on a surface of the component by a physical vapor deposition process, and anodizing the aluminum layer to form an anodized aluminum oxide layer having a L* value greater than about 85 in the CIELAB color space.

First claim

Opening claim text (preview).

What is claimed is: 1. A component for an electronic device, comprising: a substrate material defining a surface; an anodized aluminum oxide layer formed over the surface, the anodized aluminum oxide layer having a thickness greater than about 4 microns and an L* value in a CIELAB color space of greater than about 85; and a continuous stop layer disposed between the substrate material and the anodized aluminum oxide layer. 2. The component of claim 1 , wherein the substrate material is a first material and the anodized aluminum oxide layer is formed from a second material different than the first material. 3. The component of claim 2 , wherein the first material comprises an aluminum alloy. 4. The component of claim 1 wherein the continuous stop layer comprises a thickness of less than about 1 micron; the continuous stop layer including titanium, platinum group metals, or a conductive oxide material. 5. The component of claim 1 , further comprising: an aluminum layer disposed between the anodized aluminum oxide layer and the substrate, the aluminum layer having a thickness of less than about 100 microns and including at least about 0.05 weight percent (wt %) of a grain refiner; wherein the anodized aluminum oxide layer is formed from the aluminum layer. 6. The component of claim 1 , wherein the anodized aluminum oxide layer has a b* value in the CIELAB color space of between about −0.04 and about 0.4. 7. The component of claim 1 , wherein the surface comprises a three-dimensional surface. 8. The component of claim 1 , wherein the anodized aluminum oxide layer comprises a thickness of less than about 200 microns. 9. A coating formed on a substrate material, comprising: an aluminum layer having grains with a major surface dimension greater than 1 micron and grains with a major surface dimension less than 1 micron, wherein a surface area ratio of grains with a major surface dimension greater than 1 micron to grains with a major surface dimension less than 1 micron, wherein the surface area ratio is less than about 0.1; the aluminum layer having a thickness greater than about 2 microns. 10. The coating of claim 9 , wherein the thickness of the aluminum layer is less than about 100 microns. 11. The coating of claim 9 , wherein the surface area ratio is less than about 0.07. 12. The coating of claim 9 , wherein the surface area ratio is less than about 0.05. 13. The coating of claim 9 , wherein the aluminum layer comprises greater than about 0.05 weight percent (wt %) of a grain refiner. 14. The coating of claim 13 , wherein the grain refiner comprises at least one of zirconium, scandium, silicon, or silver.

Assignees

Inventors

Classifications

  • Oxidation · CPC title

  • Metallic material, boron or silicon · CPC title

  • Oxides (C23C14/10 takes precedence) · CPC title

  • on metal layer · CPC title

  • Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D · CPC title

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What does patent US11268188B2 cover?
A method of forming a surface coating on a component of an electronic device can include depositing an aluminum layer including at least about 0.05 weight percent (wt %) of a grain refiner on a surface of the component by a physical vapor deposition process, and anodizing the aluminum layer to form an anodized aluminum oxide layer having a L* value greater than about 85 in the CIELAB color space.
Who is the assignee on this patent?
Apple Inc
What technology area does this patent fall under?
Primary CPC classification C23C14/5853. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 08 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).