Interference colored titanium with protective oxide film
US-2018073159-A1 · Mar 15, 2018 · US
US11268188B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11268188-B2 |
| Application number | US-201916519288-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 23, 2019 |
| Priority date | May 2, 2019 |
| Publication date | Mar 8, 2022 |
| Grant date | Mar 8, 2022 |
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A method of forming a surface coating on a component of an electronic device can include depositing an aluminum layer including at least about 0.05 weight percent (wt %) of a grain refiner on a surface of the component by a physical vapor deposition process, and anodizing the aluminum layer to form an anodized aluminum oxide layer having a L* value greater than about 85 in the CIELAB color space.
Opening claim text (preview).
What is claimed is: 1. A component for an electronic device, comprising: a substrate material defining a surface; an anodized aluminum oxide layer formed over the surface, the anodized aluminum oxide layer having a thickness greater than about 4 microns and an L* value in a CIELAB color space of greater than about 85; and a continuous stop layer disposed between the substrate material and the anodized aluminum oxide layer. 2. The component of claim 1 , wherein the substrate material is a first material and the anodized aluminum oxide layer is formed from a second material different than the first material. 3. The component of claim 2 , wherein the first material comprises an aluminum alloy. 4. The component of claim 1 wherein the continuous stop layer comprises a thickness of less than about 1 micron; the continuous stop layer including titanium, platinum group metals, or a conductive oxide material. 5. The component of claim 1 , further comprising: an aluminum layer disposed between the anodized aluminum oxide layer and the substrate, the aluminum layer having a thickness of less than about 100 microns and including at least about 0.05 weight percent (wt %) of a grain refiner; wherein the anodized aluminum oxide layer is formed from the aluminum layer. 6. The component of claim 1 , wherein the anodized aluminum oxide layer has a b* value in the CIELAB color space of between about −0.04 and about 0.4. 7. The component of claim 1 , wherein the surface comprises a three-dimensional surface. 8. The component of claim 1 , wherein the anodized aluminum oxide layer comprises a thickness of less than about 200 microns. 9. A coating formed on a substrate material, comprising: an aluminum layer having grains with a major surface dimension greater than 1 micron and grains with a major surface dimension less than 1 micron, wherein a surface area ratio of grains with a major surface dimension greater than 1 micron to grains with a major surface dimension less than 1 micron, wherein the surface area ratio is less than about 0.1; the aluminum layer having a thickness greater than about 2 microns. 10. The coating of claim 9 , wherein the thickness of the aluminum layer is less than about 100 microns. 11. The coating of claim 9 , wherein the surface area ratio is less than about 0.07. 12. The coating of claim 9 , wherein the surface area ratio is less than about 0.05. 13. The coating of claim 9 , wherein the aluminum layer comprises greater than about 0.05 weight percent (wt %) of a grain refiner. 14. The coating of claim 13 , wherein the grain refiner comprises at least one of zirconium, scandium, silicon, or silver.
Oxidation · CPC title
Metallic material, boron or silicon · CPC title
Oxides (C23C14/10 takes precedence) · CPC title
on metal layer · CPC title
Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D · CPC title
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