US11268187B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11268187-B2 |
| Application number | US-202016893644-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 5, 2020 |
| Priority date | Mar 16, 2018 |
| Publication date | Mar 8, 2022 |
| Grant date | Mar 8, 2022 |
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Disclosed are a porous aluminum macroscopic body, a fabrication system, and a method therefor, where the porous aluminum macroscopic body is a three-dimensional full-through-hole structure formed by connecting hollow aluminum wires, and the wall thickness of the hollow aluminum wires is 7-100 micrometers. The fabrication system comprises a magnetron sputtering subsystem, a high-temperature aluminum vapor subsystem, a low-temperature aluminum deposition subsystem, an aluminum vapor recovery subsystem, and a porous polymer film conveying subsystem. A preparation method therefor comprises first utilizing a magnetron sputtering method to rapidly sputter on a porous polymer film to form an aluminum layer that has a thickness of 1-500 nm, and then continuing to deposit the aluminum layer to a thickness of 7-100 micrometers while decomposing the polymer film in-situ so as to obtain the porous aluminum macroscopic body.
Opening claim text (preview).
What is claimed is: 1. A fabrication system for preparing a porous aluminum macroscopic body, the fabrication system comprising a magnetron sputtering subsystem ( 1 ), a high-temperature aluminum vapor subsystem ( 2 ), a low-temperature aluminum deposition subsystem ( 3 ), an aluminum vapor recovery subsystem ( 4 ), and a porous polymer film conveying subsystem ( 5 ); wherein the temperature of the high-temperature aluminum vapor subsystem ( 2 ) is 600-800 degrees Celsius, the temperature of the low-temperature aluminum deposition subsystem ( 3 ) is 200-300 degrees Celsius, the porous polymer film conveying subsystem ( 5 ) is connected with the magnetron sputtering subsystem ( 1 ) and the low-temperature aluminum deposition subsystem ( 3 ) to form a path for a porous polymer film; the high-temperature aluminum vapor subsystem ( 2 ), the low-temperature aluminum deposition subsystem ( 3 ), and the aluminum vapor recovery subsystem ( 4 ) are interconnected to form paths for supply, deposition, and recovery of aluminum; wherein the low-temperature aluminum deposition subsystem ( 3 ) is provided with an inlet for a gas containing oxygen in a direction near the porous polymer film conveying subsystem ( 5 ) at a rear end; while depositing an aluminum vapor, the porous polymer film is burned by utilizing the temperature of the aluminum vapor, so an aluminizing film which comes out of the low-temperature aluminum deposition subsystem ( 3 ) is without any carbon element; wherein the aluminum vapor recovery subsystem ( 4 ) comprises an air induction system to introduce leftover gases containing inert gas, exhaust gases caused by burning the porous polymer film, and excess aluminum vapor in the low-temperature aluminum deposition subsystem ( 3 ) into the aluminum vapor recovery subsystem ( 4 ); the aluminum vapor condenses into solids of aluminum by cooling, and the aluminum solids are separated from the leftover gases, the aluminum solids and other gases return to the high-temperature aluminum vapor subsystem ( 2 ). 2. The fabrication system of claim 1 , wherein the high-temperature aluminum vapor subsystem ( 2 ) converts the aluminum solids recovered from the aluminum vapor recovery subsystem ( 4 ) and aluminum particles from outside the fabrication system into aluminum vapor; at the same time, the other gases passed into the high-temperature aluminum vapor subsystem ( 2 ) by the aluminum vapor recovery subsystem ( 4 ) are combusted into an exhaust gas, and the exhaust gas is expelled from the high-temperature aluminum vapor subsystem ( 2 ).
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