Electromagnetic wave absorber, article with electromagnetic wave absorber, and method for manufacturing electromagnetic wave absorber

US11266048B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11266048-B2
Application numberUS-201816957885-A
CountryUS
Kind codeB2
Filing dateDec 28, 2018
Priority dateDec 28, 2017
Publication dateMar 1, 2022
Grant dateMar 1, 2022

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  1. Title

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An electromagnetic wave absorber (1a) includes a resistive layer (10), an electrically conductive layer (20) and a dielectric layer (30). The electrically conductive layer (20) has a sheet resistance lower than a sheet resistance of the resistive layer (10). The dielectric layer (30) is disposed between the resistive layer (10) and the electrically conductive layer (20). The electromagnetic wave absorber (1a) has a first slit (15). The first slit (15) extends, in the resistive layer (10), from a first principal surface (10a) distal to the dielectric layer (30) toward the dielectric layer (30) in a direction perpendicular to the first principal surface (10a) and divides the resistive layer (10) into a plurality of first blocks (17). Each of the first blocks (17) has a minimum dimension (D1) of 2 mm or more at the first principal surface (10a).

First claim

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The invention claimed is: 1. An electromagnetic wave absorber comprising: a resistive layer; an electrically conductive layer having a sheet resistance lower than a sheet resistance of the resistive layer; and a dielectric layer disposed between the resistive layer and the electrically conductive layer, wherein the electromagnetic wave absorber has at least one of a first slit and a second slit, the first slit extends, in the resistive layer, from a first principal surface distal to the dielectric layer toward the dielectric layer in a direction perpendicular to the first principal surface and divides the resistive layer into a plurality of first blocks, the second slit extends, in the electrically conductive layer, from a second principal surface distal to the dielectric layer toward the dielectric layer in a direction perpendicular to the second principal surface and divides the electrically conductive layer into a plurality of second blocks, each of the first blocks has a minimum dimension of 2 mm or more at the first principal surface each of the second blocks has a minimum dimension of 1 mm or more at the second principal surface, the electromagnetic wave absorber is a λ/4 electromagnetic wave absorber, and the electromagnetic wave absorber satisfies at least one of the following conditions (I), (II) and (III), (I) the electromagnetic wave absorber has the second slit, and when the second principal surface is level, an area of the plurality of second blocks at the second principal surface is 90% or more of a sum of the area of the plurality of second blocks and an area of an opening of the second slit, (II) the electromagnetic wave absorber has a plurality of the first slits, the plurality of the first slits include a first slit group composed of a plurality of the first slits parallel to each other at the first principal surface, the minimum dimension of the first blocks at the first principal surface is 20 mm or less, and the plurality of the first slits include a second slit group composed of a plurality of the first slits that are parallel to each other at the first principal surface and that intersect the plurality of the first slits included in the first slit group, (III) the electromagnetic wave absorber has a plurality of the second slits, the plurality of the second slits include a third slit group composed of a plurality of the second slits parallel to each other at the second principal surface, the minimum dimension of the second blocks at the second principal surface is 20 mm or less, and the plurality of the second slits include a fourth slit group composed of a plurality of the second slits that are parallel to each other at the second principal surface and that intersect the plurality of the second slits included in the third slit group. 2. The electromagnetic wave absorber according to claim 1 , wherein the electromagnetic wave absorber has the second slit, and when the second principal surface is level, the area of the plurality of second blocks at the second principal surface is 90% or more of the sum of the area of the plurality of second blocks and the area of the opening of the second slit. 3. The electromagnetic wave absorber according to claim 1 , wherein the electromagnetic wave absorber has the plurality of the first slits, the plurality of the first slits include the first slit group composed of the plurality of the first slits parallel to each other at the first principal surface, and the minimum dimension of the first blocks at the first principal surface is 20 mm or less. 4. The electromagnetic wave absorber according to claim 3 , wherein the plurality of the first slits include the second slit group composed of the plurality of the first slits that are parallel to each other at the first principal surface and that intersect the plurality of the first slits included in the first slit group. 5. The electromagnetic wave absorber according to claim 1 , wherein the electromagnetic wave absorber has the plurality of the second slits, the plurality of the second slits include the third slit group composed of the plurality of the second slits parallel to each other at the second principal surface, and the minimum dimension of the second blocks at the second principal surface is 20 mm or less. 6. The electromagnetic wave absorber according to claim 5 , wherein the plurality of the second slits include the fourth slit group composed of the plurality of the second slits that are parallel to each other at the second principal surface and that intersect the plurality of the second slits included in the third slit group. 7. The electromagnetic wave absorber according to claim 1 , wherein the resistive layer has a sheet resistance of 120 to 800 Ω/□. 8. An article with an electromagnetic wave absorber, comprising: an article having a curved face or a corner; and the electromagnetic wave absorber according to claim 1 that is adhered to the curved face or adhered to across the corner. 9. A method for manufacturing an electromagnetic wave absorber, comprising; providing a resistive layer; providing an electrically conductive layer having a sheet resistance lower than a sheet resistance of the resistive layer; disposing a dielectric layer between the resistive layer and the electrically conductive layer; and forming at least one of a first slit and a second slit, wherein the first slit extends, in the resistive layer, from a first principal surface distal to the dielectric layer toward the dielectric layer in a direction perpendicular to the first principal surface and divides the resistive layer into a plurality of first blocks, the second slit extends, in the electrically conductive layer, from a second principal surface distal to the dielectric layer toward the dielectric layer in a direction perpendicular to the second principal surface and divides the electrically conductive layer into a plurality of second blocks, each of the first blocks has a minimum dimension of 2 mm or more at the first principal surface, each of the second blocks has a minimum dimension of 1 mm or more at the second principal surface, the electromagnetic wave absorber is a λ/4 electromagnetic wave absorber, and the electromagnetic wave absorber satisfies at least one of the following conditions (I), (II) and (III), (I) the electromagnetic wave absorber has the second slit, and when the second principal surface is level, an area of the plurality of second blocks at the second principal surface is 90% or more of a sum of the area of the plurality of second blocks and an area of an opening of the second slit, (II) the electromagnetic wave absorber has a plurality of the first slits, the plurality of the first slits include a first slit group composed of a plurality of the first slits parallel to each other at the first principal surface, the minimum dimension of the first blocks at the first principal surface is 20 mm or less, and the plurality of the first slits include a second slit group composed of a plurality of the first slits that are parallel to each other at the first principal surface and that intersect the plurality of the first slits included in the first slit group, (III) the electromagnetic wave absorber has a plurality of the second slits, the plurality of the second slits include a third slit group composed of a plurality of the second slits parallel to each other at the second principal surface, the minimum dimension of the second blocks at the second principal surface is 20 mm or less, and the plurality of the second slits include a fourth slit group composed of a plurality of the second slits that are parallel to each other at the second principal surface and

Assignees

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Classifications

  • comprising vinyl halide (co)polymers, e.g. PVC, PVDC, PVF, PVDF · CPC title

  • Carbon, e.g. graphite particles · CPC title

  • comprising iron or steel {(B32B15/011, B32B15/012 and B32B15/013 take precedence)} · CPC title

  • characterised by a face layer formed of separate pieces of material {which are juxtaposed side-by-side (B32B5/02 takes precedence)} · CPC title

  • comprising polycarbonates · CPC title

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What does patent US11266048B2 cover?
An electromagnetic wave absorber (1a) includes a resistive layer (10), an electrically conductive layer (20) and a dielectric layer (30). The electrically conductive layer (20) has a sheet resistance lower than a sheet resistance of the resistive layer (10). The dielectric layer (30) is disposed between the resistive layer (10) and the electrically conductive layer (20). The electromagnetic wav…
Who is the assignee on this patent?
Nitto Denko Corp
What technology area does this patent fall under?
Primary CPC classification H05K9/0084. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 01 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).