Tunnel magnetoresistive effect element and magnetic memory

US11264290B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11264290-B2
Application numberUS-201716080788-A
CountryUS
Kind codeB2
Filing dateSep 6, 2017
Priority dateSep 6, 2017
Publication dateMar 1, 2022
Grant dateMar 1, 2022

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A TMR element includes a reference layer, a magnetization free layer, a tunnel barrier layer between the reference layer and the magnetization free layer, and a perpendicular magnetization inducing layer and a leakage layer stacked on a side of the magnetization free layer opposite to the tunnel barrier layer side. A magnetization direction of the reference layer is fixed along a stack direction. The perpendicular magnetization inducing layer imparts magnetic anisotropy along the stack direction to the magnetization free layer. The leakage layer is disposed on an end portion region in an in-plane direction of the magnetization free layer. The perpendicular magnetization inducing layer is disposed on at least a central region in the in-plane direction of the magnetization free layer. A resistance value of the leakage layer along the stack direction per unit area in plane is less than that of the perpendicular magnetization inducing layer.

First claim

Opening claim text (preview).

The invention claimed is: 1. A magnetic memory comprising: a tunnel magnetoresistive effect element as a storage element, wherein the tunnel magnetoresistive effect element comprises: a reference layer; a magnetization free layer; a tunnel barrier layer stacked in a stack direction between the reference layer and the magnetization free layer; a perpendicular magnetization inducing layer and a leakage layer stacked on a side of the magnetization free layer opposite to the tunnel barrier layer side wherein a bottom surface of the leakage layer is in physical contact with a portion of a top surface of the magnetization free layer; a side wall portion formed of an insulation material and covering side surfaces of the reference layer, the tunnel barrier layer, the magnetization free layer, the perpendicular magnetization inducing layer, and the leakage layer, and a mask layer formed of a conductive material and stacked on the perpendicular magnetization inducing layer and the leakage layer, wherein a magnetization direction of the reference layer is fixed along the stack direction, the perpendicular magnetization inducing layer imparts magnetic anisotropy along the stack direction to the magnetization free layer, the leakage layer is disposed on an end portion region in an in-plane direction of the magnetization free layer, the perpendicular magnetization inducing layer is disposed on at least a central region in the in-plane direction of the magnetization free layer, a resistance value of the leakage layer along the stack direction per unit area in plane is less than a resistance value of the perpendicular magnetization inducing layer along the stack direction per unit area in plane, the perpendicular magnetization inducing layer and the leakage layer are arranged along the in-plane direction of the magnetization free layer, in a cross section parallel to the stack direction, a width in an in-plane direction of the leakage layer is greater than a thickness of the perpendicular magnetization inducing layer, and the perpendicular magnetization inducing layer is configured such that a resistance value of the perpendicular magnetization inducing layer along the stack direction per unit area in a plane perpendicular to the stack direction is smaller than that of the tunnel barrier layer. 2. A built-in memory comprising: the magnetic memory according to claim 1 .

Assignees

Inventors

Classifications

  • Devices using spin-polarised carriers · CPC title

  • Devices controlled by magnetic fields · CPC title

  • Spin-exchange coupled multilayers having at least one layer with perpendicular magnetic anisotropy · CPC title

  • Materials of the active region · CPC title

  • comprising tunnel junctions, e.g. tunnel magnetoresistance sensors · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11264290B2 cover?
A TMR element includes a reference layer, a magnetization free layer, a tunnel barrier layer between the reference layer and the magnetization free layer, and a perpendicular magnetization inducing layer and a leakage layer stacked on a side of the magnetization free layer opposite to the tunnel barrier layer side. A magnetization direction of the reference layer is fixed along a stack directio…
Who is the assignee on this patent?
Tdk Corp
What technology area does this patent fall under?
Primary CPC classification H01F10/3286. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 01 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).