Rare earth thin film magnet, process for producing same, and target for forming rare earth thin film magnet

Patent metadata

Field	Value
Publication number	US-11250976-B2
Application number	US-201515112458-A
Country	US
Kind code	B2
Filing date	Mar 3, 2015
Priority date	Jun 4, 2014
Publication date	Feb 15, 2022
Grant date	Feb 15, 2022

Abstract

The present invention provides a rare earth thin film magnet having Nd, Fe, and B as essential components, wherein the rare earth thin film magnet has a texture in which an α-Fe phase and a Nd2Fe14B phase are alternately arranged three-dimensionally, and each phase has an average crystal grain size of 10 to 30 nm. An object of this invention is to provide a rare earth thin film magnet having superior mass productivity and reproducibility and favorable magnetic properties, as well as to provide the production method thereof and a target for producing the thin film.

First claim

The invention claimed is:

1. A rare earth thin film magnet having Nd, Fe, and B as essential components, wherein the rare earth thin film magnet has a texture consisting of an α-Fe phase and a Nd 2 Fe 14 B phase which are alternately arranged three-dimensionally in the texture, wherein each of the α-Fe phase and the Nd 2 Fe 14 B phase has an average crystal grain size of 10 to 30 nm, and wherein the rare earth thin film magnet has a thickness of 5 μm or more, a maximum energy product (BH) max of 90 kJ/m 3 or more and 130 kJ/m 3 or less, a residual magnetization of 0.99 T or more and 1.05 T or less, and a coercivity of 386 kA/m or more and 446 kA/m or less.

2. A method of producing the rare earth thin film magnet according to claim 1 , comprising the steps of depositing a rare earth thin film via pulsed laser deposition using a target made from Nd x Fe 14 B, where X is a number that satisfies 1.8 to 2.7, crystallizing the deposited rare earth thin film by performing heat treatment thereto, and magnetizing the crystallized rare earth thin film to prepare the rare earth thin film magnet.

3. The method of producing a rare earth thin film magnet according to claim 2 , wherein a pulsed laser power density is set to 1 to 1000 J/cm 2 in the step of depositing the rare earth thin film.

4. The method of producing a rare earth thin film magnet according to claim 3 , wherein the heat treatment is performed under conditions of output: 7 to 9 kW and time: 1 to 5 seconds in the step of crystallizing the rare earth thin film.

5. The method of producing a rare earth thin film magnet according to claim 2 , wherein the heat treatment is performed under conditions of output: 7 to 9 kW and time: 1 to 5 seconds in the step of crystallizing the rare earth thin film.

Assignees

• Jx Nippon Mining & Metals Corp

Inventors

• Nakano Masaki
• Fukunaga Hirotoshi
• Yanai Takeshi
• Itakura Masaru
• Sawatari Hironobu

Classifications

• C23C14/16 Primary

  on metallic substrates or on substrates of boron or silicon · CPC title

• C22C33/003

  making amorphous alloys · CPC title

• H01F10/126

  containing rare earth metals (H01F10/133 takes precedence) · CPC title

• C23C14/5806

  Thermal treatment · CPC title

• H01F41/205

  by laser ablation, e.g. pulsed laser deposition [PLD] · CPC title