Optical system and method for correcting mask defects using the system

Patent metadata

Field	Value
Publication number	US-11249294-B2
Application number	US-201916269771-A
Country	US
Kind code	B2
Filing date	Feb 7, 2019
Priority date	Aug 8, 2016
Publication date	Feb 15, 2022
Grant date	Feb 15, 2022

Abstract

An optical system includes a scanning unit, a first lens-element group including at least a first lens element, and a focusing unit which is designed to focus beams onto a focus, wherein the focusing unit includes a second lens-element group including at least a second lens element and an imaging lens. The imaging lens further includes a pupil plane and a wavefront manipulator. The wavefront manipulator is arranged in the pupil plane of the imaging lens or in a plane that is conjugate to the pupil plane, or the scanning unit of the optical system is arranged in a plane that is conjugate to the pupil plane and the wavefront manipulator is arranged upstream of the scanning unit in the light direction. The focus of the second lens-element group lies in the pupil plane of the imaging lens in all focal positions of the focusing unit.

First claim

What is claimed is:

1. An optical system, comprising
a first lens-element group comprising at least a first lens element,
a focusing unit which is designed to focus beams onto a focus,
wherein the focusing unit is movably arranged along an optical axis of the optical system in such a way that a focal position can be changed along the optical axis of the optical system,
wherein the focusing unit comprises a second lens-element group comprising at least a second lens element and
an imaging lens,
wherein the imaging lens further comprises a pupil plane,

a scanning unit which is designed in such a way that the focus can be displaced laterally in relation to the optical axis,
a wavefront manipulator,
which is designed in such a way that a root-mean-square (RMS) wavefront error is less than 100 mλ, in at least two focal positions of the focusing unit that differ from one another,
wherein the wavefront manipulator is arranged in the pupil plane of the imaging lens or in a plane that is conjugate to the pupil plane of the imaging lens,
or the scanning unit is arranged in a plane that is conjugate to the pupil plane of the imaging lens and the wavefront manipulator is arranged upstream of the scanning unit in a light direction,

wherein a focus of the second lens-element group lies in the pupil plane of the imaging lens in both focal positions of the focusing unit.

2. The optical system according to claim 1 , comprising a focusing range of more than 500 Rayleigh lengths.

3. The optical system according to claim 1 , wherein the scanning unit is embodied as tiltable mirror.

4. The optical system according to claim 1 , wherein the scanning unit comprises two acousto-optic deflectors, which change the focal position in mutually perpendicular directions.

5. The optical system according to claim 1 , wherein the wavefront manipulator is positioned in a focus of the first lens-element group.

6. The optical system according to claim 1 , wherein the scanning unit is positioned in a focus of the first lens-element group.

7. The optical system according to claim 1 , wherein the wavefront manipulator is designed as a deformable mirror.

8. The optical system according to claim 1 , wherein the focusing unit is designed in such a way that a point of a sample is imaged into an image point in an image plane.

9. The optical system according to claim 1 , wherein the optical system is telecentric on a sample side.

10. The optical system according to claim 1 , wherein a light source produces illumination light and a beam splitter is arranged in the optical system in such a way that some of the illumination light is supplied to an observation device.

11. The optical system according to claim 10 , wherein the observation device is embodied as a wavefront sensor in order to detect a wavefront that was set by the wavefront manipulator.

12. The optical system according to claim 11 , comprising a control unit which compares data that were recorded by the wavefront sensor with a reference wavefront and transfers corrections that were calculated from deviations of a measured wavefront from the reference wavefront to the wavefront manipulator.

13. The optical system according to claim 10 , wherein the system comprises a light source that is a pulsed laser.

14. A method for correcting defects of a photolithographic mask, said method comprising:
providing an optical system according to claim 1 ,
focusing a first focal position within the photolithographic mask using the focusing unit along an optical axis of the system,
setting a wavefront by use of a wavefront manipulator such that the RMS wavefront error is less than 100 mλ,
correcting a first fault of the mask by introducing a first irreversible change at the first focal position within the photolithographic mask.

15. The method for correcting defects of a photolithographic mask according to claim 14 , wherein the method comprises:
focusing a second focal position within the photolithographic mask using the focusing unit along an optical axis of the system,
setting a wavefront by use of a wavefront manipulator such that the RMS wavefront error is less than 100 mλ, and
correcting a second fault of the mask by introducing a second irreversible change at the second focal position within the photolithographic mask.

16. The method for correcting defects of a photolithographic mask according to claim 14 , wherein the method further comprises the step of laterally scanning the focal position over a portion of the photolithographic mask.

17. The method for correcting defects of a photolithographic mask according claim 15 , wherein the method comprises measuring a wavefront using a wavefront sensor.

18. The method for correcting defects of a photolithographic mask according to claim 17 , wherein the method comprises the following steps:
comparing the measured wavefront with a reference wavefront,
calculating a correction wavefront from this comparison such that the RMS wavefront error is reduced,
setting new control signals for the wavefront manipulator from the correction wavefront, and
transmitting the control signals to the wavefront manipulator.

19. The method of claim 15 in which setting the wavefront by use of the wavefront manipulator comprises setting the wavefront by use of a deformable mirror.

20. The method of claim 16 in which laterally scanning the focal position comprises using at least one of (i) at least one tiltable mirror, or (ii) at least one acousto-optic deflector, to scan the focal position over the portion of the photolithographic mask.

Assignees

• Zeiss Carl Smt Gmbh
• Zeiss Carl Sms Ltd

Inventors

• Seesselberg Markus
• Dmitriev Vladimir
• Welte Joachim
• Stern Uri
• Cohen Tomer
• Graitzer Erez

Classifications

• G03F7/706849

  Irradiation branch, e.g. optical system details, illumination mode or polarisation control · CPC title

• G03F7/70641

  Focus · CPC title

• G03F7/70275

  Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems · CPC title

• G03F7/70241

  Optical aspects of refractive lens systems, i.e. comprising only refractive elements · CPC title

• G02B26/06

  for controlling the phase of light (G02B26/08 takes precedence {, measuring optical phase difference G01J9/00}) · CPC title