Cleaning device

Patent metadata

Field	Value
Publication number	US-11244806-B2
Application number	US-201816967805-A
Country	US
Kind code	B2
Filing date	Feb 7, 2018
Priority date	Feb 7, 2018
Publication date	Feb 8, 2022
Grant date	Feb 8, 2022

Abstract

A charged particle beam device includes a lens barrel having a charged particle source, a sample chamber in which a sample to be irradiated with a charged particle beam is provided, and a heat emission type electron source disposed in the sample chamber and maintained at a lower potential than that of an inner wall of the sample chamber, in which the inside of the sample chamber is cleaned by electrons (e−) emitted from the heat emission type electron source after a heating current is generated by applying a voltage from an electron source power supply. The heat emission type electron source is maintained at a lower potential than that of the inner wall of the sample chamber by applying a negative voltage to the heat emission type electron source using a bias power supply. A magnitude of the negative voltage applied to the heat emission type electron source is preferably about 30 to 1000 V, particularly preferably about 60 to 120 V.

First claim

The invention claimed is:

1. A cleaning device comprising:
a first heat emission type electron source disposed in a sample chamber connected to a lens barrel having a charged particle source, wherein
the sample chamber is cleaned by electrons emitted from the first heat emission type electron source, and
a current is supplied to the first heat emission type electron source in a state where a voltage applied to a sample stage disposed in the sample chamber is lower than a voltage applied to an inner wall of the sample chamber.

2. The cleaning device according to claim 1 , wherein
the first heat emission type electron source is a filament.

3. The cleaning device according to claim 2 , wherein
the filament is a tungsten filament.

4. The cleaning device according to claim 1 , further comprising:
an electron source power supply configured to supply a heating current to the first heat emission type electron source.

5. The cleaning device according to claim 4 , further comprising:
a detector configured to detect a current flowing through the first heat emission type electron source.

6. The cleaning device according to claim 5 , further comprising:
a control unit configured to receive an output of the detector, wherein
the control unit is configured to output cleanliness in the sample chamber based on the output of the detector.

7. The cleaning device according to claim 5 , further comprising:
a control unit configured to receive an output of the detector, wherein
the control unit is configured to control, based on the output of the detector, the heating current flowing from the electron source power supply to the first heat emission type electron source.

8. The cleaning device according to claim 1 , further comprising:
a vacuum gauge configured to detect a vacuum degree in the sample chamber.

9. A cleaning device comprising:
a first heat emission type electron source disposed in a sample chamber connected to a lens barrel having a charged particle source, wherein
the sample chamber is cleaned by electrons emitted from the first heat emission type electron source, and
the first heat emission type electron source includes an active reflection electrode or a passive reflection electrode.

10. The cleaning device according to claim 1 , wherein
the lens barrel and the sample chamber are a lens barrel and a sample chamber of an electron microscope.

11. The cleaning device according to claim 1 , further comprising:
a bias power supply configured to apply a bias voltage to the first heat emission type electron source.

12. The cleaning device according to claim 11 , further comprising:
a unit configured to apply, to a sample stage, a voltage lower than the bias voltage applied to the first heat emission type electron source.

13. The cleaning device according to claim 11 , further comprising:
an electron source power supply configured to supply a heating current to the first heat emission type electron source, wherein
the bias power supply is configured to apply a bias voltage to the first heat emission type electron source before the electron source power supply supplies the heating current to the first heat emission type electron source.

14. The cleaning device according to claim 11 , further comprising:
an electron source power supply configured to supply a heating current to the first heat emission type electron source, wherein
the bias power supply is configured to stop applying the bias voltage to the first heat emission type electron source after the electron source power supply stops supplying the heating current to the first heat emission type electron source.

15. The cleaning device according to claim 11 , wherein
the bias power supply is configured to apply a voltage of 60 to 120 V to the first heat emission type electron source.

16. The cleaning device according to claim 1 , further comprising:
a second heat emission type electron source disposed in the sample chamber.

17. The cleaning device according to claim 16 , wherein
both a distance between an optical axis of the lens barrel and the first heat emission type electron source and a distance between the optical axis and the second heat emission type electron source are shorter than a distance between the first heat emission type electron source and the second heat emission type electron source.

18. The cleaning device according to claim 16 , wherein
the first heat emission type electron source and the second heat emission type electron source are disposed at a position where the first heat emission type electron source and the second heat emission type electron source sandwich a part of the lens barrel in the sample chamber or a sample stage disposed in the sample chamber.

19. The cleaning device according to claim 16 , further comprising:
a third heat emission type electron source disposed in the sample chamber.

20. A cleaning device comprising:
an electron source which is disposed in a sample chamber connected to a lens barrel having a charged particle source and is held at a negative potential with respect to the sample chamber,
wherein a current is supplied to the first heat emission type electron source in a state where a voltage applied to a sample stage disposed in the sample chamber is lower than a voltage applied to an inner wall of the sample chamber.

21. The cleaning device according to claim 20 , wherein
the sample chamber is cleaned by irradiation of electrons from the electron source.

Assignees

• Hitachi High Tech Corp
• Hitachi High Tech Canada Inc

Inventors

• SATO Ryuju
• Hoyle David

Classifications

• H01J37/16 Primary

  Vessels; Containers · CPC title

• H01J37/242 Primary

  Filament heating power supply or regulation circuits (H01J37/241 takes precedence) · CPC title

• H01J37/244

  Detectors; Associated components or circuits therefor · CPC title

• H01J37/20

  Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support · CPC title

• H01J37/28

  with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title