Process for the manufacturing of triaryl-organo borates

US11242360B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11242360-B2
Application numberUS-201716348333-A
CountryUS
Kind codeB2
Filing dateNov 7, 2017
Priority dateNov 9, 2016
Publication dateFeb 8, 2022
Grant dateFeb 8, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

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The invention relates to a process for the preparation of triaryl-organo borates from boronic ester and the use of these substances in photo initiator systems, photopolymer compositions comprising such photo initiator systems, a holographic medium comprising said photopolymer composition and the respective hologram.

First claim

Opening claim text (preview).

The invention claimed is: 1. Process for the production of triaryl-organo borates of the formula 1/m A m+ [R 1 BR 3 3 ] − (IX) obtainable or obtained by reacting a boronic ester of formula B(OR 2 ) 3 (I) with an organolithium- or Grignard-reagent of formula R 1 -E (II) in a solvent or solvent mixture S1, adding a previously formed organometallic reagent of the formula R 3 -M-X (V) in a solvent or solvent mixture S2, further adding a salt of the formula 1/m A m+ Y − (VIII) and isolating the precipitated triaryl-alkyl borate product of formula 1/m A m+ [R 1 BR 3 3 ] − (IX), wherein the triaryl-alkyl borate of 1/m A m+ [R 1 BR 3 3 ] − (IX) comprises less than 10.000 ppm of tetra aryl borate A m+ [BR 4 3 ] − , in which A stands for a substituted organic cation with the charge m on the basis of nitrogen, phosphorus, oxygen, sulfur and/or iodine, B stands for boron E stands for lithium or magnesium-monohalide, M stands for a metal selected from magnesium, calcium, aluminum, tin, zinc or cadmium, X stands for chlorine, bromine or iodine, Y stands for halide, alkoxide, or sulfide, R 1 stands for a C 1 - to C 22 -alkyl-, C 3 - to C 22 -alkenyl-, C 3 - to C 22 -alkynyl-, C 5 - to C 7 -cycloalkyl- or C 7 - to C 15 -aralkyl-residue, which can be optionally substituted by oxygen or nitrogen or halogen, R 2 stands for an optionally branched C 1 - to C 22 -alkyl-residue or an optionally alkyl-substituted C 3 - to C 7 -cycloalkyl-residue or an optionally aryl- or heteroaryl substituted C 2 - to C 22 -alkyl-residue or R 2 may form a 2-8-membered bicyclic ring optionally substituted by alkyl residues and/or by oxygen atoms or R 2 may form a 4-14-membered tricyclic ring an optionally substituted by alkyl residues and/or by oxygen atoms, R 3 stands for a C 6 - to C 14 -aryl residue optionally substituted by at least one residue selected from halogen, C 1 -to C 4 -alkyl, trifluoromethyl, C 1 - to C 4 -alkoxy, trifluoromethoxy, phenyl and/or phenoxy, m stands for 1, 2 or 3, S1 and S2 independently from one another stand for an aprotic organic solvent or a mixture of aprotic organic solvents. 2. The process according to claim 1 comprising the steps of i) reacting boronic ester of formula B(OR 2 ) 3 (I) in a solvent or solvent mixture S1 at a temperature or temperature range T1 with an organolithium- or Grignard-reagent of formula R 1 -E (II) to yield the salt of formula [R 1 B(OR 2 ) 3 ] − E + (III), ii) reacting an organic halogen compound of formula R 3 -X (IV) in a solvent or solvent mixture S2 at a temperature or temperature range T2 with a metal M to yield an organometallic reagent of formula R 3 -M-X (V), iii) reacting the compounds (III) and (V) in a combined solvent or solvent mixture S1 and S2 at a temperature or temperature range T3 to yield the salts of formula [R 1 BR 3 3 ] − E + (VI) and of formula R 2 O-M-X (VII), iv) adding the salt of formula 1/m A m+ Y − (VIII) and water and v) isolating the precipitated product of formula 1/m A m+ [R 1 BR 3 3 ] − (IX) whereby T1 stands for a temperature of −110° C. to −50° C., T2 stands for a temperature of −20° C. to 100° C., and T3 stands for a temperature of 0° C. to 100° C. 3. Process according to claim 1 , characterized in that R 1 stands for an C 2 - to C 18 -alkyl-, C 3 - to C 18 -alkenyl-, C 3 - to C 18 -alkynyl-, C 5 - to C 6 -cycloalkyl- or C 7 - to C 13 -aralkyl residue optionally substituted by oxygen and/or halogen. 4. Process according to claim 1 , characterized in that R 2 stands for a branched C 2 - to C 18 -alkyl-residue or R 2 forms a 2-6-membered bicyclic ring optionally substituted by alkyl residues and/or by oxygen atoms or R 2 may form a 4-10-membered tricyclic ring optionally substituted by alkyl residues and/or by oxygen atoms. 5. Process according to claim 1 , characterized in that R 3 stands for a C 6 - to C 10 -aryl residue that may be optionally substituted by at least one of the residues selected from halogen, C 1 -to C 4 -alkyl, trifluoromethyl, C 1 - to C 4 -alkoxy, trifluormethoxy, phenyl and/or phenoxy. 6. Process according to claim 1 , characterized in that S1 and S2 independently from one another stand for alkanes, alkenes, benzene and aromatics with aliphatic and/or aromatic substituents, carboxylic acid esters, ethers or mixtures thereof. 7. Process according to claim 1 , characterized in that M stands for magnesium, calcium or aluminum.

Assignees

Inventors

Classifications

  • the binders being polyurethanes · CPC title

  • with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring nitrogen atoms · CPC title

  • Details {of features involved during the holographic process; Replication of holograms without interference recording} · CPC title

  • having no double bonds between ring members or between ring members and non-ring members · CPC title

  • C07F5/027Primary

    Organoboranes and organoborohydrides · CPC title

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What does patent US11242360B2 cover?
The invention relates to a process for the preparation of triaryl-organo borates from boronic ester and the use of these substances in photo initiator systems, photopolymer compositions comprising such photo initiator systems, a holographic medium comprising said photopolymer composition and the respective hologram.
Who is the assignee on this patent?
Covestro Deutschland Ag
What technology area does this patent fall under?
Primary CPC classification C07F5/027. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Feb 08 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).