Tape-casting apparatuses for preparing carbon nanostructure sheets and carbon nanostructure sheets prepared by the same

US11242249B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11242249-B2
Application numberUS-201816615851-A
CountryUS
Kind codeB2
Filing dateJun 5, 2018
Priority dateJun 7, 2017
Publication dateFeb 8, 2022
Grant dateFeb 8, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Apparatuses and methods for preparing carbon nanostructure sheets are provided. The apparatuses may include a casting body including a substrate configured to move along a first direction, a slurry reservoir configured to contain a slurry, a dispenser connected to the slurry reservoir and configured to dispense the slurry onto a surface of the substrate and a doctoring member that extends in a second direction traversing the first direction and that is positioned above the surface of the substrate. The slurry may include carbon nanostructures, and/or one or more functional materials. The doctoring member may be spaced apart from the surface of the substrate by a predetermined distance.

First claim

Opening claim text (preview).

That which is claimed: 1. An apparatus for preparing carbon nanostructure sheets, the apparatus comprising: a casting body including a substrate, the substrate being configured to move along a first direction, wherein the first direction is a longitudinal direction of the substrate, and wherein the substrate includes a surface that is patterned or textured; a slurry reservoir configured to contain a slurry, the slurry including carbon nanostructures; a dispenser connected to the slurry reservoir and configured to dispense the slurry onto the surface of the substrate; and a doctoring member that extends in a second direction traversing the first direction and that is positioned above the surface of the substrate, the doctoring member being spaced apart from the surface of the substrate by a distance greater than about 0.01 mm. 2. The apparatus of claim 1 , wherein the surface of the substrate comprises a material having high surface energy that is greater than 300 mNm −1 . 3. The apparatus of claim 1 , wherein the substrate has a beveled edge. 4. The apparatus of claim 1 , wherein the surface of the substrate comprises a microscopic patterned surface. 5. The apparatus of claim 4 , wherein the microscopic patterned surface includes micro-pyramids and/or micro-pillars. 6. The apparatus of claim 5 , wherein the microscopic patterned surface includes micro-pyramids and the micro-pyramids have a height in a range of about 500 nm to 2,500 nm and a distance between adjacent micro-pyramids is in a range of between 1,000 nm and 3,000 nm. 7. The apparatus of claim 5 , wherein the microscopic patterned surface includes micro-pillars and the micro-pillars have a height in a range of about 500 nm to 2,500 nm and a distance between adjacent micro-pillars is in a range of between 1,000 nm and 3,000 nm. 8. The apparatus of claim 1 , wherein the surface has a root mean squared roughness value of about 150 nm to about 500 nm. 9. The apparatus of claim 1 , wherein the substrate is configured to be heated to a temperature greater than room temperature. 10. The apparatus of claim 1 , wherein the apparatus includes the press and the press is configured to apply a pressure to the carbon nanostructure s that is greater than or equal to 1 Pa for in a range of about 5 seconds to about 10 minutes. 11. The apparatus of claim 1 , wherein the apparatus includes the drying/pressing device. 12. The apparatus of claim 1 , wherein the surface of the substrate comprises a patterned surface that includes a slotted surface, a perforated surface, serpentine stripes, and/or quatrefoil shapes. 13. The apparatus of claim 1 , wherein the slurry reservoir is connected to an external vacuum line and/or includes at least one degassing device and wherein the apparatus further includes one of a press or a drying/pressing device, wherein the press is configured to apply a pressure to the carbon nanostructure sheets and wherein the drying/pressing device is configured to apply heat and pressure to the carbon nanostructure sheets. 14. An apparatus for preparing carbon nanostructure sheets, the apparatus comprising: a casting body including a substrate, the substrate being configured to move along a first direction, wherein the first direction is a longitudinal direction of the substrate; a slurry reservoir configured to contain a slurry, the slurry including carbon nanostructures, wherein the slurry reservoir is connected to an external vacuum line and/or includes at least one degassing device; a dispenser connected to the slurry reservoir and configured to dispense the slurry onto a surface of the substrate; and a doctoring member that extends in a second direction traversing the first direction and that is positioned above the surface of the substrate, the doctoring member being spaced apart from the surface of the substrate by a distance greater than about 0.01 mm. 15. The apparatus of claim 14 , wherein the slurry reservoir includes one or more mixing devices or homogenizers. 16. The apparatus of claim 15 , wherein the slurry reservoir, the mixing devices, and/or the homogenizers are configured to perform degassing of the slurry at a temperature greater than or equal to room temperature under a pressure of less than 0.01 mbar for about 1 second to about 1 minute. 17. The apparatus of claim 15 , wherein the mixing devices, the homogenizers and the degassing device are configured to operate simultaneously or sequentially. 18. The apparatus of claim 14 , wherein the dispenser is a spray dispenser. 19. An apparatus for preparing carbon nanostructure sheets, the apparatus comprising: a casting body including a substrate, the substrate being configured to move along a first direction, wherein the first direction is a longitudinal direction of the substrate; a slurry reservoir configured to contain a slurry, the slurry including carbon nanostructures; a dispenser connected to the slurry reservoir and configured to dispense the slurry onto a surface of the substrate; a doctoring member that extends in a second direction traversing the first direction and that is positioned above the surface of the substrate, the doctoring member being spaced apart from the surface of the substrate by a distance greater than about 0.01 mm; and one of a press or a drying/pressing device, wherein the press is configured to apply a pressure to the carbon nanostructure sheets and wherein the drying/pressing device is configured to apply heat and pressure to the carbon nanostructure sheets. 20. The apparatus of claim 19 , further comprising a dryer that includes a heating element and is configured to operate at a temperature greater than or equal to room temperature under a pressure greater than or equal to 1 atm or under a pressure of less than 0.01 mbar for about 5 seconds to about 10 minutes.

Assignees

Inventors

Classifications

  • Nanotechnology for materials or surface science, e.g. nanocomposites · CPC title

  • Manufacture or treatment of nanostructures · CPC title

  • Slip casting, i.e. applying a slip or slurry on a perforated or porous or absorbent surface with the liquid being drained away · CPC title

  • Spreading-out the material on a substrate {, e.g. on the surface of a liquid} · CPC title

  • Removing articles from moulds, cores or other substrates {(B29C33/444 and B29C37/0017 take precedence)} · CPC title

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What does patent US11242249B2 cover?
Apparatuses and methods for preparing carbon nanostructure sheets are provided. The apparatuses may include a casting body including a substrate configured to move along a first direction, a slurry reservoir configured to contain a slurry, a dispenser connected to the slurry reservoir and configured to dispense the slurry onto a surface of the substrate and a doctoring member that extends in a …
Who is the assignee on this patent?
Univ Khalifa Science & Technology
What technology area does this patent fall under?
Primary CPC classification C01B32/168. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Feb 08 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).