System and method for scalable real-time micro-object position control with the aid of a digital computer
US-10558204-B2 · Feb 11, 2020 · US
US11242244B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11242244-B2 |
| Application number | US-201816237419-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 31, 2018 |
| Priority date | Dec 31, 2018 |
| Publication date | Feb 8, 2022 |
| Grant date | Feb 8, 2022 |
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Disclosed are methods and systems of controlling the placement of micro-objects on the surface of a micro-assembler. Control patterns may be used to cause electrodes of the micro-assembler to generate dielectrophoretic (DEP) and electrophoretic (EP) forces which may be used to manipulate, move, position, or orient one or more micro-objects on the surface of the micro-assembler. The control patterns may be part of a library of control patterns.
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What is claimed is: 1. A method, comprising: detecting a set of micro-objects on a surface of a micro-assembler comprising an array of force generating pixels; determining a set of positions of the set of micro-objects; determining a second set of positions of the set of micro-objects; identifying one or more types of the set of micro-objects; identifying a set of control patterns from a control pattern library based on the set of positions and the one or more types of the set of micro-objects; identifying a second set of control patterns from the control pattern library based on the second set of positions and the one or more types of the set of micro-objects; manipulating the set of micro-objects using the set of control patterns, wherein each control pattern of the set of control patterns indicates a force pattern on a portion of the array of force generating pixels; and manipulating the set of micro-objects using the second set of control patterns. 2. The method of claim 1 , further comprising: determining a set of orientations of the set of micro-objects, wherein the set of control patterns is identified further based on the set of orientations of the set of micro-objects. 3. The method of claim 1 , wherein the control pattern library comprises control patterns that cause one or more of electrophoretic forces or dielectrophoretic forces to be exerted on the set of micro-objects. 4. The method of claim 3 , wherein the one or more of electrophoretic forces or dielectrophoretic forces one or more of: move the set of micro-objects; hold the set of micro-objects in an area; rotate the set of micro-objects; and change a set of orientations of the set of micro-objects. 5. The method of claim 1 , wherein determining a set of positions of the set of micro-objects comprises: obtaining an image of the set of micro-objects; and analyzing the image to determine the set of positions of the set of micro-objects. 6. The method of claim 1 , wherein the set of positions of the set of micro-objects is determined by determining a set of boundaries of the set of micro-objects. 7. The method of claim 1 , wherein the set of control patterns are one or more of: automatically generated by a computing device; based on user input; and based on previous testing of the set of control patterns. 8. The method of claim 1 , wherein the set of control patterns indicate voltages with different polarity. 9. The method of claim 1 , wherein the set of control patterns indicates at least one refresh rate for a first control pattern of the set of control patterns. 10. The method of claim 1 , wherein each control pattern of the set of control patterns further indicates a center position and an orientation for a respective voltage pattern. 11. The method of claim 1 , wherein manipulating the set of micro-objects on the surface of the micro-assembler comprises: controlling orientations of the set of micro-objects in three dimensions relative to the surface of the micro-assembler. 12. The method of claim 1 , wherein different control patterns of the set of control patterns are used at different time periods.
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