Method of controlling the placement of micro-objects on a micro-assembler

US11242244B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11242244-B2
Application numberUS-201816237419-A
CountryUS
Kind codeB2
Filing dateDec 31, 2018
Priority dateDec 31, 2018
Publication dateFeb 8, 2022
Grant dateFeb 8, 2022

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Disclosed are methods and systems of controlling the placement of micro-objects on the surface of a micro-assembler. Control patterns may be used to cause electrodes of the micro-assembler to generate dielectrophoretic (DEP) and electrophoretic (EP) forces which may be used to manipulate, move, position, or orient one or more micro-objects on the surface of the micro-assembler. The control patterns may be part of a library of control patterns.

First claim

Opening claim text (preview).

What is claimed is: 1. A method, comprising: detecting a set of micro-objects on a surface of a micro-assembler comprising an array of force generating pixels; determining a set of positions of the set of micro-objects; determining a second set of positions of the set of micro-objects; identifying one or more types of the set of micro-objects; identifying a set of control patterns from a control pattern library based on the set of positions and the one or more types of the set of micro-objects; identifying a second set of control patterns from the control pattern library based on the second set of positions and the one or more types of the set of micro-objects; manipulating the set of micro-objects using the set of control patterns, wherein each control pattern of the set of control patterns indicates a force pattern on a portion of the array of force generating pixels; and manipulating the set of micro-objects using the second set of control patterns. 2. The method of claim 1 , further comprising: determining a set of orientations of the set of micro-objects, wherein the set of control patterns is identified further based on the set of orientations of the set of micro-objects. 3. The method of claim 1 , wherein the control pattern library comprises control patterns that cause one or more of electrophoretic forces or dielectrophoretic forces to be exerted on the set of micro-objects. 4. The method of claim 3 , wherein the one or more of electrophoretic forces or dielectrophoretic forces one or more of: move the set of micro-objects; hold the set of micro-objects in an area; rotate the set of micro-objects; and change a set of orientations of the set of micro-objects. 5. The method of claim 1 , wherein determining a set of positions of the set of micro-objects comprises: obtaining an image of the set of micro-objects; and analyzing the image to determine the set of positions of the set of micro-objects. 6. The method of claim 1 , wherein the set of positions of the set of micro-objects is determined by determining a set of boundaries of the set of micro-objects. 7. The method of claim 1 , wherein the set of control patterns are one or more of: automatically generated by a computing device; based on user input; and based on previous testing of the set of control patterns. 8. The method of claim 1 , wherein the set of control patterns indicate voltages with different polarity. 9. The method of claim 1 , wherein the set of control patterns indicates at least one refresh rate for a first control pattern of the set of control patterns. 10. The method of claim 1 , wherein each control pattern of the set of control patterns further indicates a center position and an orientation for a respective voltage pattern. 11. The method of claim 1 , wherein manipulating the set of micro-objects on the surface of the micro-assembler comprises: controlling orientations of the set of micro-objects in three dimensions relative to the surface of the micro-assembler. 12. The method of claim 1 , wherein different control patterns of the set of control patterns are used at different time periods.

Assignees

Inventors

Classifications

  • using identification means, e.g. labels on substrates or labels on containers · CPC title

  • Sorting devices · CPC title

  • batch processes · CPC title

  • Means to assemble electrical device · CPC title

  • by utilizing optical sighting device · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11242244B2 cover?
Disclosed are methods and systems of controlling the placement of micro-objects on the surface of a micro-assembler. Control patterns may be used to cause electrodes of the micro-assembler to generate dielectrophoretic (DEP) and electrophoretic (EP) forces which may be used to manipulate, move, position, or orient one or more micro-objects on the surface of the micro-assembler. The control patt…
Who is the assignee on this patent?
Palo Alto Res Ct Inc
What technology area does this patent fall under?
Primary CPC classification B81C99/002. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Feb 08 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).