Treatment of offgas from urea finishing

US11241649B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11241649-B2
Application numberUS-202017273813-A
CountryUS
Kind codeB2
Filing dateMay 22, 2020
Priority dateMay 22, 2019
Publication dateFeb 8, 2022
Grant dateFeb 8, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Disclosed is a urea finishing method including an off-gas treatment, the method comprising urea finishing and supplying the off-gas to a quenching zone and to a scrub column comprising a sump and a venturi stage, wherein the sump has a split sump configuration with two compartments.

First claim

Opening claim text (preview).

The invention claimed is: 1. A urea finishing method including an off-gas treatment, the method comprising: a) supplying a urea melt and air to a finishing section, and solidifying the urea melt to give a solid urea product and off-gas, wherein the off-gas comprises urea dust and ammonia, b) supplying the off-gas to a quenching zone and quenching the off-gas by spraying a quench liquid, to give a mixed stream comprising quench liquid and quenched off-gas, wherein the quench liquid comprises dissolved urea, c) supplying the mixed stream comprising quench liquid and quenched off-gas to a scrub column through an inlet, d) passing the quenched off-gas through a first mist eliminator in said scrub column and subsequently through a venturi tube comprised in a venturi stage to give a scrubbed gas stream, wherein the first mist eliminator is washed with a first wash liquid and wherein a spray liquid is sprayed in the gas stream in said venturi stage, wherein said scrub column comprises a sump below said first mist eliminator, wherein said sump comprises a first sump compartment and a second sump compartment which are separated from each other by a wall, wherein said inlet is arranged above said first sump compartment and wherein at least 80 wt. % of the quench liquid comprised in said mixed stream is collected in said first sump compartment, wherein the first sump compartment receives said first wash liquid from said first mist eliminator; the method further comprising: e) recirculating liquid, which is rich sump liquid, from said first sump compartment as quench liquid to said quenching zone, and f) recirculating liquid, which is lean sump liquid, from said second sump compartment to said first mist eliminator as said first wash liquid and to said venturi stage as said spray liquid. 2. The urea finishing method according to claim 1 , further comprising: purging a part of the rich sump liquid from the first sump compartment, and adding makeup water to the lean sump liquid, wherein the lean sump liquid has a urea concentration of 5 wt. % or less and wherein the rich sump liquid has a urea concentration of at least 40 wt. %. 3. The urea finishing method according to claim 1 , further comprising acid scrubbing the scrubbed gas stream using an acid scrub solution. 4. The urea finishing method according to claim 1 , further comprising: purging a part of the rich sump liquid from the first sump compartment and heating the rich sump liquid which is purged, in an evaporator to give vapour and a concentrated purge stream; and combining the concentrated purge stream with the urea melt supplied to the finishing section. 5. The urea finishing method according to claim 1 , wherein the finishing section is a fluid bed granulator. 6. The urea finishing method according to claim 1 , further comprising supplying a part of the rich sump liquid from the first sump compartment to a duct for off-gas connecting the finishing section with the quenching zone. 7. A gas treatment system for treating a gas stream, comprising a quenching zone and a scrub column, wherein the scrub column comprises a first mist eliminator, a venturi stage and a sump, wherein the venturi stage comprises a venturi tube and a nozzle for a first spray liquid, a) wherein the quenching zone comprises an inlet for said gas stream, an inlet for quench liquid, a quench spray nozzle to spray the quench liquid into the gas stream, and an outlet for a mixed stream comprising quenched off-gas and quench liquid, b) wherein the scrub column comprises an inlet for said mixed stream connected to said outlet of said quenching zone, c) wherein the scrub column is arranged for flowing the quenched off-gas from said inlet through said first mist eliminator and subsequently through said venturi tube, d) wherein said scrub column further comprises a first nozzle for providing a wash liquid to said first mist eliminator, e) wherein said sump comprises a first sump compartment and a second sump compartment which are separated from each other by a wall, wherein the inlet for the mixed stream is arranged above said first sump compartment such that quench liquid from said mixed stream is received in said first sump compartment, f) wherein the first sump compartment is arranged for collecting wash liquid from said first mist eliminator, g) wherein the first sump compartment has an outlet for rich sump liquid connected to said inlet for quench liquid of said quenching zone, h) wherein the second sump compartment has an outlet for lean sump liquid connected to an inlet of the first nozzle of said first mist eliminator (ME 1 ) and to said nozzle of said venturi stage. 8. The gas treatment system according to claim 7 , wherein said first mist eliminator is a chevron type mist eliminator. 9. A urea finishing plant comprising the gas treatment system according to claim 7 and a urea finishing section, wherein the urea finishing section comprises an inlet for urea melt, an inlet for air, an outlet for solid urea and an outlet for off-gas which is connected to the inlet of the quenching zone and wherein the urea finishing section is configured for solidifying the urea melt using the air. 10. The urea finishing plant according to claim 9 , wherein the urea finishing section is a fluidized bed granulator. 11. The urea finishing plant according to claim 9 , wherein the scrub column further comprises an acid scrub section above the venturi stage. 12. The urea finishing plant according to claim 9 further comprising an evaporator having an inlet in fluid connection with said outlet for rich sump, wherein the evaporator further has an outlet for urea-containing liquid and an outlet for vapour, wherein the outlet for urea-containing liquid is connected with a urea melt transport line connected to the inlet for urea melt of said finishing section. 13. The urea finishing plant according to claim 9 , wherein the sump comprises an overflow weir at an upper part of said wall and wherein said second sump compartment comprises a cover plate sealing off the upper side of the second sump compartment. 14. The urea finishing plant according to claim 9 , wherein the first mist eliminator comprised in said gas treatment system is a chevron type mist eliminator. 15. The urea finishing plant according to claim 9 , wherein the urea finishing section is a spouted bed granulator. 16. The urea plant comprising the urea finishing plant according to claim 9 and further comprising a urea melt plant, wherein the urea melt plant comprises a high pressure synthesis section, a recovery section and an evaporation section, wherein the high pressure synthesis section comprises a reactor, a stripper and a carbamate condenser.

Assignees

Inventors

Classifications

  • C07C273/16Primary

    Separation; Purification · CPC title

  • by suspending the powder material in a gas, e.g. in fluidised beds or as a falling curtain · CPC title

  • Other waste gases · CPC title

  • Ammonia · CPC title

  • with gas-liquid contact · CPC title

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Frequently asked questions

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What does patent US11241649B2 cover?
Disclosed is a urea finishing method including an off-gas treatment, the method comprising urea finishing and supplying the off-gas to a quenching zone and to a scrub column comprising a sump and a venturi stage, wherein the sump has a split sump configuration with two compartments.
Who is the assignee on this patent?
Stamicarbon
What technology area does this patent fall under?
Primary CPC classification C07C273/16. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Feb 08 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).