Method and apparatus for load-locked printing

US11230757B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11230757-B2
Application numberUS-202016949412-A
CountryUS
Kind codeB2
Filing dateOct 28, 2020
Priority dateJun 13, 2008
Publication dateJan 25, 2022
Grant dateJan 25, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The disclosure relates to a method and apparatus for preventing oxidation or contamination during a circuit printing operation. The circuit printing operation can be directed to OLED-type printing. In an exemplary embodiment, the printing process is conducted at a load-locked printer housing having one or more of chambers. Each chamber is partitioned from the other chambers by physical gates or fluidic curtains. A controller coordinates transportation of a substrate through the system and purges the system by timely opening appropriate gates. The controller may also control the printing operation by energizing the print-head at a time when the substrate is positioned substantially thereunder.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for forming a film on a substrate, the method comprising: floating a substrate on a flotation system in a substrate-printing region having an inert gas environment, the floatation system comprising at least one gas inlet port and at least one gas outlet port; while floating the substrate in the substrate-printing region: moving the substrate in a first direction and moving at least one print-head in a second direction, the first and second directions being substantially orthogonal to each other, controlling a float height of the substrate using gas flow through the at least one gas inlet port and the at least one gas outlet port, and printing a material on a surface of the substrate with the at least one print-head having at least one nozzle, wherein each of the first and second directions is substantially orthogonal to a direction normal to the surface of the substrate the material is printed on; transporting the substrate to a substrate-outlet region; and removing the substrate from the substrate-outlet region. 2. The method of claim 1 , further comprising transporting the substrate to the substrate-printing region from a substrate-inlet region having an inert gas environment. 3. The method of claim 2 , further comprising receiving the substrate at the substrate-inlet region, isolating the substrate-inlet region, and forming the inert gas environment prior to transporting the substrate to the substrate-printing region. 4. The method of claim 2 , wherein the substrate-inlet region and the substrate-outlet region are the same region. 5. The method of claim 1 , wherein the substrate-printing region and the substrate-outlet region are enclosed in a housing and separated by a partition. 6. The method of claim 5 , wherein the partition is a gate. 7. The method of claim 1 , further comprising, while floating the substrate in the substrate-printing region, isolating the substrate-printing region. 8. The method of claim 1 , further comprising aligning the substrate along the first direction before printing the material on the substrate. 9. The method of claim 1 , further comprising after transporting the substrate to the substrate-outlet region, isolating the substrate-printing region from the substrate-outlet region. 10. A method for forming a film on a substrate, the method comprising: floating a substrate on a flotation system in a substrate-printing region having an inert gas environment comprising nitrogen gas, the floatation system comprising at least one gas inlet port and at least one gas outlet port; while floating the substrate in the substrate-printing region: moving the substrate in a first direction and moving at least one print-head in a second direction, the first and second directions being substantially orthogonal to each other, controlling a float height of the substrate using gas flow through the at least one gas inlet port and the at least one gas outlet port, the gas flow comprising an inert gas, and printing a material on a surface of the substrate with the at least one print-head having at least one nozzle, wherein each of the first and second directions is substantially orthogonal to a direction normal to the surface of the substrate the material is printed on; transporting the substrate to a substrate-outlet region; and removing the substrate from the substrate-outlet region. 11. The method of claim 10 , wherein printing the material on the surface of the substrate comprises printing the material in a pattern on the surface of the substrate. 12. The method of claim 11 , wherein the material is printed in a pattern on the surface of the substrate to form a display device. 13. The method of claim 10 , wherein the material comprises an organic material. 14. The method of claim 13 , wherein the organic material comprises an OLED material. 15. The method of claim 10 , wherein the print-head comprises an ink chamber in flow communication with a nozzle. 16. The method of claim 10 , wherein the at least one print-head is an inkjet print-head. 17. The method of claim 10 , wherein: the at least one print-head comprises an energizing element, and in response to energizing of the energizing element, the at least one print-head is actuated to dispense a metered quantity of ink. 18. A method for forming a film on a substrate, the method comprising: receiving a substrate in a substrate-inlet region of a printing system enclosure; isolating the substrate-inlet region; establishing an inert gas environment in the substrate-inlet region; transporting the substrate from the substrate-inlet region to a substrate-printing region of the printing system enclosure; floating the substrate on a flotation system in the substrate-printing region, the floatation system comprising at least one gas inlet port and at least one gas outlet port; establishing an inert gas environment in the substrate-printing region; while floating the substrate in the substrate-printing region: moving the substrate in a first direction and moving at least one print-head in a second direction, the first and second directions being substantially orthogonal to each other, controlling a float height of the substrate using gas flow through the at least one gas inlet port and the at least one gas outlet port, the gas flow comprising an inert gas, and printing a material on a surface of the substrate with the at least one print-head having at least one nozzle, wherein each of the first and second directions is substantially orthogonal to a direction normal to the surface of the substrate the material is printed on; transporting the substrate to a substrate-outlet region of the printing system enclosure; and removing the substrate from the substrate-outlet region. 19. The method of claim 18 , wherein the substrate-inlet region and the substrate-outlet region are the same region of the printing system enclosure. 20. The method of claim 18 , wherein the material comprises an organic material.

Assignees

Inventors

Classifications

  • characterised by the construction of the load-lock chamber · CPC title

  • using air tracks · CPC title

  • Waste ink transport from caps or spittoons, e.g. by suction (Collecting or collectors of waste ink B41J2/1721) · CPC title

  • connected with the printer frame · CPC title

  • C23C4/137Primary

    Spraying in vacuum or in an inert atmosphere · CPC title

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Frequently asked questions

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What does patent US11230757B2 cover?
The disclosure relates to a method and apparatus for preventing oxidation or contamination during a circuit printing operation. The circuit printing operation can be directed to OLED-type printing. In an exemplary embodiment, the printing process is conducted at a load-locked printer housing having one or more of chambers. Each chamber is partitioned from the other chambers by physical gates or…
Who is the assignee on this patent?
Kateeva Inc
What technology area does this patent fall under?
Primary CPC classification C23C4/137. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 25 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).