X-ray anode, x-ray emitter and method for producing an x-ray anode

Patent metadata

Field	Value
Publication number	US-11227739-B2
Application number	US-201916574719-A
Country	US
Kind code	B2
Filing date	Sep 18, 2019
Priority date	Sep 26, 2018
Publication date	Jan 18, 2022
Grant date	Jan 18, 2022

Abstract

An x-ray anode for an x-ray emitter has a structured surface provided for impingement with electrons. According to an embodiment of the invention, the structured surface has a surface structure which alternates periodically at least in sections and which varies in the micrometer range with respect to its depth extension and periodicity.

First claim

What is claimed is:

1. An x-ray anode for an x-ray emitter, the x-ray anode comprising:
a structured surface provided for impingement with electrons, the structured surface including a surface structure that periodically alternates at least in sections and that has a varying depth extension, wherein
the varying depth extension and a periodicity of the surface structure are up to 40 μm, and
at least one of a variation of the varying depth extension or the periodicity is in a range of an average free electron path length in a material of the x-ray anode.

2. The x-ray anode of claim 1 , wherein the surface structure includes channels running in parallel to one another at least in sections.

3. The x-ray anode of claim 2 , wherein
the x-ray anode has a rotationally symmetrical design, and
the channels run obliquely to a radial direction determined by the rotationally symmetrical design.

4. The x-ray anode of claim 2 , wherein
the x-ray anode has a circumferential form, and
the channels run obliquely to a radial direction determined by the circumferential form of the x-ray anode.

5. The x-ray anode of claim 2 , wherein a ratio of the varying depth extension to the periodicity of the surface structure is about 1:1.

6. The x-ray anode of claim 1 , wherein the surface structure includes circumferential, circular channels.

7. The x-ray anode of claim 6 , wherein the circular channels are arranged concentrically with respect to one another.

8. The x-ray anode of claim 1 , wherein a ratio of the varying depth extension to the periodicity of the surface structure is about 1:1.

9. The x-ray anode of claim 1 , wherein the surface structure includes a substantially sinusoidal profile in cross-section, a substantially rectangular profile or a substantially sawtooth profile.

10. The x-ray anode of claim 1 , wherein at least one of the varying depth extension or the periodicity of the surface structure is up to 30 μm.

11. The x-ray anode of claim 10 , wherein at least one of the varying depth extension or the periodicity of the surface structure is up to 20 μm.

12. The x-ray anode of claim 11 , wherein at least one of the varying depth extension or the periodicity of the surface structure is up to 15 μm.

13. The x-ray anode of claim 1 , wherein the surface structure is introduced into the material of the x-ray anode by way of an ablation method.

14. The x-ray anode of claim 13 , wherein the ablation method includes at least one of laser ablation, electron beam ablation, microstructure machining, micro die sinking or an etching method.

15. The x-ray anode of claim 1 , wherein the surface structure is produced by way of an additive manufacturing method.

16. The x-ray anode of claim 15 , wherein the additive manufacturing method includes at least one of selective laser melting, laser sintering, or electron beam melting.

17. The x-ray anode of claim 1 , wherein the surface structure is produced by way of at least one of fused filament fabrication, gas dynamic cold spraying, screen printing, chemical vapor deposition or physical vapor deposition.

18. An x-ray emitter comprising:
the x-ray anode of claim 1 .

19. The x-ray emitter of claim 18 , wherein the x-ray anode is configured to rotate about an axis of rotation.

20. The x-ray emitter of claim 19 , wherein the x-ray emitter is configured to receive a strike of electrons substantially at an angle of impact of up to 90°.

21. The x-ray emitter of claim 19 , wherein the x-ray emitter is configured to receive a strike of electrons substantially at an angle of impact of at most about 45°.

22. The x-ray emitter of claim 18 , wherein the x-ray emitter is structurally configured to receive a strike of electrons substantially at an angle of impact of up to 90°.

23. The x-ray emitter of claim 18 , wherein the x-ray emitter is configured to receive a strike of electrons substantially at an angle of impact of at most about 45°.

24. The x-ray anode of claim 1 , wherein
the surface structure has at least a first section and a second section,
the first section includes a plurality of first channels, and
a depth of the surface structure in the first section is different from a depth of the surface structure in the second section.

25. The x-ray anode of claim 24 , wherein the second section includes a plurality of second channels.

26. The x-ray anode of claim 1 , wherein the surface structure includes a plurality of channels, wherein a depth of at least two of the plurality of channels is different.

27. A method, comprising:
using an x-ray emitter to generate x-ray images, the x-ray emitter including an x-ray anode, the x-ray anode having a structured surface provided for impingement with electrons, the structured surface including a surface structure that periodically alternates at least in sections and that has a varying depth extension, wherein
the varying depth extension and a periodicity of the surface structure are up to 40 μm, and
at least one of a variation of the varying depth extension or the periodicity is in a range of an average free electron path length in a material of the x-ray anode.

28. A method for producing an x-ray anode including a structured surface provided for impingement with electrons, the structured surface including a surface structure that periodically alternates at least in sections and that has a varying depth extension, wherein the varying depth extension and a periodicity of the surface structure are up to 40 μm, and wherein at least one of a variation of the varying depth extension or the periodicity is in a range of an average free electron path length in a material of the x-ray anode, the method comprising:
introducing the surface structure into the material of the x-ray anode via an ablation method or via an additive manufacturing method.

29. The method of claim 28 , wherein the ablation method includes laser ablation or electron beam ablation.

30. The method of claim 28 , wherein the additive manufacturing method includes at least one of selective laser melting, laser sintering, electron beam melting, fused filament fabrication, gas dynamic cold spraying, screen printing, chemical vapor deposition or physical vapor deposition.

Assignees

• Siemens Healthcare Gmbh

Inventors

• Fritzler Anja
• Geithner Peter
• Maurer Petra
• Weber Thomas
• Streller Brigitte

Classifications

• Y02P10/25

  Process efficiency · CPC title

• H01J35/112 Primary

  Non-rotating anodes (H01J35/12 takes precedence) · CPC title

• H01J35/08 Primary

  Anodes; Anti cathodes · CPC title

• H01J35/26

  by rotation of the anode or anticathode · CPC title

• H01J9/02

  Manufacture of electrodes or electrode systems · CPC title