Mask plate, method for forming via-hole, method for forming display substrate, the display substrate, and display device

Patent metadata

Field	Value
Publication number	US-11226550-B2
Application number	US-201816083243-A
Country	US
Kind code	B2
Filing date	Jan 11, 2018
Priority date	Jun 14, 2017
Publication date	Jan 18, 2022
Grant date	Jan 18, 2022

Abstract

The present disclosure provides a mask plate, a method for forming a via-hole, a method for forming a display substrate, the display substrate, and a display device. The mask plate is configured to form the via-hole in a layer, and includes a transparent pattern for the formation of the via-hole. The transparent pattern includes one or more curved edge, so the via-hole formed using the mask plate is provided with one or more curved edges at its bottom.

First claim

What is claimed is:

1. A mask plate for forming a via-hole in a layer, comprising a transparent pattern for the formation of the via-hole, wherein the transparent pattern comprises one or more curved edges,
wherein the transparent pattern comprises one or more serrated or rippled edges,
wherein the transparent pattern comprises a body portion and a plurality of teeth arranged on the body portion,
wherein a width of each tooth in a direction perpendicular to an extension direction of a tip of each tooth is reduced gradually from a first value greater than a resolution of an exposure machine to a second value smaller than the resolution of the exposure machine in the extension direction, and the exposure machine is configured to form the via-hole.

2. The mask plate according to claim 1 , wherein the transparent pattern is approximately of a square or circular shape.

3. The mask plate according to claim 1 , wherein a gradient angle of the via-hole is smaller than or equal to 50°.

4. A method for forming a via-hole, comprising:
providing a layer; and
forming the via-hole in the layer using a mask plate for forming the via-hole in the layer, comprising a transparent pattern for the formation of the via-hole, wherein the transparent pattern comprises one or more curved edges,
wherein the transparent pattern comprises one or more serrated or rippled edges,
wherein the transparent pattern comprises a body portion and a plurality of teeth arranged on the body portion,
wherein a width of each tooth in a direction perpendicular to an extension direction of a tip of each tooth is reduced gradually from a first value greater than a resolution of an exposure machine to a second value smaller than the resolution of the exposure machine in the extension direction, and the exposure machine is configured to form the via-hole.

5. The method according to claim 4 , wherein when the layer is made of a photoresist material, the forming the via-hole in the layer comprises: placing the mask plate above the layer; and exposing the layer so as to form the via-hole in the layer.

6. The method according to claim 4 , wherein when the layer is not made of the photoresist material, the forming the via-hole in the layer comprises: forming a photoresist layer on the layer; placing the mask plate above the photoresist layer; exposing and developing the photoresist layer, so as to form a photoresist reserved region and a photoresist unreserved region; and etching a portion of the layer at the photoresist unreserved region, so as to form the via-hole in the layer.

7. A method for forming a display substrate, comprising forming a via-hole in a layer of the display substrate using the method according to claim 4 .

8. A display substrate, comprising a layer and a via-hole formed in the layer using the method according to claim 4 , wherein a cross section of the via-hole has one or more curved edges.

9. The display substrate according to claim 8 , wherein the cross section of the via-hole has one or more rippled edges.

10. The display substrate according to claim 8 , wherein the layer comprises at least one insulation layer.

11. The display substrate according to claim 10 , wherein when the at least one insulation layer is a passivation (PVX) layer and the via-hole is of a square shape, a length of each side of the via-hole is smaller than 10 μm.

12. The display substrate according to claim 10 , wherein when the at least one insulation layer is a PVX layer and the via-hole is of a circular shape, a diameter of the via-hole is smaller than 10 μm.

13. The display substrate according to claim 10 , wherein when the at least one insulation layer is an organic (ORG) layer and the via-hole is of a square shape, a length of each side of the via-hole is smaller than 25 μm.

14. The display substrate according to claim 10 , wherein when the at least one insulation layer is an ORG layer and the via-hole is of a circular shape, a diameter of the via-hole is smaller than 25 μm.

15. A display device, comprising the display substrate according to claim 8 .

16. The display device according to claim 15 , wherein the display substrate is an array substrate.

17. The display device according to claim 16 , wherein the array substrate is a Color Filter on Array (COA) array substrate.

Assignees

• Boe Technology Group Co Ltd
• Chongqing Boe Optoelectronics Tech Co Ltd

Inventors

• Wang Xiaoyuan
• Yang Ni
• Fang Yan
• Qi Zhijian
• Li Yunze
• Xu Hengyi

Classifications

• H10D86/421

  having a particular composition, shape or crystalline structure of the active layer · CPC title

• H10D86/0231

  using masks, e.g. half-tone masks · CPC title

• H10D86/60

  wherein the TFTs are in active matrices · CPC title

• H10D86/443

  adapted for preventing breakage, peeling or short circuiting · CPC title

• G02F1/136227

  Through-hole connection of the pixel electrode to the active element through an insulation layer · CPC title