Flip chip integration on qubit chips
US-2019165238-A1 · May 30, 2019 · US
US11223005B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11223005-B2 |
| Application number | US-202016738589-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 9, 2020 |
| Priority date | Sep 7, 2018 |
| Publication date | Jan 11, 2022 |
| Grant date | Jan 11, 2022 |
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Techniques regarding parallel gradiometric SQUIDs and the manufacturing thereof are provided. For example, one or more embodiments described herein can comprise an apparatus, which can comprise a first pattern of superconducting material located on a substrate. Also, the apparatus can comprise a second pattern of superconducting material that can extend across the first pattern of superconducting material at a position. Further, the apparatus can comprise a Josephson junction located at the position, which can comprise an insulating barrier that can connect the first pattern of superconductor material and the second pattern of superconductor material.
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What is claimed is: 1. An apparatus, comprising: a first superconducting material located on a substrate and formed in a first pattern having a hollow interior region; a second superconducting material formed in a second pattern distinct from the first pattern, the first pattern and the second pattern overlapping at a first defined position of the first pattern and being non-overlapping at a second defined position of the first pattern; and a Josephson junction located at the first defined position at which the first pattern and the second pattern overlap, wherein the Josephson Junction comprises an insulating barrier that connects the first superconducting material and the second superconducting material, wherein the first pattern is a ring shape, wherein the second pattern extends from a first side of the ring shape to a second side of the ring shape, and wherein the Josephson junction is located at the defined position where the second pattern overlaps the first pattern. 2. The apparatus of claim 1 , wherein the first superconducting material is operably coupled to a first capacitor pad, and wherein the second superconducting material extends across the first pattern to operably couple to a second capacitor pad. 3. The apparatus of claim 1 , wherein the apparatus is a gradiometric superconducting quantum interference device. 4. The apparatus of claim 1 , wherein the Josephson junction is a superconductor-insulator-superconductor Josephson junction. 5. The apparatus of claim 1 , wherein the Josephson junction comprises a first superconductor metal comprised within the first superconducting material and a second superconductor metal comprised within the second superconducting material. 6. The apparatus of claim 5 , wherein the first superconductor metal is different from the second superconductor metal. 7. The apparatus of claim 5 , wherein the first superconductor metal is selected from a first group consisting of a type-1 superconducting material and a type-2 superconducting material, wherein the second superconductor metal is selected from a second group consisting of the type-1 superconducting material and the type-2 superconducting material, and wherein the insulating barrier is an electrically insulating dielectric material at low temperature. 8. The apparatus of claim 1 , wherein the first superconducting material is aluminum, wherein the second superconducting material is aluminum, and wherein the insulating barrier is aluminum oxide. 9. The apparatus of claim 1 , further comprising: a third superconducting material that extends across the first pattern of the first superconducting material; and a second Josephson junction comprising a second insulating barrier that connects the third superconducting material and the first superconducting material. 10. A method, comprising: depositing a first superconducting material onto a substrate, wherein the first superconducting material is formed in a first pattern having a hollow interior region; forming an insulating barrier on a surface of the first superconducting material that is opposite to the substrate; and depositing a second superconducting material formed in a second pattern distinct from the first pattern over the insulating barrier to form a Josephson junction, wherein the Josephson Junction is formed at a defined position at which the first pattern, the second pattern and the insulating barrier overlap, wherein the first pattern is formed in a ring shape, wherein the second pattern extends from a first side of the ring shape to a second side of the ring shape, and wherein the Josephson junction is located at the defined position where the second pattern overlaps the first pattern. 11. The method of claim 10 , wherein the method forms a gradiometric superconducting quantum interference device, and wherein the Josephson junction is a superconductor-insulator-superconductor Josephson junction that connects the first superconducting material and the second superconducting material. 12. The method of claim 10 , wherein the forming the insulating barrier comprises oxidizing the first superconducting material. 13. The method of claim 10 , wherein the depositing the first superconducting material comprises evaporating the first superconducting material onto the substrate, and wherein the depositing the second superconducting material comprises evaporating the second superconducting material over the insulating barrier. 14. The method of claim 10 , wherein the first superconducting material is selected from a first group consisting of a type-1 superconducting material and a type-2 superconducting material, wherein the second superconducting material is selected from a second group consisting of a type-1 superconducting material and a type-2 superconducting material, and wherein the insulating barrier is an electrically insulating dielectric material at low temperature. 15. A method, comprising: forming a first pattern of a first superconducting material on a substrate; forming an insulating barrier adjacent to the first superconducting material such that the first superconducting material separates the insulating barrier from the substrate; and forming a second pattern of a second superconducting material across the insulating barrier to form a Josephson junction, wherein a first shape of the first pattern is distinct from a second shape of the second pattern, wherein the first pattern is formed in a ring shape, wherein the second pattern extends from a first side of the ring shape to a second side of the ring shape, and wherein the Josephson junction is located at the defined position where the second pattern overlaps the first pattern. 16. The method of claim 15 , wherein the method forms a gradiometric superconducting quantum interference device, and wherein the Josephson junction is a superconductor-insulator-superconductor Josephson junction that connects the first pattern of superconducting material and the second pattern of superconducting material. 17. The method of claim 15 , wherein the forming the insulating barrier comprises oxidizing the first pattern of superconducting material. 18. The method of claim 15 , wherein the forming the first pattern of superconducting material comprises evaporating a first portion of the superconducting material onto the substrate in the first pattern, and wherein the forming the second pattern of second superconducting material comprises evaporating a second portion of the superconducting material over the insulating barrier in the second pattern. 19. The method of claim 15 , wherein the first superconducting material is aluminum, wherein the second superconducting material is aluminum, and wherein the insulating barrier is aluminum oxide.
SQUIDS · CPC title
Measuring gradient · CPC title
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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