Method and apparatus for measuring measurement of two-dimensional pattern corresponding to three-dimensional virtual clothing

US11222448B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11222448-B2
Application numberUS-202017027426-A
CountryUS
Kind codeB2
Filing dateSep 21, 2020
Priority dateAug 19, 2019
Publication dateJan 11, 2022
Grant dateJan 11, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A method and apparatus for measuring a measurement of a two-dimensional (2D) pattern receives a plurality of points in a space in which a 2D pattern of clothing is displayed, determines an attribute of an area in which the points are included, measures a length of a line segment using the points based on the determined attribute of the area, and outputs the length of the line segment.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of taking a measurement of a two-dimensional (2D) pattern, comprising: receiving a plurality of points in a space in which a 2D pattern of clothing is displayed; determining attributes of areas in which the points are located, wherein the attributes indicate at least whether the points are located in a same pattern piece of the clothing or different pattern pieces of the clothing; determining a length of a line segment using the points based on the determined attributes of the areas, the determined length of the line segment changed to account for separation between the pattern pieces responsive to determining that the points are located in different pattern pieces; and outputting the length of the line segment. 2. The method of claim 1 , wherein the determining of the attributes of the areas comprises: analyzing a data structure corresponding to each of the points to determine the attributes. 3. The method of claim 2 , wherein the data structure corresponding to each of the points includes, in a form of a link, information associated with at least one of a pattern piece in which each of the points is positioned, a line in a pattern piece on which each of the points is positioned, or a point on a line in a pattern piece. 4. The method of claim 1 , wherein the attributes of the areas comprises at least one of: a first attribute indicating that an area in which points are located corresponds to a same pattern piece of the 2D pattern; a second attribute indicating that an area of one of the points is located in a first pattern piece and an area of another of the points is located in a second pattern piece different from the first pattern piece; a third attribute indicating that an area in which a start point and an end point of the points are located corresponds to an outer arc of a same pattern piece of the 2D pattern; a fourth attribute indicating that an area including one of the start point and the end point of the points corresponds to a pattern piece of the 2D pattern, and an area including the other of the start point and the end point corresponds to a remaining area excluding the pattern piece of the 2D pattern; or a fifth attribute indicating that areas including the points outside the 2D pattern. 5. The method of claim 4 , wherein, in response to the attributes of the areas being determined to be of the first attribute, determining of the length of the line segment comprises: determining a first length of a first line segment connecting a start point and an end point of the same pattern piece; and setting the first length as the length of the line segment. 6. The method of claim 4 , wherein, in response to the attributes of the areas being determined to be of the second attribute, determining the length of the line segment comprises: determining a length of a first line segment connecting a start point in the first pattern piece and an end point in the second pattern piece; determining a second length by subtracting, from the first length, a length of a connection line connecting a first intersection point at which the second line segment crosses a first outer line of the first pattern piece and a second intersection point at which the second line segment crosses a second outer line of the second pattern piece; and setting the second length to be the length of the line segment. 7. The method of claim 6 , further comprising: receiving, as an input, a changed position of one of the start point and the end point, wherein determining the length of the line segment comprises: determining the length of the line segment based on the changed position of the one of the start point and the end point. 8. The method of claim 4 , wherein, in response to the attributes of the areas being determined to be of the third attribute, the measuring of the length of the line segment comprises: determining lengths of a first line segment and a second line segment, the first line segment extending from the start point to meet the second line segment and perpendicular to the second line segment; determining a length of the outer arc based on the lengths of the first line segment and the second line segment; and setting the length of the outer arc as the length of the line segment. 9. The method of claim 4 , wherein, in response to the attributes of the areas being determined to be of the fourth attribute, determining the length of the line segment comprises: determining a length of an inner line connecting a point located in a pattern piece and an intersection point crossing an outer line of the pattern piece; determining a length of an outer line connecting the intersection point and a point located in the remaining area; and setting, as the length of the line segment, at least one of the length of the inner line, the length of the outer line, or a sum of the length of the inner line and the length of the outer line. 10. The method of claim 4 , wherein, in response to the attributes of the areas being determined to be of the fifth attribute, determining the length of the line segment comprises: determining a length of a line segment connecting a start point and an end point outside the 2D pattern; and setting the length of the line segment as the length of the line segment. 11. The method of claim 1 , further comprising: receiving, as an input, a strain rate of the 2D pattern; and deforming the length of the line segment based on the strain rate of the 2D pattern. 12. The method of claim 1 , wherein the receiving of the points comprises: setting, as a start point, a first point at which a first input is received; after setting the start point, setting, as at least one intermediate point, at least one second point at which a second input subsequent to the first input is received; and after setting the start point or the at least one intermediate point, setting, as an end point, a third point at which a third input subsequent to the second input is received. 13. The method of claim 1 , wherein the 2D pattern is modeled with a mesh including a plurality of polygons, wherein, among the points, at least one point input in an inside of the 2D pattern and on an outer line of the 2D pattern is mapped to the polygons. 14. The method of claim 1 , wherein the 2D pattern is modeled with a mesh including a plurality of polygons, wherein at least one point outside the 2D pattern is defined by a relative position of the at least one point with respect to the 2D pattern. 15. A non-transitory computer-readable storage medium storing instructions thereon, the instructions, when executed by a processor, cause the processor to: receive a plurality of points in a space in which a 2D pattern of clothing is displayed; determine attributes of areas in which the points are located, wherein the attributes indicate at least whether the points are located in a same pattern piece of the clothing or different pattern pieces of the clothing; determine a length of a line segment using the points based on the determined attributes of the areas, the determined length of the line segment changed to account for separation between the pattern pieces responsive to determining that the points are located in different pattern pieces; and output the length of the line segment. 16. An apparatus for taking a measurement of a two-dimensional (2D) pattern, comprising: a user interface (UI) device configured to receive, from a user, a plurality of points in a space in which a 2D pattern of clothing is displayed; a processor coupled to a memory to execute instructions

Assignees

Inventors

Classifications

  • G06T11/23Primary

    using straight lines or curves · CPC title

  • Measuring aids or methods · CPC title

  • G06T19/20Primary

    Editing of three-dimensional [3D] images, e.g. changing shapes or colours, aligning objects or positioning parts · CPC title

  • Analysis of geometric attributes · CPC title

  • General purpose rendering architectures · CPC title

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What does patent US11222448B2 cover?
A method and apparatus for measuring a measurement of a two-dimensional (2D) pattern receives a plurality of points in a space in which a 2D pattern of clothing is displayed, determines an attribute of an area in which the points are included, measures a length of a line segment using the points based on the determined attribute of the area, and outputs the length of the line segment.
Who is the assignee on this patent?
Clo Virtual Fashion Inc
What technology area does this patent fall under?
Primary CPC classification G06T11/23. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jan 11 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).