Plasmon-assisted photothermoelectric effect based detection of infrared radiation on asymmetrically patterned graphene

US11217738B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11217738-B2
Application numberUS-201916555449-A
CountryUS
Kind codeB2
Filing dateAug 29, 2019
Priority dateAug 31, 2018
Publication dateJan 4, 2022
Grant dateJan 4, 2022

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  5. First independent claim

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Abstract

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Various methods and devices for ultrasensitive infrared photodetection, infrared imaging, and other optoelectronic applications using the plasmon assisted thermoelectric effect in graphene are described. Infrared detection by the photo-thermoelectric uses the generation of a temperature gradient (ΔT) for the efficient collection of the generated hot-carriers. An asymmetric plasmon-induced hot-carrier Seebeck photodetection scheme at room temperature exhibits a remarkable responsivity along with an ultrafast response in the technologically relevant 8-12 μm band. This is achieved by engineering the asymmetric electronic environment of the generated hot carriers on chemical vapor deposition (CVD) grown large area nanopatterned monolayer graphene, which leads to a record ΔT across the device terminals thereby enhancing the photo-thermoelectric voltage beyond the theoretical limit for graphene. The results provide a strategy for uncooled, tunable, multispectral infrared detection.

First claim

Opening claim text (preview).

What is claimed is: 1. A method, comprising: providing an infrared detector, the infrared detector having an asymmetrically patterned graphene layer, wherein the infrared detector comprises a dielectric slab sandwiched between the asymmetrically patterned graphene layer and a back reflector; receiving infrared radiation illumination at the infrared detector; detecting a thermoelectric voltage generated by the received infrared radiation illumination; and in response to detecting the thermoelectric voltage, indicating reception of infrared radiation illumination. 2. The method of claim 1 , wherein the infrared detector is an uncooled infrared detector. 3. The method of claim 1 , wherein infrared radiation illumination is within the 3 μm-5 μm band. 4. The method of claim 1 , wherein infrared radiation illumination is within the 8 μm-12 μm band. 5. The method of claim 1 , wherein the asymmetrically patterned graphene layer is nanopatterned. 6. The method of claim 1 , wherein the asymmetrically patterned graphene layer comprises a first patterned graphene section and a second graphene section, the second graphene section having no pattern. 7. The method of claim 6 , wherein the first graphene section and the second, patterned graphene section extend in parallel along the length of a graphene channel. 8. The method of claim 1 , wherein the asymmetrically patterned graphene layer comprises a pattern of holes in a hexagonal array. 9. A device, comprising: an infrared detector with an asymmetrically patterned graphene layer configured to generate a thermoelectric voltage in response to a received infrared radiation illumination, the infrared detector having a source, drain and gate; a function generator connected to the source; a lock-in amplifier connected to the drain; and a gate voltage connected to the gate. 10. The device of claim 9 , wherein a first connection of the lock-in amplifier is connected to the source and a second, opposite connection of the lock-in amplifier is connected to ground. 11. The device of claim 10 , wherein an amplifier resistor is connected in parallel with the lock-in amplifier. 12. The device of claim 9 , wherein the function generator is connected to the source via a resistor. 13. The device of claim 9 , wherein the asymmetrically patterned graphene layer comprises a first patterned graphene section and a second graphene section, the second graphene section having no pattern. 14. The device of claim 13 , wherein the pattern comprises a hexagonal array of holes. 15. The device of claim 9 , wherein the infrared detector comprises a graphene channel, and wherein the graphene channel comprises the asymmetrically patterned graphene layer. 16. The device of claim 15 , wherein the asymmetrically patterned graphene layer comprises a first patterned graphene section and a second, unpatterned graphene section, the first patterned graphene section and the second, unpatterned graphene section extending in parallel along the length of the graphene channel. 17. The device of claim 9 , wherein the asymmetrically patterned graphene layer is coupled to an optical cavity. 18. The device of claim 9 , wherein the asymmetrically patterned graphene layer is a monolayer graphene layer. 19. The device of claim 9 , wherein the infrared detector is an uncooled infrared detector.

Assignees

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Classifications

  • using thermoelectric elements, e.g. thermocouples · CPC title

  • H10N10/855Primary

    comprising compounds containing boron, carbon, oxygen or nitrogen · CPC title

  • Arrangements for indicating or recording specially adapted for radiation pyrometers · CPC title

  • Physics · mapped topic

  • Physics · mapped topic

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What does patent US11217738B2 cover?
Various methods and devices for ultrasensitive infrared photodetection, infrared imaging, and other optoelectronic applications using the plasmon assisted thermoelectric effect in graphene are described. Infrared detection by the photo-thermoelectric uses the generation of a temperature gradient (ΔT) for the efficient collection of the generated hot-carriers. An asymmetric plasmon-induced hot-c…
Who is the assignee on this patent?
Univ Central Florida Res Found Inc
What technology area does this patent fall under?
Primary CPC classification H10N10/855. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 04 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).