Electron capture dissociation (ECD) utilizing electron beam generated low energy electrons

Patent metadata

Field	Value
Publication number	US-11217437-B2
Application number	US-201916298654-A
Country	US
Kind code	B2
Filing date	Mar 11, 2019
Priority date	Mar 16, 2018
Publication date	Jan 4, 2022
Grant date	Jan 4, 2022

Abstract

Electron capture dissociation (ECD) is performed by transmitting an electron beam through a cell along an electron beam axis, generating plasma in the cell by energizing a gas with the electron beam, and transmitting an ion beam through the interaction region along an ion beam axis to produce fragment ions. Generating the plasma forms an interaction region in the cell spaced from and not intersecting the electron beam, and including low-energy electrons effective for ECD. The ion beam axis may be at an angle to and offset from the ion beam axis, such that the electron beam does not intersect the ion beam.

First claim

What is claimed is:

1. An electron capture dissociation (ECD) apparatus, comprising:
a cell positioned on a device axis;
an ion inlet communicating with the cell and configured to communicate with an analyte ion source, the ion inlet disposed on an ion beam axis along which an analyte ion beam travels at an angle to the device axis;
an ion outlet communicating with the cell and disposed at a distance from the ion inlet along the ion beam axis; and
an electron source configured to generate and focus high-energy primary electrons as a focused electron beam at an energy high enough to produce plasma from plasma precursor gas in the cell, and configured to direct the electron beam through the cell and along an electron beam axis, the electron beam axis being along or parallel to the device axis and offset from the ion beam axis, wherein:
the focused electron beam is effective to produce low-energy secondary electrons from the plasma for interaction with the analyte ion beam in an ECD interaction region in the cell, the low-energy secondary electrons having an energy lower than the high-energy primary electrons of the electron beam and being low enough to be effective for ECD; and
the electron source is configured to position the focused electron beam relative to the ion inlet and the ion outlet such that the analyte ion beam passes through the ECD interaction region, and the ECD interaction region is spaced from the focused electron beam by a distance large enough that the focused electron beam does not intersect the analyte ion beam.

2. The ECD apparatus of claim 1 , wherein the cell comprises a first axial end wall having a first aperture, a second axial end wall disposed at a distance from the first axial end wall along the device axis and having a second aperture, and a lateral wall between the first axial end wall and the second axial end wall.

3. The ECD apparatus of claim 2 , wherein the first axial end wall is an electrode configured to focus the electron beam on the electron beam axis.

4. The ECD apparatus of claim 2 , wherein the ion inlet and the ion outlet pass through the lateral wall.

5. The ECD apparatus of claim 1 , comprising ion optics between the electron source and the cell, and configured to focus the electron beam on the electron beam axis.

6. The ECD apparatus of claim 5 , wherein the ion optics comprise a focusing cathode and an anode spaced from the focusing cathode along the device axis.

7. The ECD apparatus of claim 6 , wherein at least one of the focusing cathode or the anode has an aperture opening to a surrounding tapered surface.

8. The ECD apparatus of claim 6 , wherein the electron source comprises an electron-emitting cathode separate from the focusing cathode.

9. The ECD apparatus of claim 8 , wherein the focusing cathode has an aperture on the electron beam axis, and the electron-emitting cathode is disposed on the electron beam axis at an axial distance from the focusing cathode.

10. The ECD apparatus of claim 1 , comprising an electron collector disposed at the second axial end and configured to receive the electron beam.

11. The ECD apparatus of claim 1 , wherein the electron source comprises an electron emitter.

12. The ECD apparatus of claim 11 , wherein the electron emitter is selected from the group consisting of: a heater filament; an electron emitter configured to be heated by a heater element; and an electron emitter configured to emit electrons without being heated.

13. The ECD apparatus of claim 1 , comprising a magnet surrounding the cell and configured to generate an axial magnetic field in the cell.

14. The ECD apparatus of claim 1 , wherein the electron source is configured to generate the electron beam at an energy in a range from 15 eV to 1000 eV, and is effective to produce low-energy electrons from the plasma having energies of 3 eV or less.

15. The ECD apparatus of claim 1 , wherein:
the focused electron beam is a first focused electron beam, and the electron beam axis is a first electron beam axis;
the electron source is further configured to generate and direct a second focused electron beam through the cell and along a second electron beam axis which is along or parallel to the device axis and offset from the ion beam axis;
the second focused electron beam does not intersect the ion beam; and
the interaction region is spaced from the second focused electron beam between the first focused electron beam and the second focused electron beam, and does not intersect the second focused electron beam.

16. The ECD apparatus of claim 15 , wherein the electron source comprises a first electron emitter disposed on the first electron beam axis and a second electron emitter disposed on the second electron beam axis.

17. The ECD apparatus of claim 1 , comprising a feature selected from the group consisting of:
an ion inlet lens positioned at the ion inlet and configured to focus the ion beam, and an ion outlet lens positioned at the ion outlet and configured to focus the ion beam; and
a first ion inlet lens positioned at the ion inlet, a second ion inlet lens positioned at the ion inlet and spaced from the first ion inlet lens, a first ion outlet lens positioned at the ion outlet, and a second ion outlet lens positioned at the ion outlet and spaced from the first ion outlet lens.

18. A method for performing electron capture dissociation (ECD), the method comprising:
transmitting a focused electron beam through a cell along an electron beam axis, the focused electron beam comprising high-energy primary electrons at an energy high enough to produce plasma from plasma precursor gas in the cell;
generating plasma in the cell by energizing the plasma precursor gas with the focused electron beam, wherein generating the plasma forms an ECD interaction region in the cell spaced from and not intersecting the focused electron beam, and wherein the ECD interaction region comprises low-energy secondary electrons from the plasma, the low-energy secondary electrons having an energy lower than the high-energy primary electrons of the electron beam and being low enough to be effective for ECD; and
before or after generating the plasma, transmitting an analyte ion beam through the ECD interaction region from an ion inlet to an ion outlet along an ion beam axis to produce fragment ions by ECD,
wherein the focused electron beam is positioned relative to the ion inlet and the ion outlet such that the electron beam axis is offset from the ion beam axis, and the ECD interaction region is spaced from the focused electron beam by a distance large enough that the focused electron beam does not intersect the analyte ion beam.

19. The ECD apparatus of claim 1 , comprising a plasma precursor gas inlet communicating with the cell and configured to communicate with a plasma precursor gas source.

20. The ECD apparatus of claim 19 , wherein the plasma precursor gas inlet is configured to direct a flow of the plasma precursor gas into the cell effective to maintain an operating pressure in the cell in a range from 0.001 Torr to 0.1 Torr.

Assignees

• Agilent Technologies Inc

Inventors

• Newton Kenneth R
• Gore Nigel P
• Denning Mark

Classifications

• H01J49/0054 Primary

  by an electron beam, e.g. electron impact dissociation, electron capture dissociation · CPC title

• H05H1/0012

  using electromagnetic or particle radiation, e.g. interferometry · CPC title

• H01J49/067

  Ion lenses, apertures, skimmers · CPC title

• H01J49/08

  Electron sources, e.g. for generating photo-electrons, secondary electrons or Auger electrons · CPC title

• H05H1/0037

  by spectrometry · CPC title