Hardmask composition, hardmask layer and method of forming patterns

Patent metadata

Field	Value
Publication number	US-11214678-B2
Application number	US-201916455942-A
Country	US
Kind code	B2
Filing date	Jun 28, 2019
Priority date	Jul 11, 2018
Publication date	Jan 4, 2022
Grant date	Jan 4, 2022

Abstract

A hardmask composition, a hardmask layer, and a method of forming patterns, the composition including a solvent; and a polymer that includes a substituted biphenylene structural unit, wherein one phenylene of the biphenylene of the substituted biphenylene structural unit is substituted with at least one of a hydroxy-substituted C6 to C30 aryl group, and a hydroxy-substituted C3 to C30 heteroaryl group.

First claim

What is claimed is:

1. A hardmask composition, comprising:
a solvent; and
a polymer that includes a plurality of substituted biphenylene repeating units,
wherein:
the substituted biphenylene repeating units are represented by Chemical Formula 1 or Chemical Formula 2, and at least one phenylene of the biphenylene of the substituted biphenylene repeating units is substituted with at least one of a hydroxy-substituted C6 to C30 aryl group, and a hydroxy-substituted C3 to C30 heteroaryl group,

in Chemical Formula 1,
R 1 to R 5 are each independently hydrogen, deuterium, a halogen, a hydroxy group, a substituted or unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted C1 to C30 alkenyl group, a substituted or unsubstituted C1 to C30 alkynyl group, a substituted or unsubstituted C1 to C30 hetero alkyl group, a substituted or unsubstituted C3 to C30 cycloalkyl group, a substituted or unsubstituted C1 to C30 heterocycloalkyl group, a substituted or unsubstituted C1 to C30 arylalkyl group, a substituted or unsubstituted C6 to C30 heteroarylalkyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C3 to C30 heteroaryl group, or a combination thereof, and
at least one of R 1 to R 5 is a hydroxy-substituted C6 to C30 aryl group or a hydroxy-substituted C3 to C30 heteroaryl group,
in Chemical Formula 2,
R 6 to R 10 are each independently hydrogen, deuterium, a halogen, a hydroxy group, a substituted or unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted C1 to C30 alkenyl group, a substituted or unsubstituted C1 to C30 alkynyl group, a substituted or unsubstituted C1 to C30 hetero alkyl group, a substituted or unsubstituted C3 to C30 cycloalkyl group, a substituted or unsubstituted C1 to C30 heterocycloalkyl group, a substituted or unsubstituted C1 to C30 arylalkyl group, a substituted or unsubstituted C6 to C30 heteroarylalkyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C3 to C30 heteroaryl group, or a combination thereof, and
at least one of R 6 to R 10 is a hydroxy-substituted C6 to C30 aryl group or a hydroxy-substituted C3 to C30 heteroaryl group.

2. The hardmask composition as claimed in claim 1 , wherein the one phenylene is substituted with at least one of a hydroxyphenyl group, a hydroxynaphthyl group, a hydroxybiphenyl group, a hydroxydiphenylfluorenyl group, a hydroxydinaphthylfluorenyl group, a hydroxyanthracenyl group, a hydroxyfluoranthenyl group, a hydroxyacenaphthylenyl group, a hydroxyacenaphthenyl group, a hydroxyphenanthrenyl group, a hydroxybenzophenanthrenyl group, a hydroxypyrenyl group, a hydroxytriphenylenyl group, a hydroxychrysenyl group, a hydroxytetracenyl group, a hydroxybenzofluoranthenyl group, a hydroxyperlenyl group, a hydroxybenzopyrenyl group, a hydroxynaphthoanthracenyl group, a hydroxypentacenyl group, a hydroxybenzoperlenyl group, a hydroxydibenzopyrenyl group, a hydroxycoronenyl group, a hydroxypyridinyl group, a hydroxypyrimidinyl group, a hydroxy triazinyl group, a hydroxypyrrolyl group, a hydroxy imidazolyl group, a hydroxypyrazolyl group, a hydroxyindolo group, a hydroxyisoindolo group, a hydroxybenzimidazolyl group, a hydroxy indazolyl group, a hydroxyfuranyl group, a hydroxybenzofuranyl group, a hydroxythiophenyl group, a hydroxyoxazolyl group, a hydroxythiazolyl group, a dihydroxyphenyl group, a dihydroxynaphthyl group, a dihydroxybiphenyl group, a dihydroxydiphenylfluorenyl group, a dihydroxydinaphthylfluorenyl group, a dihydroxyanthracenyl group, a dihydroxyfluoranthenyl group, a dihydroxyacenaphthylenyl group, a dihydroxyacenaphthenyl group, a dihydroxyphenanthrenyl group, a dihydroxybenzophenanthrenyl group, a dihydroxypyrenyl group, a dihydroxytriphenylenyl group, a dihydroxychrysenyl group, a dihydroxytetracenyl group, a dihydroxybenzofluoranthenyl group, a dihydroxyperlenyl group, a dihydroxybenzopyrenyl group, a dihydroxynaphthoanthracenyl group, a dihydroxypentacenyl group, a dihydroxybenzoperlenyl group, a dihydroxydibenzopyrenyl group, a dihydroxycoronenyl group, a dihydroxypyridinyl group, a dihydroxypyrimidinyl group, a dihydroxytriazinyl group, a dihydroxypyrrolyl group, a dihydroxyimidazolyl group, a dihydroxypyrazolyl group, a dihydroxyindolo group, a dihydroxyisoindolo group, a dihydroxybenzimidazolyl group, a dihydroxyindazolyl group, a dihydroxyfuranyl group, a dihydroxybenzofuranyl group, a dihydroxythiophenyl group, a dihydroxyoxazolyl group, and dihydroxythiazolyl group.

3. The hardmask composition as claimed in claim 1 , wherein:
the one phenylene further includes at least one of a substituted or unsubstituted C6 to C30 aryl group and a substituted or unsubstituted C3 to C30 heteroaryl group, and
a substituent of the substituted C6 to C30 aryl group and the substituted C3 to C30 heteroaryl group is deuterium, a halogen, a nitro group, a cyano group, an amino group, a C1 to C30 alkyl group, a C2 to C30 alkenyl group, a C2 to C30 alkynyl group, a C6 to C30 aryl group, a C7 to C30 arylalkyl group, a C1 to C20 heteroalkyl group, a C3 to C20 heteroarylalkyl group, a C3 to C30 cycloalkyl group, a C3 to C15 cycloalkenyl group, a C6 to C15 cycloalkynyl group, a C2 to C30 heteroaryl group, or a combination thereof.

4. The hardmask composition as claimed in claim 1 , wherein at least one of R 1 to R 4 is a hydroxy-substituted C6 to C30 aryl group or a hydroxy-substituted C3 to C30 heteroaryl group.

5. The hardmask composition as claimed in claim 4 , wherein one or two of R 1 to R 4 are a hydroxy-substituted C6 to C30 aryl group or a hydroxy-substituted C3 to C30 heteroaryl group.

6. The hardmask composition as claimed in claim 1 , wherein the substituted biphenylene repeating units represented by Chemical Formula 1 are represented by one of Chemical Formulae 1-1 to 1-4:

wherein, in Chemical Formula 1-1 to Chemical Formula 1-4,
R 1 to R 5 are each independently hydrogen, deuterium, a halogen, a hydroxy group, a substituted or unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted C1 to C30 alkenyl group, a substituted or unsubstituted C1 to C30 alkynyl group, a substituted or unsubstituted C1 to C30 heteroalkyl group, a substituted or unsubstituted C3 to C30 cycloalkyl group, a substituted or unsubstituted C1 to C30 heterocycloalkyl group, a substituted or unsubstituted C1 to C30 arylalkyl group, a substituted or unsubstituted C6 to C30 heteroarylalkyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C3 to C30 heteroaryl group, or a combination thereof, and
at least one of R 1 to R 5 is a hydroxy-substituted C6 to C30 aryl group or a hydroxy-substituted C3 to C30 heteroaryl group.

7. The hardmask composition as claimed in claim 6 , wherein:
the substituted biphenylene repeating units represented by Chemical Formula 1-1 are represented by Chemical Formula 1-1a, and
the substituted biphenylene repeating units represented by Chemical Formula 1-2 are represented by Chemical Formula 1-2a:

wherein, in Chemical Formula 1-1a and Chemical Formula 1-2a,
R 1 to R 4 are each independently hydrogen, deuterium, a halogen, a hydroxy group, a substituted or unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted C1 to C30 alkenyl group, a substituted or unsubstituted C1 to C30 alkynyl group, a substituted or unsubstituted C1 to C30 hetero alkyl group, a substitu

Assignees

• Samsung Sdi Co Ltd

Inventors

• Lim Jaebum
• Yang Sunyoung
• Kim Sunghwan
• Kim Seunghyun
• Park Yushin

Classifications

• H10P76/2043

  using an anti-reflective coating · CPC title

• H10P50/71

  using masks for conductive or resistive materials · CPC title

• H10P76/20

  of masks comprising organic materials · CPC title

• G03F7/094 Primary

  Multilayer resist systems, e.g. planarising layers · CPC title

• C08G2261/1422

  containing OH groups · CPC title