CMP polishing pad conditioner

Patent metadata

Field	Value
Publication number	US-11213927-B2
Application number	US-201816233943-A
Country	US
Kind code	B2
Filing date	Dec 27, 2018
Priority date	Dec 28, 2017
Publication date	Jan 4, 2022
Grant date	Jan 4, 2022

Abstract

A method of processing chemical mechanical polishing (CMP) pad conditioners includes providing the CMP pad conditioner including conditioner substrate that is a metal, ceramic or a metal-ceramic material with a plurality of hard conditioner particles with a Vickers hardness greater than 3,000 Kg/mm2 bonded to a top surface of the conditioner substrate, and a slurry including an aqueous medium and a plurality of hard slurry particles having a hardness greater than 3,000 Kg/mm2. The surface of the pad conditioner is polished in a CMP apparatus using a polishing pad. After the polishing each conditioner particle has at least one exposed facet, and the plurality of hard conditioner particles have a maximum average protrusion-to-protrusion flatness (PPF) difference of 20 microns, and a sharpest edge measured by a value of a cutting edge radius (CER) that lies at an edge of the facet for at least 80% of the facets.

First claim

The invention claimed is:

1. A method of processing a chemical mechanical polishing (CMP) pad conditioner, comprising:
providing said CMP pad conditioner comprising a conditioner substrate including a metal, ceramic or a metal-ceramic material having a patterned surface with a polycrystalline diamond film thereon, and a slurry including an aqueous medium and a plurality of hard slurry particles having a Vickers hardness greater than 3,000 Kg/mm 2 , and
polishing said polycrystalline diamond film in a CMP apparatus using a polishing pad and the slurry,
wherein said polycrystalline diamond film after said polishing includes tallest grains having a height lying in a top 20 percent of a peak-valley range, with at least 80 percent of said tallest grains having an orientation within 20 degrees from a (111) orientation.

2. The method of claim 1 , wherein said plurality of hard slurry particles comprise diamond particles.

3. The method of claim 2 , when an average size of said diamond particles range from 10 micron to 200 microns.

4. The method of claim 2 , wherein a concentration of said diamond particles in said slurry is between 1% and 20% by weight.

5. The method of claim 1 , wherein said polishing pad comprises a metal or a ceramic material with a Vickers hardness greater than 50 kg/m 2 .

6. The method of claim 1 , wherein said polishing pad comprises copper, steel, or a metal alloy including at least two metals.

7. The method in claim 1 , when a viscosity of said slurry ranges from 2 centipoise to 1,500 centipoise.

8. The method of claim 2 , further comprising secondary particles selected from alumina, or silica, with a Vickers hardness less than 3,000 Kg/mm 2 with a size between 10 nm to 10 micron, and a concentration between 1% to 60 weight percent.

9. The method of claim 8 , wherein said plurality of hard slurry particles comprise diamond particles, and wherein a size of said secondary particles is at least 30 percent smaller than a size of said diamond particles.

Assignees

• Sinmat Inc
• Univ Florida
• Entregis Inc

Inventors

• Singh Rajiv K
• Singh Deepika

Classifications

• B24B53/017 Primary

  Devices or means for dressing, cleaning or otherwise conditioning lapping tools · CPC title

• B24B53/12

  Dressing tools; Holders therefor · CPC title

• B24B37/04

  designed for working plane surfaces · CPC title

• B24B37/044

  characterised by the composition of the lapping agent · CPC title

• B24B53/013

  Application of loose grinding agent as auxiliary tool during truing operation · CPC title